Positioning system, a lithographic apparatus and a method for positional control

1. A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system comprising:

a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and

a controller configured to control movement of the other component in a control coordinate based on the determined error;

wherein the measurement coordinate is different from the control coordinate, and

wherein the measurement coordinate is associated with a first direction or a first rotational direction and the control coordinate is associated with a second direction or a second rotational direction that is different from the first direction or the first rotational direction.

2. The positioning system of claim 1 , wherein:

the components define substantially parallel x-y planes; and

each of the measurement coordinate and the control coordinate is associated with one of the x, y and z directions.

3. The positioning system of claim 1 , wherein the components define substantially parallel x-y planes and the measurement coordinate is associated with the z direction.

4. The positioning system of claim 1 , wherein:

the components define substantially parallel x-y planes; and

the measurement coordinate and/or the control coordinate is a coordinate indicating tilt of the component about one of the x, y and z axes.

5. The positioning system of claim 1 , wherein:

the measuring device is configured to determine the error in each coordinate of the set of orthogonal coordinates; and

the controller is configured to control, in each coordinate, the movement of the other component based on the determined error in at least one of the other coordinates.

6. The positioning system of claim 1 , wherein the coordinates comprise a six-dimensional coordinate system comprising a three-dimensional Cartesian coordinate system, wherein the components define substantially parallel x-y planes, and three coordinates indicating tilt of the components about each of the Cartesian axes.

7. A lithographic apparatus comprising:

a support structure constructed to support a patterning device;

a substrate table constructed to hold a substrate; and

the positioning system of claim 1 ;

wherein the first component is the support structure and the second component is the substrate table.

8. The lithographic apparatus of claim 7 , wherein the positioning system comprises a measuring device configured to determine an error in the momentary position of the substrate table with respect to a setpoint position in the z direction.

9. A method for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the method comprising:

determining an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and

controlling movement of the other component in a control coordinate based on the determined error;

wherein the measurement coordinate is different from the control coordinate, and

wherein the measurement coordinate is associated with a first direction or a first rotational direction and the control coordinate is associated with a second direction or a second rotational direction that is different from the first direction or the first rotational direction.