IP Library Granted Patent US 8,202,671
Granted Patent B2
US 8,202,671 · App. 12/729,396 · Granted Jun 19, 2012

Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus

Assignee: Nikon Corporation
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Quick Facts
Patent No.
US 8,202,671
App. No.
12/729,396
Granted
Jun 19, 2012
Kind
B2
Abstract

A protective apparatus protects a predetermined area on a surface of a substrate. The protective apparatus includes: a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the predetermined area; and a thin film portion that is stretched across the frame portion to oppose the predetermined area and closes an opening portion formed by the frame portion. An end surface of the flexible portion on the thin film portion side has a curved shape which is concave toward a connecting portion with the substrate.

Claims (22)

1. A protective apparatus that protects a predetermined area on a surface of a substrate, comprising:

a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the predetermined area; and

a thin film portion that is stretched across the frame portion to oppose the predetermined area and closes an opening portion formed by the frame portion,

wherein an end surface of the flexible portion on the thin film portion side has a curved shape which is concave toward a connecting portion with the substrate.

2. The protective apparatus according to claim 1 , wherein the end surface of the flexible portion on the thin film portion side has a curved shape along a predetermined deflection curve.

3. The protective apparatus according to claim 2 , wherein the predetermined deflection curve is a curve complementary to a deflection curve formed by the predetermined area in a state where both end portions of the substrate in the first direction are supported from the thin film portion side.

4. The protective apparatus according to claim 1 , wherein portions of the frame portion, which are different from the flexible portions, are formed so that an end surface on the thin film portion side is parallel to an end surface of the connecting portion side.

5. The protective apparatus according to claim 1 , wherein a width of at least a part of the flexible portion is greater than a width of the portion of the frame portion which is different from the flexible portion.

6. A mask comprising:

a substrate having a pattern area on its surface; and

a protective apparatus that is connected to the surface and protects the pattern area according to claim 1 .

7. A mask that is provided with a pattern area on a surface of a substrate, comprising:

a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the pattern area; and

a thin film portion that is stretched across the frame portion to oppose the pattern area and closes an opening portion formed by the frame portion,

wherein an end surface of the flexible portion on the thin film portion side has a flat shape in a state where both end portions of the substrate in the first direction are supported from the thin film portion side.

8. The mask according to claim 7 , wherein the end surface of the flexible portion on the thin film portion side has a curved shape which is concave toward the substrate side along a predetermined deflection curve in the state where the end surface on the substrate side is flat.

9. The mask according to claim 8 , wherein the predetermined deflection curve is a curve complementary to a deflection curve formed by the pattern area in the state where both end portions of the substrate in the first direction are supported from the thin film portion side.

10. The mask according to claim 9 , wherein the predetermined deflection curve is determined on the basis of at least one of a thickness of the substrate, an interval between support portions of the substrate in the first direction, a property value related to rigidity of the substrate, and a specific gravity of the substrate.

11. The mask according to claim 9 , further comprising an intermediate layer interposed between the substrate and the frame portion,

wherein the predetermined deflection curve is determined on the basis of a thickness distribution of the intermediate layer.

12. The mask according to claim 7 , wherein portions of the frame portion, which are different from the flexible portions, are formed so that an end surface on the thin film portion side is parallel to an end surface on the substrate side.

13. The mask according to claim 7 , wherein a width of at least a part of the flexible portion is greater than a width of the portion of the frame portion which is different from the flexible portion.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 23, 2010
From: HANAZAKI, NORITSUGU
To: NIKON CORPORATION
Reel/Frame 024122/0129 →
Continuity (2)
Provisional Application 61213010 · Apr 28, 2009
Related Publication 20100271602A1 · Oct 28, 2010