Process for etching silicon with selectivity to silicon-germanium
A method for performing a selective etching process is described. The method includes preparing a substrate having a silicon layer (Si) and a silicon-germanium (SiGe x ) layer, and selectively etching the silicon layer relative to the silicon-germanium layer using a dry plasma etching process.
1. A method for performing a selective etching process, comprising:
preparing a substrate having a silicon layer (Si) and a silicon-germanium (SiGe.sub.x) layer; and
selectively etching an exposed surface of said silicon layer relative to an exposed surface of said silicon-germanium layer using a dry plasma etching process having a process composition containing as incipient ingredients HBr and an optional noble gas,
wherein said dry plasma etching process achieves an etch selectivity between said silicon layer and said silicon-germanium layer greater than or equal to 2.
2. The method of claim 1 , wherein said process composition consists of HBr and He.
3. The method of claim 1 , wherein said process composition further contains as incipient ingredients a halogen-containing gas, a fluorocarbon-containing gas, a hydrocarbon-containing gas, O 2 , N 2 , H 2 , CO, CO 2 , NO, NO 2 , N 2 O, or NH 3 , or any combination of two or more thereof.
4. The method of claim 1 , wherein said dry plasma etching process includes setting a gas pressure in a plasma etching system ranging up to 200 mTorr.
5. The method of claim 1 , wherein said dry plasma etching process excludes coupling radio frequency (RF) power to a substrate holder upon which said substrate rests.
6. The method of claim 1 , wherein said dry plasma etching process includes optionally coupling first radio frequency (RF) power at a first frequency to a substrate holder upon which said substrate rests in a plasma etching system, and coupling second radio frequency (RF) power at a second frequency to an upper electrode opposing said substrate on said substrate holder.
7. The method of claim 6 , wherein said dry plasma etching process excludes coupling said first RF power to said substrate holder.
8. The method of claim 2 , wherein a ratio between a flow rate of HBr and a flow rate of He ranges from 1:1 to 4:1.
9. The method of claim 2 , wherein a ratio between a flow rate of HBr and a flow rate of He ranges from 1.5:1 to 2.5:1.
10. The method of claim 1 , further comprising:
optionally introducing an additive gas to said process composition; and
adjusting one or more process parameters in said dry plasma etching process to change a polarity of an etch selectivity between said silicon layer and said silicon-germanium layer.
11. The method of claim 10 , wherein said one or more process parameters includes a gas pressure, a RF power, a direct current (DC) power, a HBr flow rate, a He flow rate, a flow rate of said additive gas, or a temperature, or any combination of two or more thereof.
12. The method of claim 1 , wherein said substrate rest on a temperature controlled substrate holder in a plasma etching system, said temperature controlled substrate holder comprises:
a support base having fluid channels to circulate a temperature controlled thermal fluid in said support base; and
a substrate support coupled via a thermal insulator to an upper portion of said support base, said substrate support comprising:
one or more heating elements embedded within said substrate support,
an upper surface to support said substrate by contact between said upper surface and a backside of said substrate, and
an electrostatic clamp electrode to hold said substrate on said upper surface of said substrate support.
13. The method of claim 12 , wherein said temperature controlled substrate holder further comprises:
a backside gas supply system configured to supply a heat transfer gas to the backside of said substrate through at least one of a plurality of orifices or channels disposed on said upper surface of said substrate support, wherein said plurality of orifices of said backside gas supply system are arranged in a plurality of zones on said upper surface of said substrate support to vary a backside pressure in a radial direction between a substantially central region of the backside of said substrate and a substantially edge region of the backside of said substrate.
14. A method for preparing a silicon-germanium nano-wire, comprising:
preparing a film stack on a substrate having alternating layers of silicon (Si) and silicon-germanium (SiGe.sub.x);
transferring a pattern through a silicon (Si) layer in said alternating layers of silicon (Si) and silicon-germanium (SiGe.sub.x) to expose a sidewall of said silicon (Si) layer;
transferring said pattern through a silicon-germanium (SiGe.sub.x) layer in said alternating layers of silicon (Si) and silicon-germanium (SiGe.sub.x) to expose a sidewall of said silicon-germanium (SiGe.sub.x) layer; and
laterally etching said sidewall of said silicon (Si) layer by exposing said film stack to a dry plasma etching process having a process composition containing as incipient ingredients HBr and optionally He,
wherein said dry plasma etching process achieves an etch selectivity between said silicon (Si) layer and said silicon-germanium (SiGe.sub.x) layer greater than or equal to two.
15. The method of claim 14 , wherein said process composition contains HBr and He.
16. The method of claim 14 , wherein said process composition consists of HBr and He.
17. The method of claim 14 , wherein said transferring said pattern through said silicon (Si) layer and said silicon-germanium (SiGe x ) layer creates a fin structure extending between opposing buttress structures located at distal ends of said fin structure.
18. The method of claim 17 , wherein said laterally etching said silicon (Si) layer removes said silicon (Si) layer from said fin structure and releases a silicon-germanium (SiGe x ) layer bridge.