Method of analyzing nitride semiconductor layer and method of manufacturing nitride semiconductor substrate using the analysis method
View Patent ↗A method of analyzing a nitride semiconductor layer in which a mixing ratio at a ternary mixed-crystal nitride semiconductor layer can be analyzed non-destructively, simply, and precisely, even its surface is covered with a cap layer is provided. The nitride semiconductor layer having an AN layer or a BN layer with a thickness of 0.5 to 10 nm that is stacked on an A x B 1-x N layer (A and B: 13 group elements, 0≦x≦1) is subjected to reflection spectroscopy to obtain a reflection spectrum of the A x B 1-x N layer. Let an energy value in a peak position of the reflection spectrum be a band gap energy E gap , and let a band gap energy value of A x B 1-x N (x=1) be E A and a band gap energy value of A x B 1-x N (x=0) be E B , x is calculated from Equation E gap =(1−x)E B +xE A −bx(1−x) (where b is bowing parameter corresponding to A and B).
1. A method of analyzing a nitride semiconductor layer, comprising a measurement step in which a nitride semiconductor layer having an AN layer or a BN layer with a thickness of 0.5 to 10 nm that is stacked on an A x B 1-x N layer (where A and B are 13 group elements, N is nitrogen, and 0≦x≦1) is subjected to reflection spectroscopy to obtain a reflection spectrum of said A x B 1-x N layer, an analysis step of obtaining a band gap energy value E gap of said A x B 1-x N layer from said reflection spectrum, and a calculation step of calculating x from said band gap energy value E gap , wherein
let an energy value in a peak position of said reflection spectrum be E gap in said analysis step, and let a band gap energy value of A x B 1-x N (x=1) be E A and a band gap energy value of A x B 1-x N (x=0) be E B in said calculation step, x is calculated from Equation E gap =(1−x)E B xE A −bx(1−x) (where b is bowing parameter corresponding to said A and B).
2. A method of manufacturing a nitride semiconductor substrate having a nitride semiconductor layer comprising at least one A x B 1-x N layer (where A and B are 13 group elements, N is nitrogen, and 0≦x≦1), the method including a step in which x of said A x B 1-x N layer is calculated by the analysis method as claimed in claim 1 to change manufacture conditions based on x.
3. A method of analyzing a nitride semiconductor layer, comprising a measurement step in which a nitride semiconductor layer having an AN layer or a BN layer with a thickness of 0.5 to 10 nm that is stacked on an A x B 1-x N layer (where A and B are 13 group elements, N is nitrogen, and 0≦x≦1) is subjected to reflection spectroscopy to obtain a reflection spectrum of said A x B 1-x N layer, an analysis step of obtaining a band gap energy value E gap of said A x B 1-x N layer from said reflection spectrum, and a calculation step of calculating x from said band gap energy value E gap , wherein
let an energy value at a frequency which gives an extreme value of differential by frequency of said reflection spectrum be E gap in said analysis step, and let a band gap energy value of A x B 1-x N (x=1) be E A and a band gap energy value of A x B 1-x N (x=0) be E B in said calculation step, x is calculated from Equation E gap =(1−x)E B xE A −bx(1−x) (where b is bowing parameter corresponding to said A and B).
4. A method of manufacturing a nitride semiconductor substrate having a nitride semiconductor layer comprising at least one A x B 1-x N layer (where A and B are 13 group elements, N is nitrogen, and 0≦x≦1), the method including a step in which x of said A x B 1-x N layer is calculated by the analysis method as claimed in claim 3 to change manufacture conditions based on x.