IP Library › Granted Patent US 8,544,169
Granted Patent B2
US 8,544,169 · App. 12/875,644 · Granted Oct 1, 2013

Method of manufacturing a through-hole electrode substrate

Inventor: Takamasa Takano (Tokyo, JP)
Assignee: Dai Nippon Printing Co., Ltd.
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Quick Facts
Patent No.
US 8,544,169
App. No.
12/875,644
Granted
Oct 1, 2013
Kind
B2
Abstract

A method of manufacturing a through-hole electrode substrate includes forming a plurality of through-holes in a substrate, forming a plurality of through-hole electrodes by filling a conductive material into the plurality of through-holes, forming a first insulation layer on one surface of the substrate, forming a plurality of first openings which expose the plurality of through-hole electrodes corresponding to each of the plurality of through-hole electrodes, on the first insulation layer and correcting a position of the plurality of first openings using the relationship between a misalignment amount of a measured distance value of an open position of a leaning through-hole among the plurality of through-holes and of a design distance value of the open position of the leaning through-hole among the plurality of through-holes with respect to a center position of the substrate.

Claims (17)

1. A method of manufacturing a through-hole electrode substrate comprising:

forming a plurality of through-holes in a substrate:

forming a plurality of through-hole electrodes by filling a conductive material into the plurality of through-holes;

forming a first insulation layer on one surface of the substrate;

forming a plurality of first openings which expose the plurality of through-hole electrodes corresponding to each of the plurality of through-hole electrodes, on the first insulation layer; and

correcting a position of the plurality of first openings based on a difference between a measured distance of an open position of a leaning through-hole among the plurality of through-holes and a design distance value of the open position of the leaning through-hole among the plurality of through-holes with respect to a center position of the substrate.

2. The method of manufacturing a through-hole electrode substrate according to claim 1 , further comprising:

forming a second insulation layer on the other surface of the substrate;

forming a plurality of second openings which expose the plurality of through-hole electrodes, on the second insulation later; and

correcting a position of the plurality of second openings based on a difference between a measured distance of an open position of a leaning through-hole among the plurality of through-holes and a design distance value of the open position of the leaning through-hole among the plurality of through-holes with respect to a center position of the substrate.

3. The method of manufacturing a through-hole electrode substrate according to claim 2 , wherein a position of the plurality of second openings is corrected using a correction function which expresses a difference between a measured distance of an open position of the leaning through-hole and a design distance value of the open position of the leaning through-hole among the plurality of through-holes with respect to a center position of the substrate.

4. The method of manufacturing a through-hole electrode substrate according to claim 1 , further comprising:

forming a third insulation layer in each interior wall of the plurality of through-holes, and forming a conductive material on the third insulation layer.

5. The method of manufacturing a through-hole electrode substrate according to claim 1 , wherein either one or all of the first insulation layer, the second insulation layer and the third insulation layer are formed using an insulation resin.

6. The method of manufacturing a through-hole electrode substrate according to claim 1 , wherein a position of the plurality of first openings is corrected using a correction function which expresses a difference between a measured distance of an open position of the leaning through-hole and a design distance value of the open position of the leaning through-hole among the plurality of through-holes with respect to a center position of the substrate.

7. The method of manufacturing a through-hole electrode substrate according to claim 6 , wherein the one surface or the other surface of the substrate is divided into a plurality of regions from a center position heading to a periphery, and the correction function for correcting a position of the plurality of first openings or a position of the plurality of second openings is made different for each of the plurality of regions.

8. The method of manufacturing a through-hole electrode substrate according to claim 6 , wherein the correction function uses a fixed value correction, a linear correction, a quadratic curve correction or a random correction.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2010
From: TAKANO, TAKAMASA
To: DAI NIPPON PRINTING CO., LTD.
Reel/Frame 025144/0200 →
Priority Claims (2)
JP 2009-208374 · Sep 9, 2009 · national
JP 2010-175286 · Aug 4, 2010 · national
Continuity (1)
Related Publication 20110056740A1 · Mar 10, 2011