Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source
Solid tin (Sn) is used as a target, a CO 2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO 2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.
1. An optical element contamination preventing device for an extreme ultraviolet light source apparatus wherein a scattered material emitted together with extreme ultraviolet light from a first plasma generated by excitation of a target within a chamber by a laser beam is prevented from contaminating an optical element or an equipment having an optical element within the chamber,
wherein
at least a surface of the target is made of tin and the target has a tape-shape, a wire-shape, a plate-shape, a rod-shape or a ball-shape;
a wavelength of the laser beam is CO 2 laser wavelength, and the laser is configured to reduce most of the scattered material to sub-nanometer size;
the optical element comprises a collector mirror that reflects and collects the extreme ultraviolet light emitted from the plasma;
the optical element comprises a laser window for guiding the laser beam into the chamber:
wherein the device comprises;
a plasma generating device for generating a second plasma for electrically charging the scattered material;
a magnetic field generating device for applying a magnetic field to the electrically charged scattered material for deflecting the scattered material, thereby preventing the scattered material from reaching the optical element; and
gasflow generating means for generating a gasflow in the vicinity of the optical element.
2. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 1 , wherein
the plasma generating device generates the second plasma in a plasma generating region where the first plasma is generated by the CO 2 laser, and the plasma generating device comprises a plurality of electrodes and a power source connected to the plurality of the electrodes.
3. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 2 , further comprising
electrical field generating means for applying an electric field to the electrically charged scattered material for deflecting the scattered material, thereby preventing the scattered material from reaching the optical element, wherein
the electric field generating means generates in the plasma generation region where the first plasma is generated by the CO 2 laser an electric field independently of an electric field generated by the plasma generating device, and the electric field generating means comprises a plurality of electrodes and a power source connected to the plurality of the electrodes.
4. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 2 , further comprising
background gas supply means for supplying into the chamber a background gas for deflecting the scattered material, thereby preventing the scattered material from reaching the optical element.
5. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 2 , further comprising
heating means for heating the scattered material for evaporating the scattered material.
6. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 1 , wherein
the optical element comprises a multilayer film mirror for detecting an intensity of EUV light.
7. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 1 , wherein
the equipment having the optical element comprises an EUV light detector for detecting an intensity of EUV light.
8. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 1 , further comprising
A grid electrode disposed between the collector mirror and the plasma, and
A direct current power supply for generating an electrical potential difference between the mirror and the grid electrode.
9. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 1 , further comprising
a grid electrode disposed in the vicinity of a surface of the optical element or a surface of the equipment having the optical element, and
a direct current power supply for generating an electrical potential difference between the grid electrode and the surface of the optical element or the surface of the equipment having the optical element.
10. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 9 , wherein
the optical element comprises a multilayer film mirror for detecting an intensity of EUV light.
11. The optical element contamination preventing device for an extreme ultraviolet light source apparatus according to claim 9 , wherein
the equipment having the optical element comprises an EUV light detector for detecting an intensity of EUV light.
12. An extreme ultraviolet light source apparatus comprising the optical element contamination preventing device of claim 1 , for generating an extreme ultraviolet light by excitation of a target supplied to a predetermined position within a chamber by a laser beam, the apparatus comprising;
a target supply device for supplying the target into the chamber; and
a target position adjustment mechanism for adjusting the position of the supplied target to the predetermined position.
13. An extreme ultraviolet light source apparatus according to claim 12 , further comprising:
a target recovery device produced at a position opposing the target supply device and sandwiching the predetermined position; and
a position adjustment mechanism for adjusting the position of the target recovery device.