IP Library › Granted Patent US 8,928,114
Granted Patent B2
US 8,928,114 · App. 13/352,093 · Granted Jan 6, 2015

Through-assembly via modules and methods for forming the same

Inventors: Chih-Hua Chen (Jhubei, TW); Chen-Shien Chen (Zhubei, TW); Ching-Wen Hsiao (Hsin-Chu, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
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Quick Facts
Patent No.
US 8,928,114
App. No.
13/352,093
Granted
Jan 6, 2015
Kind
B2
Abstract

A discrete Through-Assembly Via (TAV) module includes a substrate, and vias extending from a surface of the substrate into the substrate. The TAV module is free from conductive features in contact with one end of each of the conductive vias.

Claims (38)

1. A device comprising:

a discrete Through-Assembly Via (TAV) module comprising:

a substrate comprising a top surface;

conductive vias extending from the top surface of the substrate into the substrate, wherein the discrete TAV module is free from conductive features in contact with one end of each of the conductive vias; and

a plurality of through-strips extending into the substrate, wherein the plurality of through-strips are parallel to each other, and lengths of the plurality of through-strips are greater than widths of the plurality of through-strips, and wherein the plurality of through-strips comprises:

a first plurality of through-strips interconnected to form a first capacitor plate of a capacitor, wherein the first plurality of through-strips is interconnected through first redistribution lines over the substrate; and

a second plurality of through-strips interconnected to form a second capacitor plate of the capacitor, wherein the second plurality of through-strips is interconnected through second redistribution lines over the substrate.

2. The device of claim 1 , wherein the conductive vias comprise bottom surfaces substantially level with a bottom surface of the substrate, and the bottom surfaces of the conductive vias and the bottom surface of the substrate are exposed.

3. The device of claim 1 further comprising an insulation layer separating one of the plurality of through-strips from the substrate.

4. The device of claim 1 further comprising a plurality of redistribution lines over and connected to the conductive vias, wherein no redistribution lines are under and connected to the conductive vias, and wherein the conductive vias are through-vias penetrating through the substrate.

5. The device of claim 1 , wherein the conductive vias and the plurality of through-strips are formed of a same material.

6. The device of claim 1 , wherein the substrate comprises a semiconductor substrate.

7. The device of claim 1 , wherein the substrate comprises a dielectric substrate.

8. A device comprising:

a discrete Through-Assembly Via (TAV) module having a rectangular top-view shape, the discrete TAV module comprising:

a substrate comprising a top surface; and

conductive vias extending from the top surface of the substrate into the substrate, wherein the discrete TAV module is free from conductive features in contact with one end of each of the conductive vias; and

a plurality of through-strips extending into the substrate, wherein the plurality of through-strips are parallel to each other, with lengths of the plurality of through-strips being greater than widths of the plurality of through-strips, wherein the plurality of through-strips comprises:

a first plurality of through-strips interconnected to form a first capacitor plate of a capacitor, wherein the first plurality of through-strips is interconnected through first redistribution lines over the substrate; and

a second plurality of through-strips interconnected to form a second capacitor plate of the capacitor, wherein the second plurality of through-strips is interconnected through second redistribution lines over the substrate.

9. The device of claim 8 , wherein the conductive vias comprise bottom surfaces substantially level with a bottom surface of the substrate, and the bottom surfaces of the conductive vias and the bottom surface of the substrate are exposed.

10. The device of claim 8 , wherein the conductive vias comprise bottom surfaces higher than a bottom surface of the substrate, and wherein the bottom surfaces of the conductive vias are separated from the bottom surface of the substrate by a layer of the substrate.

11. The device of claim 8 further comprising a plurality of redistribution lines over and connected to the conductive vias, wherein no redistribution lines are under and connected to the conductive vias, and wherein the conductive vias are through-vias penetrating through the substrate.

12. The device of claim 8 , wherein the plurality of through-strips is electrically disconnected from the substrate.

13. A device comprising:

a discrete Through-Assembly Via (TAV) module comprising:

a substrate comprising a top surface;

conductive vias extending from the top surface of the substrate into the substrate, wherein the discrete TAV module is free from conductive features in contact with one end of each of the conductive vias; and

a plurality of through-strips penetrating through the substrate, wherein the plurality of through-strips comprises:

a first plurality of through-strips interconnected to form a first capacitor plate of a capacitor, wherein the first plurality of through-strips is interconnected through first redistribution lines over the substrate; and

a second plurality of through-strips interconnected to form a second capacitor plate of the capacitor, wherein the plurality of through-strips and the second plurality of through-strips are distributed in a alternating layout, and wherein the second plurality of through-strips is interconnected through second redistribution lines over the substrate.

14. The device of claim 13 , wherein the conductive vias comprise bottom surfaces higher than a bottom surface of the substrate, and wherein the bottom surfaces of the conductive vias are separated from the bottom surface of the substrate by a portion of the substrate.

15. The device of claim 13 further comprising a plurality of redistribution lines over and connected to the conductive vias, wherein no redistribution lines are under and connected to the conductive vias, and wherein the conductive vias are through-vias penetrating through the substrate.

16. The device of claim 13 , wherein the conductive vias and the plurality of through-strips are formed of a same material.

17. The device of claim 13 , wherein the substrate comprises a semiconductor substrate.

18. The device of claim 13 , wherein the substrate comprises a dielectric substrate.

19. The device of claim 8 further comprising a plurality of insulation layers, each separating one of the plurality of through-strips from the substrate.

20. The device of claim 13 further comprising a plurality of insulation layers, each separating one of the plurality of through-strips from the substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 3, 2012
From: CHEN, CHIH-HUA; CHEN, CHEN-SHIEN; HSIAO, CHING-WEN
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 027981/0796 →
Continuity (1)
Related Publication 20130181325A1 · Jul 18, 2013