Solder cap bump in semiconductor package and method of manufacturing the same
A semiconductor package with improved height uniformity of solder cap bumps therein is disclosed. In one embodiment, the semiconductor package includes a semiconductor substrate comprising a plurality of pads spacedly disposed on a top surface of the substrate, and a passivation layer formed on top of the pads, wherein a plurality of pad openings are created to expose at least a portion of the pads; a plurality of solder cap bumps formed at the pad openings of the passivation layer; and a carrier substrate having a plurality of bond pads electrically connected to the solder caps of the solder cap bumps on the semiconductor substrate. The solder cap bump includes a solder cap on top of a conductive pillar, and a patternable layer can be coated and patterned on a top surface of the conductive pillar to define an area for the solder ball to be deposited. The deposited solder ball can be reflowed to form the solder cap.
1. A method of forming solder cap bumps on a semiconductor device, said method comprising steps of:
providing a semiconductor substrate having a plurality of pads spacedly disposed on a top surface of the substrate, and a passivation layer deposited on top of the pads, wherein a plurality of pad openings are created to expose at least a portion of the pads;
forming a plurality of conductive pillars at the pad openings of the passivation layer, so that the conductive pillar are electrically connected to the pads through the pad openings;
depositing a patternable layer to cover the passivation layer and the conductive pillars, wherein the patternable layer has a plurality of pillar openings with predetermined size on top of the conductive pillars;
disposing a solder ball in each pillar opening, wherein size of the solder ball is appropriated to and smaller than the predetermined size of the pillar opening;
removing the patternable layer to expose the passivation layer, the conductive pillars, and the solder balls on the conductive pillars; and
performing a reflow soldering on the solder ball to form a hemisphere solder cap on the conductive pillar, and further form the solder cap bump.
2. The method of forming solder cap bumps on a semiconductor device of claim 1 , wherein the conductive pillar are an under bump metallization (UBM) structure.
3. The method of forming solder cap bumps on a semiconductor device of claim 1 , wherein the step of forming a plurality of conductive pillars at the pad openings of the passivation layer further includes steps of forming a metallization seed layer at the pad opening and forming the conductive pillars on the seed layer by electroplating.
4. The method of forming solder cap bumps on a semiconductor device of claim 3 , wherein the conductive pillar is made of a material selected from copper (Cu), gold (Au), and alloys thereof.
5. The method of forming solder cap bumps on a semiconductor device of claim 1 , wherein the patternable layer is a stencil layer or a photoresist layer.
6. The method of forming solder cap bumps on a semiconductor device of claim 1 , wherein the conductive pillar are an under bump metallization (UBM) structure, and the height of the UBM structure is equal or less than 60 micrometer (μm).
7. A manufacturing process of forming a flip chip package, said manufacturing process comprising steps of:
providing a semiconductor substrate having a plurality of pads spacedly disposed on a top surface of the substrate, and a passivation layer formed on top of the pads, wherein a plurality of pad openings are created to expose at least a portion of the pads;
forming a plurality of conductive under bump metallization (UBM) structures at the pad openings of the passivation layer to electrically connect to the pads through the pad openings;
depositing a patternable layer to cover the passivation layer and the conductive UBM structures, wherein the patternable layer has a plurality of UBM openings with predetermined size on top of the conductive UBM structures;
disposing a solder ball in each UBM opening, wherein size of the solder ball is appropriated to and smaller than the predetermined size of the UBM openings;
removing the patternable layer to expose the passivation layer, the conductive UBM structures, and the solder balls thereon;
performing a reflow soldering on the solder ball to form a hemisphere solder cap on each conductive UBM structure; and
providing a carrier substrate having a plurality of bond pads, wherein the bond pad is configured to bond the solder cap of the conductive UBM structure to electrically connect the carrier substrate and semiconductor substrate.
8. The manufacturing process of forming a flip chip package of claim 7 , further comprising a step of filling a gap between the semiconductor substrate and the carrier substrate with an encapsulant.
9. The manufacturing process of forming a flip chip package of claim 7 , wherein the under bump metallization (UBM) structure is 60 micrometer (μm) or less.
10. The manufacturing process of forming a flip chip package of claim 7 , wherein the step of forming a plurality of conductive UBM structures at the pad openings of the passivation layer further includes steps of forming a metallization seed layer at the pad opening and forming the conductive UBM structure on the seed layer by electroplating.
11. The manufacturing process of forming a flip chip package of claim 10 , wherein the conductive UBM structure is made of a material selected from copper (Cu), gold (Au), and alloys thereof.
12. The manufacturing process of forming a flip chip package of claim 7 , wherein the patternable layer is a stencil layer or a photoresist layer.