Dummy via for reducing proximity effect and method of using the same
View Patent ↗A dummy via design for a dual damascene structure has a dielectric layer on a substrate, a dual damascene structure filled with a conductive material and inlaid in the dielectric layer, and a dummy via structure filled with a non-conductive material and inlaid in the dielectric layer. The dummy via structure has at least two dummy vias filled with the non-conductive material and located adjacent to two sides of the dual damascene structure respectively.
1. A semiconductor device, comprising:
a dielectric layer on a substrate;
a dual damascene structure filled with a conductive material and inlaid in said dielectric layer; and
a dummy via structure filled with an optical sensitive organic material and inlaid in said dielectric layer, wherein said dummy via structure comprises at least two dummy vias filled with said optical sensitive organic material and located adjacent to two sides of said dual damascene structure respectively.
2. The semiconductor device of claim 1 , wherein said dummy vias are filled with an organic bottom anti-reflective coating.
3. The semiconductor device of claim 1 , wherein said dummy vias are filled with a positive tone photoresist or a negative tone photoresist.
4. The semiconductor device of claim 1 , wherein said dielectric layer has dielectric constant less than 4.0.
5. The semiconductor device of claim 1 , wherein said dual damascene structure comprises an upper trench portion and a lower via portion, and said dummy vias are laterally adjacent to said lower via portion.
6. A semiconductor device, comprising:
a dielectric layer on a substrate, having dielectric constant less than 4.0;
a dual damascene structure filled with a conductive material and inlaid in said dielectric layer; and
a dummy via structure filled with a TEOS(Tetraethyl Ortho silicate)-based dielectric material and inlaid in said dielectric layer, wherein said dummy via structure comprises at least two dummy vias filled with said TEOS-based dielectric material and located adjacent to two sides of said dual damascene structure respectively.
7. The semiconductor device of claim 6 , wherein said dual damascene structure comprises an upper trench portion and a lower via portion, and said dummy vias are laterally adjacent to said lower via portion.
8. A semiconductor device, comprising:
a dielectric layer on a substrate;
a dual damascene structure filled with a conductive material and inlaid in said dielectric layer; and
a dummy via structure filled with a sacrificial light absorbing material (SLAM) and inlaid in said dielectric layer, wherein said dummy via structure comprises at least two dummy vias filled with said SLAM and located adjacent to two sides of said dual damascene structure respectively.