Processing system
A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.
1. A system, comprising:
a particle beam column configured to generate a particle beam directed to a first processing location;
a laser system configured to generate a laser beam directed to a second processing location located a distance from the first processing location; and
a protector comprising an actuator and a plate connected to the actuator,
wherein:
the actuator is configured to move the plate between first and second plate positions;
in the first plate position, the plate is positioned a first distance from a component of the particle beam column so that the plate protects the component of the particle beam column from particles released from an object by the laser beam during use of the laser beam;
in the second plate position, the plate is located a second distance from the component of the particle beam column; and
the second distance is greater than the first distance.
2. The system according to claim 1 , wherein the particle beam column is an electron beam column.
3. The system according to claim 2 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
4. The system according to claim 1 , wherein the particle beam column is an ion beam column.
5. The system according to claim 4 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
6. The system according to claim 1 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
7. A system, comprising:
a particle beam column configured to generate a particle beam directed to a first processing location;
a laser system configured to generate a laser beam directed to a second processing location located at a distance from the first processing location; and
a protector comprising an actuator and a plate connected to the actuator,
wherein:
the actuator is configured to move the plate between first and second plate positions;
in the first plate position, the protector protects a component of the particle beam column from particles released from an object by the laser beam during use of the laser beam; and
in the second plate position, the component of the particle beam column is not protected from particles released from the object by the laser beam during use of the laser beam.
8. The system according to claim 7 , wherein the particle beam column is an electron beam column or an ion beam column.
9. The system according to claim 7 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
10. The system according to claim 7 , wherein the particle beam column is an electron beam column.
11. The system according to claim 7 , wherein the particle beam column is an ion beam column.
12. The system according to claim 7 , wherein:
in the first plate position, the plate is positioned a first distance from a component of the particle beam column so that the plate protects the component of the particle beam column from particles released from the object by the laser beam during use of the laser beam;
in the second plate position, the plate is located a second distance from the component of the particle beam column; and
the second distance is greater than the first distance.
13. The system according to claim 12 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
14. The system according to claim 12 , wherein the particle beam column is an electron beam column.
15. The system according to claim 14 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
16. The system according to claim 12 , wherein the particle beam column is an ion beam column.
17. The system according to claim 16 , wherein the plate is cup-shaped to partially surround the component in the first plate position.
18. The system according to claim 7 , wherein in the first plate position, the plate is positioned a first distance from a component of the particle beam column so that the plate protects the component of the particle beam column from particles released from the object by the laser beam during use of the laser beam.
19. The system according to claim 18 , wherein in the second plate position, the plate is located a second distance from the component of the particle beam column.
20. The system according to claim 19 , wherein the plate is cup-shaped to partially surround the component in the first plate position.