Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method
The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.
1. An exposure apparatus which irradiates an energy beam on an object via an optical system and forms a predetermined pattern on the object, the apparatus comprising:
a first chamber that houses the optical system and has its inside set to a negative pressure state;
a second chamber which houses the first chamber and has its inside set to a negative pressure state with a higher pressure than the first chamber;
a movable body which moves holding the object;
a seal mechanism which has a loop-shaped static gas bearing member, the static gas bearing member surrounding the object and having an end section on the opposite side of the side that faces the second chamber connected to the movable body in an air tight state, and which isolates the inside of the static gas bearing member from the outside by a surface on the side facing the second chamber of the static gas bearing member forming a predetermined clearance between the static gas bearing member and a predetermined plane of the second chamber facing the object; and
a detection system that detects surface position information of the object, the detection system being arranged inside the second chamber and yet outside the first chamber.
2. The exposure apparatus according to claim 1 , wherein the second chamber has a chamber main section which houses the first chamber, and a flange section which is arranged projecting on a periphery section of the chamber main section and has a surface configuring a part of the predetermined plane, the predetermined plane having such a size that covers a range of movement of the static gas bearing member.
3. The exposure apparatus according to claim 1 wherein
the static gas bearing member has a gas blowing groove to blow out gas to the predetermined plane of the second chamber and a gas suction groove to suction the gas which has been blown out, and
the predetermined clearance is maintained between the static gas bearing member and the predetermined plane, by a balance between a force in a direction withdrawing from the predetermined plane including the static pressure of the gas in the clearance and a force in a direction approaching the predetermined plane caused by a negative pressure which occurs in the vicinity of the gas suction groove by the suction of the gas, acting on the static gas bearing member.
4. The exposure apparatus according to claim 3 wherein
the gas blowing groove and the gas suction groove have a loop shape, respectively, and
the gas suction groove is formed on the inner side of the gas blowing groove in a surface on the side facing the predetermined plane of the static gas bearing member.
5. The exposure apparatus according to claim 4 wherein in between the gas blowing groove and the gas suction groove of the static gas bearing member, an open air section is formed whose inside is open to the atmosphere.
6. The exposure apparatus according to claim 1 wherein
the sealing mechanism further includes a loop-shaped expansion/contraction member which is connected to the movable body and the static gas bearing member, and expands and contracts in a widening direction and a narrowing direction of the clearance.
7. The exposure apparatus according to claim 6 , the apparatus further comprising:
a moving device which makes the static gas bearing member move between a position where the predetermined clearance is formed with the predetermined plane and a position where a spacing larger than the predetermined clearance is formed with the predetermined plane.
8. The exposure apparatus according to claim 7 wherein the moving device makes the static gas bearing member move by electromagnetic force.
9. The exposure apparatus according to claim 1 wherein the energy beam is an extreme ultraviolet light.
10. The exposure apparatus according to claim 1 , the apparatus further comprising:
a shutter device that isolates the inside of the first chamber to the outside.
11. A device manufacturing method including
exposing an object using the exposure apparatus according to claim 1 , and forming a pattern on the object; and
developing the object on which the pattern is formed.
12. An exposure apparatus which irradiates an energy beam on a mask and transfers a pattern formed on the mask onto an object via an optical system, the apparatus comprising:
a first chamber that houses the optical system and has its inside set to a negative pressure state;
a second chamber which houses the first chamber and has its inside set to a negative pressure state with a higher pressure than the first chamber;
a movable body which moves holding the mask;
a seal mechanism which has a loop-shaped static gas bearing member, the static gas bearing member surrounding the mask and having an end section on the opposite side of the side that faces the second chamber connected to the movable body in an air tight state, and which isolates the inside of the static gas bearing member from the outside by a surface on the side facing the second chamber of the static gas bearing member forming a predetermined clearance between the static gas bearing member and a predetermined plane of the second chamber facing the mask; and
a detection system that detects surface position information of the mask, the detection system being arranged inside the second chamber and yet outside the first chamber.
13. The exposure apparatus according to claim 12 wherein
the second chamber has a chamber main section which houses the first chamber, and a flange section which is arranged projecting on a periphery section of the chamber main section and has a surface configuring a part of the predetermined plane, the predetermined plane having such a size that covers a range of movement of the static gas bearing member.
14. The exposure apparatus according to claim 12 wherein
the static gas bearing member has a gas blowing groove to blow out gas to the predetermined plane of the second chamber and a gas suction groove to suction the gas which has been blown out, and
the predetermined clearance is maintained between the static gas bearing member and the predetermined plane, by a balance between a force in a direction withdrawing from the predetermined plane including the static pressure of the gas in the clearance and a force in a direction approaching the predetermined plane caused by a negative pressure which occurs in the vicinity of the gas suction groove by the suction of the gas, acting on the static gas bearing member.
15. The exposure apparatus according to claim 14 wherein
the gas blowing groove and the gas suction groove have a loop shape, respectively, and
the gas suction groove is formed on the inner side of the gas blowing groove in a surface on the side facing the predetermined plane of the static gas bearing member.
16. The exposure apparatus according to claim 15 wherein
in between the gas blowing groove and the gas suction groove of the static gas bearing member, an open air section is formed whose inside is open to the atmosphere.
17. The exposure apparatus according to claim 12 wherein
the sealing mechanism further includes a loop-shaped expansion/contraction member which is connected to the movable body and the static gas bearing member, and expands and contracts in a widening direction and a narrowing direction of the clearance.
18. The exposure apparatus according to claim 17 , the apparatus further comprising:
a moving device which makes the static gas bearing member move between a position where the predetermined clearance is formed with the predetermined plane and a position where a spacing larger than the predetermined clearance is formed with the predetermined plane.
19. The exposure apparatus according to claim 18 wherein the moving device makes the static gas bearing member move by electromagnetic force.
20. The exposure apparatus according to claim 12 wherein the energy beam is an extreme ultraviolet light.
21. The exposure apparatus according to claim 12 , the apparatus further comprising:
a shutter device that isolates the inside of the first chamber to the outside.
22. A device manufacturing method including
exposing an object using the exposure apparatus according to claim 12 , and forming a pattern on the object; and
developing the object on which the pattern is formed.
23. An exposure apparatus that has an optical system, the apparatus irradiating an energy beam on an object via the optical system, and forming a predetermined pattern on the object, comprising:
a first chamber that houses the optical system and has its inside set to a negative pressure state;
a second chamber which houses the first chamber and has its inside set to a negative pressure state with a higher pressure than the inside of the first chamber,
a seal mechanism which houses the object, and which has a gas bearing member configured to surround the object and isolate the object from the outside in an air tight state; and
a detection system that obtains position information of a surface of the object, the detection system being arranged inside the second chamber and yet outside the first chamber.
24. A device manufacturing method including
exposing an object using the exposure apparatus according to claim 23 , and forming a pattern on the object; and
developing the object on which the pattern is formed.