Granted Patent
B2
US 8,338,077 · App. 12/820,331 · Granted Dec 25, 2012
Photoacid generators and photoresists comprising same
Assignee:
Rohm and Haas Electronic Materials LLC
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Abstract
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
Claims (5)
1. A chemically-amplified positive photoresist composition comprising:
a resin binder and a photoacid generator compound selected from one of the following compounds:
2. A method for forming a photoresist relief image on a substrate comprising:
(a) applying a coating layer of a photoresist composition of claim 1 on a substrate; and
(b) exposing the coating layer to patterned activating radiation and developing the exposed coating layer to provide a relief image.
Assignments (4)
SECURITY INTEREST
Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073515/0243 →
SECURITY INTEREST
Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 073517/0298 →
CHANGE OF NAME
Recorded Oct 29, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS LLC
To: DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
Reel/Frame 069272/0383 →
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Sep 1, 2010
From: LI, MINGQI; XU, CHENG-BAI; AQAD, EMAD; LIU, CONG
To: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Reel/Frame 024922/0178 →
Continuity (2)
Provisional Application
61219355
· Jun 22, 2009