Method for manufacturing bonded wafer
The present invention is a method for manufacturing a bonded wafer, including performing a plasma activation treatment on at least one of the bonded surfaces of the bond wafer and the base wafer before bonding, wherein the plasma activation treatment is performed while a back surface of at least one of the bond wafer and the base wafer is placed on a stage with the back surface being in point contact or line contact with the stage. The method can inhibit increase in attached substances such as particles on the back surface of a wafer during the plasma activation treatment, and prevent re-attachment of the attached substances to the bonded surface of the wafer, particularly when the wafer after the plasma activation treatment is cleaned with a batch cleaning apparatus.
1. A method for manufacturing a bonded wafer, comprising:
implanting at least one gas ion selected from a hydrogen ion and a rare gas ion into a bond wafer from a surface of the bond wafer to form a layer of the implanted ion;
bonding the surface from which the ion is implanted into the bond wafer and a surface of a base wafer directly or through an oxide film; and
separating the bond wafer along the layer of the implanted ion to form a bonded wafer having a thin film on the base wafer;
the method further comprising performing a plasma activation treatment on at least one of the bonded surfaces of the bond wafer and the base wafer before bonding, wherein
the plasma activation treatment is performed while a back surface of at least one of the bond wafer and the base wafer is placed on a stage with the back surface being in point contact or line contact with the stage, and the bond wafer or the base wafer subjected to the plasma activation treatment is cleaned with a batch cleaning apparatus before bonding.
2. The method for manufacturing a bonded wafer according to claim 1 , wherein in the plasma activation treatment, at least one of the bond wafer and the base wafer is placed on a point-like or line-like protrusion formed on a surface of the stage, whereby the back surface is in point contact or line contact with the stage.
3. The method for manufacturing a bonded wafer according to claim 1 , wherein in the plasma activation treatment, at least one of the bond wafer and the base wafer is placed on a base having a point-like or line-like support, the base being disposed on a surface of the stage, whereby the back surface is in point contact or line contact with the stage.