IP Library Granted Patent US 9,041,921
Granted Patent B2
US 9,041,921 · App. 13/519,138 · Granted May 26, 2015

Defect inspection device and defect inspection method

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Quick Facts
Patent No.
US 9,041,921
App. No.
13/519,138
Granted
May 26, 2015
Kind
B2
Abstract

A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.

Claims (14)

1. A defect inspection method comprising the steps of:

irradiating a predetermined region of an inspection target with illumination light by an illumination optical system;

detecting a plurality of scattered lights scattered from the predetermined region of the inspection target illuminated by the illumination step, by a detection optical system having a plurality of detectors each provided with a plurality of pixels by which the scattered light can be detected in a manner that the plurality of detectors detect the scattered light in different azimuth angle directions with respect to the surface of the inspection target, respectively;

adding up a plurality of detection signals based on the plurality of scattered lights detected by the detection step with respect to the plurality of scattered lights substantially from one and the same region of the inspection target to thereby determine a defect on the surface of the inspection target; and

translationally moving the inspection target by a pitch of a size different from an integer multiple of a pixel number of one pixel in the plurality of detectors.

2. The defect inspection method according to claim 1 , wherein the adding step performs addition processing while shifting the pixels of the plurality of detection signals by intervals of (1/a size of pixels in the detector)×(the pitch).

3. The defect inspection method according to claim 1 , wherein the detection step detects scattered light from the predetermined region of the inspection target due to illumination light of the illumination optical system by a line sensor.

4. A defect inspection device:

an illumination optical system configured to irradiate a predetermined region of an inspection target with illumination light;

a detection optical system configured to detect a plurality of scattered lights scattered from the predetermined region of the inspection target illuminated by the illumination optical system, the detection optical system having a plurality of detectors each provided with a plurality of pixels by which the scattered light can be detected in a manner that the plurality of detectors detect the scattered light in different azimuth angle directions with respect to the surface of the inspection target, respectively;

a signal addition/defect determination system configured to add up a plurality of detection signals based on the plurality of scattered lights detected by the detection optical system with respect to the plurality of scattered lights substantially from one and the same region of the inspection target to thereby determine a defect on the surface of the inspection target; and

the signal addition/defect determination system configured to translationally move the inspection target by a pitch of a size different from an integer multiple of a pixel number of one pixel in the plurality of detectors.

5. The defect inspection device according to claim 4 , wherein the signal addition/defect determination system further configured to perform addition processing while shifting the pixels of the plurality of detection signals by intervals of (1/a size of pixels in the detector)×(the pitch).

6. The defect inspection device according to claim 4 , wherein the detection optical system configured to detect scattered light from the predetermined region of the inspection target due to illumination light of the illumination optical system by a line sensor.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2012
From: NAKAO, TOSHIYUKI; MARUYAMA, SHIGENOBU; URANO, YUTA; HONDA, TOSHIFUMI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028857/0229 →