Photon source, metrology apparatus, lithographic system and device manufacturing method

1. A plasma-based photon source apparatus comprising:

a container configured to contain a gaseous atmosphere;

a driving system configured to form a driving radiation beam focused on a plasma forming zone within the container and maintain, by the driving radiation beam, a plasma in an elongated form having a length along a longitudinal axis that is substantially greater than a diameter of the elongated form in a direction transverse to the longitudinal axis; and

a collecting optical system configured to collect photons emitted from an end of the plasma along the longitudinal axis and to form the collected photons into at least one beam of output radiation.

2. The apparatus of claim 1 , wherein the driving system includes at least one laser for generating the driving radiation beam.

3. The apparatus of claim 1 , wherein the driving radiation has wavelengths predominantly in a first range of infrared wavelengths and the output radiation has wavelengths predominantly in a second range, different from the first range, of at least one of visible and ultraviolet radiation.

4. The apparatus of claim 1 , wherein the driving system is configured to deliver the driving radiation beam along the longitudinal axis at an end of the plasma opposite to the end from which the collected photons emerge.

5. The apparatus of claim 1 , wherein the driving system is configured to deliver the driving radiation beam to the plasma forming zone in a direction transverse to the longitudinal direction.

6. The apparatus of claim 5 , wherein the driving system is configured to focus the driving radiation beam into a substantially line focus corresponding to the elongated form of the plasma.

7. The apparatus of claim 1 , further including:

two or more electrodes positioned on opposite sides of the plasma forming zone, for use in igniting the plasma prior to operation, the electrodes being placed away off the longitudinal axis.

8. The apparatus of claim 7 , wherein the electrodes are positioned on an axis orthogonal to the longitudinal axis.

9. The apparatus of claim 8 , wherein the electrodes, the driving system and the collecting optical system are arranged on three axes that are mutually orthogonal.

10. The apparatus of claim 1 , wherein the reflector comprises an end reflector positioned and shaped to reflect back into the plasma photons emerging in a longitudinal direction from an opposite end of the plasma.

11. The apparatus of claim 1 , further comprising:

a reflector configured to reflect photons emitted in the direction transverse to the longitudinal axis back into the plasma.

12. An inspection apparatus comprising:

a support configured to support a substrate, the substrate having a structure thereon;

an optical system configured to illuminate the structure under predetermined illumination conditions and to detect radiation diffracted by the structure under the predetermined illumination conditions;

a processor configured to process information characterizing the detected radiation to obtain a measurement of a property of the structure, wherein the optical system includes a photon source apparatus comprising:

a container configured to contain a gaseous atmosphere;

a driving system configured to form a driving radiation beam focused on a plasma forming zone within the container and maintain, by the driving radiation beam, a plasma in an elongated form having a length along a longitudinal axis that is substantially greater than a diameter of the elongated form in a direction transverse to the longitudinal axis; and

a collecting optical system configured to collect photons emitted from an end of the plasma along the longitudinal axis and to form the collected photons into at least one beam of output radiation.

13. A lithographic system comprising:

a lithographic apparatus comprising:

an illumination optical system configured to illuminate a pattern;

a projection optical system configured to project an image of the pattern onto a substrate; and

an inspection apparatus comprising:

a support configured to support the substrate, the substrate having a structure thereon;

an optical system configured to illuminate the structure under predetermined illumination conditions and to detect radiation diffracted by the structure under the predetermined illumination conditions;

a processor configured to process information characterizing the detected radiation to obtain a measurement of a property of the structure,

wherein the optical system includes a photon source apparatus comprising:

a container configured to contain a gaseous atmosphere;

a driving system configured to form a driving radiation beam focused on a plasma forming zone within the container and maintain, by the driving radiation beam, a plasma in an elongated form having a length along a longitudinal axis that is substantially greater than a diameter of the elongated form in a direction transverse to the longitudinal axis; and

a collecting optical system configured to collect photons emitted from an end of the plasma along the longitudinal axis and to form the collected photons into at least one beam of output radiation,

wherein the lithographic apparatus is arranged to use the measurement results from the inspection apparatus in applying the pattern to further substrates.

14. A method comprising:

generating a driving radiation beam focused on a plasma forming zone within a container containing a gaseous atmosphere;

maintaining, by the driving radiation beam, a plasma in an elongated form having a length along a longitudinal axis that is substantially greater than a diameter of the elongated form in a direction transverse to the longitudinal axis;

collecting photons, by a collecting optical system, emitted from an end of the plasma along the longitudinal axis; and

forming the collected photons into at least one beam of output radiation.

15. The method of claim 14 , further comprising:

illuminating structures using the beam of output radiation;

detecting radiation diffracted by the structures; and

determining, from a property of the diffracted radiation, a property of the structure.

16. The method of claim 14 , further comprising:

delivering the driving radiation beam to the plasma forming zone in a direction transverse to the longitudinal direction.

17. The method of claim 16 , further comprising:

focusing the driving radiation beam into a substantially line focus corresponding to the elongated form of the plasma.

18. The method of claim 14 , further comprising:

igniting the plasma prior to operation by two or more electrodes positioned on opposite sides of the plasma forming zone off the longitudinal axis.

19. The method of claim 14 , further comprising:

reflecting photons emitted transversely to the longitudinal axis back into the plasma.

20. A method of manufacturing a device, comprising:

generating a driving radiation beam focused on a plasma forming zone within a container containing a gaseous atmosphere;

maintaining, by the driving radiation beam, a plasma in an elongated form having a length along a longitudinal axis that is substantially greater than a diameter of the elongated form in a direction transverse to the longitudinal axis;

collecting photons, by a collecting optical system, emitted from an end of the plasma along the longitudinal axis;

forming the collected photons into at least one beam of output radiation;

illuminating a structure using the beam of output radiation;

detecting radiation diffracted by the structure;

determining, from a property of the diffracted radiation, a property of the structure; and

controlling a lithographic process for later substrates in response to the determined property.