Semiconductor device
A semiconductor device is comprised of a semiconductor substrate, conductive layers stacked above the semiconductor substrate, which is comprised of a conductive polysilicon, and a metal layer provided above the conductive layers. Both ends of the conductive layers have stairsteps respectively. The conductive layers are connected in series by a metal layer which is provided on the stairsteps. The conductive layers connected in series comprise a resistance element.
1. A semiconductor device comprising:
a semiconductor substrate;
first conductive layers stacked above the semiconductor substrate, which are comprised of a conductive polysilicon;
a metal layer provided above the first conductive layers; and
a 3-dimensional memory which includes second conductive layers stacked above the semiconductor substrate, said second conductive layers comprising a conductive polysilicon,
wherein ends of the first conductive layers have stairsteps respectively, the first conductive layers are connected in series by a metal layer which is provided on the stairsteps, and the first conductive layers connected in series comprises a resistance element,
wherein the number of the first conductive layers is equal to the number of the second conductive layers.
2. The device according to claim 1 ,
wherein the 3-dimensional memory is a nonvolatile semiconductor memory which is applied by a BiCS technique.
3. The device according to claim 1 ,
wherein the resistance element is provided in a peripheral circuit of the 3-dimensional memory.
4. The device according to claim 1 , further comprising
a driver electrically connected to the 3-dimensional memory and including a high-voltage transistor;
a level shifter electrically connected to the driver; and
an address decoder electrically connected to the level shifter.
5. The device according to claim 1 ,
wherein each of the first and second conductive layers is comprised of conductive lines which extend to the same direction, and the conductive lines are connected in series by the metal layer.
6. The device according to claim 5 ,
wherein the conductive lines in the odd-numbered first and second conductive layer form the semiconductor substrate and the conductive lines in the even-numbered first and second conductive layer form the semiconductor substrate are shifted in a half pitch of the conductive lines in a direction perpendicular to a direction in which the first and second conductive layers extend.
7. The device according to claim 5 ,
wherein a direction in which the conductive lines in the odd-numbered first and second conductive layer form the semiconductor substrate extend and a direction in which the conductive lines in the even-numbered first and second conductive layer form the semiconductor substrate extend are crossed each other.
8. A semiconductor device comprising:
a semiconductor substrate;
three or more conductive layers stacked above the semiconductor substrate, which are comprised of a conductive polysilicon; and
a metal layer provided above the conductive layers,
wherein ends of the conductive layers have stairsteps respectively,
wherein the odd-numbered conductive layers are connected in series by a metal layer which is provided on the stairsteps, and the odd-numbered conductive layers connected in series comprise a first electrode of a capacitance element,
wherein the even-numbered conductive layers are connected in series by a metal layer which is provided on the stairsteps, and the even-numbered conductive layers connected in series comprise a second electrode of the capacitance element.
9. The device according to claim 8 , further comprising
a first metal layer connected between the odd-numbered conductive layers and extending toward a first direction;
a second metal layer connected between the even-numbered conductive layers and extending toward the first direction;
a third metal layer connected between the odd-numbered conductive layers and extending toward a second direction; and
a fourth metal layer connected between the even-numbered conductive layers and extending toward the second direction,
wherein the first metal layer and the third metal layer is electrically connected, the second metal layer and the fourth metal layer is electrically connected.
10. The device according to claim 8 , further comprising
a 3-dimensional memory which includes conductive layers stacked above the semiconductor substrate, which is comprised of a conductive polysilicon,
wherein the number of the conductive layers which comprises the capacitance element is equal to the number of the conductive layers which comprises the 3-dimensional memory.
11. The device according to claim 10 ,
wherein the 3-dimensional memory is a nonvolatile semiconductor memory which is applied by a BiCS technique.
12. The device according to claim 10 ,
wherein the capacitance element is provided in a peripheral circuit of the 3-dimensional memory.
13. The device according to claim 10 , further comprising
a driver electrically connected to the 3-dimensional memory and including a high-voltage transistor;
a level shifter electrically connected to the driver; and
an address decoder electrically connected to the level shifter.
14. A semiconductor device comprising:
a semiconductor substrate;
conductive layers stacked above the semiconductor substrate, which are comprised of a conductive polysilicon; and
a metal layer provided above the conductive layers,
wherein ends of the conductive layers have stairsteps respectively, the conductive layers are connected in series by a metal layer which is provided on the stairsteps, and the conductive layers connected in series comprises a resistance element,
wherein each of the conductive layers is comprised of conductive lines which are extend to the same direction, and the conductive lines are connected in series by the metal layer,
wherein the conductive lines in the odd-numbered conductive layer form the semiconductor substrate and the conductive lines in the even-numbered conductive layer form the semiconductor substrate are shifted in a half pitch of the conductive lines in a direction perpendicular to a direction in which the conductive layers extend.
15. The device according to claim 14 ,
wherein a direction in which the conductive lines in the odd-numbered conductive layer form the semiconductor substrate extend and a direction in which the conductive lines in the even-numbered conductive layer form the semiconductor substrate extend are crossed each other.
16. The device according to claim 14 , further comprising
a driver electrically connected to a 3-dimensional memory and including a high-voltage transistor;
a level shifter electrically connected to the driver; and
an address decoder electrically connected to the level shifter.
17. The device according to claim 14 , further comprising
a first metal layer connected between the odd-numbered conductive layers and extending toward a first direction;
a second metal layer connected between the even-numbered conductive layers and extending toward the first direction;
a third metal layer connected between the odd-numbered conductive layers and extending toward a second direction; and
a fourth metal layer connected between the even-numbered conductive layers and extending toward the second direction,
wherein the first metal layer and the third metal layer is electrically connected, the second metal layer and the fourth metal layer is electrically connected.