Exposure apparatus and device manufacturing method
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the substrate, an illumination optical system for illuminating the reticle using light from a light source, and a temperature controller for controlling a temperature of the optical element and thereby a temperature of a fluid that is filled in a space between the optical element in the projection optical system and the substrate, the exposure apparatus exposing the substrate via said projection optical system and the fluid.
1. An exposure apparatus for exposing a substrate via liquid, said exposure apparatus comprising:
a projection optical system for projecting a pattern of a reticle onto a substrate, the projection optical system including a final lens contacting the liquid, and a support member for supporting the final lens;
a temperature controller configured to control temperature of the support member and to thereby control a temperature of the liquid, the liquid being filled in a space between the final lens and the substrate; and
a stage for moving the substrate relative to the final lens.
2. An exposure apparatus according to claim 1 , wherein the temperature controller controls the temperature of the support member by supplying a temperature-controlled fluid to a conduit in the support member.
3. An exposure apparatus according to claim 2 , wherein the temperature controller controls the temperature of the fluid based on exposure position information or exposure light irradiation information.
4. A device manufacturing method comprising the steps of:
exposing a substrate using an exposure apparatus for exposing a substrate via liquid; and
developing the substrate that has been exposed,
wherein the exposure apparatus includes:
a projection optical system for projecting a pattern of a reticle onto a substrate, the projection optical system including a final lens contacting the liquid, and a support member for supporting the final lens;
a temperature controller configured to control temperature of the support member and to thereby control a temperature of the liquid, the liquid being filled in a space between the final lens and the substrate; and
a stage for moving the substrate relative to the final lens.
5. An exposure apparatus for exposing a substrate via the liquid comprising:
a projection optical system for projecting a pattern of a reticle onto a substrate, the projection optical system including a final lens contacting the liquid;
a support member for supporting the final lens;
a chuck for holding the substrate; and
a temperature controller configured to control a temperature of the support member and the chuck and to thereby control a temperature of the liquid, liquid being filled in a space between the final lens and the substrate.
6. An exposure apparatus according to claim 5 , wherein the support member has a fluid conduit for temperature control, and
wherein the temperature controller supplies a temperature-controlled fluid to the conduit in the support member.
7. An exposure apparatus according to claim 5 , wherein the temperature controller supplies a temperature-controlled fluid to a channel in the chuck.
8. An exposure apparatus according to claim 5 , wherein the temperature controller supplies a temperature-controlled fluid to both the conduit in the support member and a channel in the chuck.
9. A device manufacturing method comprising the steps of:
exposing a substrate using an exposure apparatus for exposing a substrate via the liquid; and
developing the substrate that has been exposed,
wherein the exposure apparatus includes:
a projection optical system for projecting a pattern of a reticle onto a substrate, the projection optical system including a final lens contacting the liquid;
a support member for supporting the final lens;
a chuck for holding the substrate; and
a temperature controller configured to control a temperature of the support member and the chuck, and to thereby control a temperature of the liquid, the liquid being filled in a space between the final lens and the substrate.