Method of operating substrate processing apparatus and substrate processing apparatus
A method of operating a substrate processing apparatus, upon the occurrence of a nonfatal failure in the apparatus, makes it possible to continue part of the apparatus operations for substrates to clean and recover a substrate or to easily discharge a substrate from the apparatus, without stopping an entire apparatus, thereby reducing the risk of a substrate becoming unprocessable. The method of operating a substrate processing apparatus having a polishing section, a cleaning section and a transferring mechanism, includes: classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and carrying out an operation for each of the substrates after the detection of the malfunction, the operation varying depending on the classification of the substrate.
1. A method of operating a substrate processing apparatus having a polishing section, a cleaning section including a reversing machine for reversing a substrate and a plurality of cleaning devices for cleaning a polished substrate, and a transferring mechanism including a transporter for transporting a substrate from the polishing section to the cleaning section, said method comprising:
classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and
carrying out an operation for each of the substrates after the detection of the malfunction,
wherein when the malfunction is detected in the polishing section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the polishing section while continuing operations of the cleaning section and the transferring mechanism,
discharging a substrate present in the polishing section from the polishing section after all substrates present in the cleaning section and the transferring mechanism are discharged from the substrate processing apparatus by the operations of the cleaning section and the transferring mechanism, and
cleaning the substrate discharged from the polishing section in the cleaning section or a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.
2. The method of claim 1 , wherein when the malfunction is detected in the transporter of the transferring mechanism or the reversing machine of the cleaning section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the polishing section while continuing operations of the cleaning devices of the cleaning section,
discharging a substrate present in the polishing section from the polishing section after all substrates present in the cleaning devices of the cleaning section are discharged from the substrate processing apparatus by the operations of the cleaning devices, and
cleaning the substrate discharged from the polishing section in the cleaning devices of the cleaning section or a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.
3. The method of claim 2 , wherein when the malfunction is detected in one of the cleaning devices of the cleaning section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the cleaning section while continuing operations of the polishing section and the transferring mechanism,
discharging substrates present in the cleaning devices of the cleaning section and a substrate which has been processed in the polishing section and transferred to the cleaning section by the transporter of the transferring mechanism form the substrate processing apparatus, and
cleaning the substrates discharged from the substrate processing apparatus in a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.
4. The method of claim 1 , wherein when the malfunction is detected in one of the cleaning devices of the cleaning section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the cleaning section while continuing operations of the polishing section and the transferring mechanism,
discharging substrates present in the cleaning devices of the cleaning section and a substrate which has been processed in the polishing section and transferred to the cleaning section by the transporter of the transferring mechanism form the substrate processing apparatus, and
cleaning the substrates discharged from the substrate processing apparatus in a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.
5. A method of operating a substrate processing apparatus having a polishing section, a cleaning section including a reversing machine for reversing a substrate and a plurality of cleaning devices for cleaning a polished substrate, and a transferring mechanism including a transporter for transporting a substrate from the polishing section to the cleaning section, said method comprising:
classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and
carrying out an operation for each of the substrates after the detection of the malfunction,
wherein when the malfunction is detected in the transporter of the transferring mechanism or the reversing machine of the cleaning section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the polishing section while continuing operations of the cleaning devices of the cleaning section,
discharging a substrate present in the polishing section from the polishing section after all substrates present in the cleaning devices of the cleaning section are discharged from the substrate processing apparatus by the operations of the cleaning devices, and
cleaning the substrate discharged from the polishing section in the cleaning devices of the cleaning section or a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.
6. The method of claim 5 , wherein when the malfunction is detected in one of the cleaning devices of the cleaning section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the cleaning section while continuing operations of the polishing section and the transferring mechanism,
discharging substrates present in the cleaning devices of the cleaning section and a substrate which has been processed in the polishing section and transferred to the cleaning section by the transporter of the transferring mechanism form the substrate processing apparatus, and
cleaning the substrates discharged from the substrate processing apparatus in a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.
7. A method of operating a substrate processing apparatus having a polishing section, a cleaning section including a reversing machine for reversing a substrate and a plurality of cleaning devices for cleaning a polished substrate, and a transferring mechanism including a transporter for transporting a substrate from the polishing section to the cleaning section, said method comprising:
classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and
carrying out an operation for each of the substrates after the detection of the malfunction,
wherein when the malfunction is detected in one of the cleaning devices of the cleaning section, said operation comprises
stopping an operation of feeding new substrates into the substrate processing apparatus and an operation of the cleaning section while continuing operations of the polishing section and the transferring mechanism,
discharging substrates present in the cleaning devices of the cleaning section and a substrate which has been processed in the polishing section and transferred to the cleaning section by the transporter of the transferring mechanism from the substrate processing apparatus, and
cleaning the substrates discharged from the substrate processing apparatus in a cleaning section of another substrate processing apparatus in which the cleaning section is in normal operation.