IP Library Granted Patent US 9,293,639
Granted Patent B2
US 9,293,639 · App. 14/850,715 · Granted Mar 22, 2016

Vertical solid-state transducers and high voltage solid-state transducers having buried contacts and associated systems and methods

Inventors: Vladimir Odnoblyudov (Eagle, ID); Martin F. Schubert (Boise, ID)
Assignee: Micron Technology, Inc.
H01L33/005H01L21/78H01L27/156H01L33/58H01L2224/73265H01L2933/0016H01L2933/0033H01L2933/0066
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Quick Facts
Patent No.
US 9,293,639
App. No.
14/850,715
Granted
Mar 22, 2016
Kind
B2
Abstract

Solid-state transducers (“SSTs”) and vertical high voltage SSTs having buried contacts are disclosed herein. An SST die in accordance with a particular embodiment can include a transducer structure having a first semiconductor material at a first side of the transducer structure, and a second semiconductor material at a second side of the transducer structure. The SST can further include a plurality of first contacts at the first side and electrically coupled to the first semiconductor material, and a plurality of second contacts extending from the first side to the second semiconductor material and electrically coupled to the second semiconductor material. An interconnect can be formed between at least one first contact and one second contact. The interconnects can be covered with a plurality of package materials.

Claims (35)

1. A method of forming a high voltage light-emitting diode (HVLED), comprising:

forming a light-emitting transducer structure having a first side, a second side facing opposite the first side, a first semiconductor material at the first side, a second semiconductor material at the second side, and a light-emitting active region between the first semiconductor material and the second semiconductor material;

forming a first contact at the first side of the transducer structure, the first contact being electrically coupled to the first semiconductor material;

forming a plurality of features that separate the transducer structure and the first contact into a plurality of junctions,

forming a second contact on each individual junction, the second contact electrically coupled to the second semiconductor material and extending from the first side of the transducer structure to the second semiconductor material;

forming a passivation material over the first contact;

exposing at least a portion of the first contact at each individual junction through the passivation material; and

forming a plurality of interconnects between the second contact and the exposed first contact on adjacent junctions;

wherein the plurality of junctions are electrically coupled in series via the plurality of interconnects.

2. The method of claim 1 wherein forming a plurality of features that separate the transducer structure includes etching a plurality of mesas in the transducer structure.

3. The method of claim 1 , further comprising forming an additional passivation portion over the plurality of interconnects.

4. The method of claim 1 wherein the passivation material and the additional passivation portion include a dielectric material.

5. The method of claim 3 , further comprising depositing barrier material on the first side of the transducer structure.

6. The method of claim 5 , further comprising depositing a seed material on the barrier material at the first side, and patterning the seed material and the barrier material to expose one or more portions of the passivation material or the additional passivation portion.

7. The method of claim 6 , further comprising depositing a metal substrate on the seed material without covering the portions of the passivation material or the additional passivation portion.

8. The method of claim 1 wherein forming a first contact includes forming a reflective p-metal contact.

9. A method of forming a solid state transducer (SST) die having a plurality of junctions coupled in series, the method comprising:

providing a wafer having a substrate and a transducer structure on the substrate, the transducer structure having a first semiconductor material at a first side, a second semiconductor material at a second side opposite the first side and a plurality of trenches dividing the transducer structure into a plurality of individually addressable SST dies having the plurality of junctions;

forming a first contact on each individual junction, the first contact electrically coupled to the first semiconductor material;

forming a second contact electrically coupled to the second semiconductor material on each individual junction, the second contact extending from the first side of the transducer structure to the second semiconductor material;

forming an interconnect between the second contact on a first junction and the first contact on a second junction such that the first and second junctions are electrically coupled in series via the interconnect; and

covering the interconnect with a plurality of package materials.

10. The method of claim 9 wherein covering the interconnect with a plurality of package materials includes—

forming a dielectric patch over the interconnect;

depositing barrier material on the first side of the transducer structure;

depositing a seed material on the barrier material at the first side; and

depositing a metal substrate on the seed material.

11. The method of claim 9 , further comprising:

patterning one or more package materials to expose a first portion of a dielectric material and a second portion of a dielectric material, the second portion spaced apart from the first portion on each individually addressable SST die;

providing a first external terminal and a second external terminal on the first side, the first external terminal electrically isolated on the SST die by the first portion and the second external terminal electrically isolated on the SST die by the second portion; and

coupling the plurality of junctions in series between the first and second terminals via a plurality of covered interconnects.

12. The method of claim 11 , further comprising electrically coupling the first external terminal and the second external terminal to an external component.

13. The method of claim 9 , further comprising forming a thermal pad on the first side of each individually addressable SST die.

14. The method of claim 9 , further comprising providing a third external terminal electrically coupled to the interconnect, the third external terminal configured to cross-connect to another terminal on a second die.

15. The method of claim 9 , further comprising singulating the individually addressable SST dies along dicing lanes.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 20, 2017
From: ODNOBLYUDOV, VLADIMIR; SCHUBERT, MARTIN F.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 042082/0443 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
Continuity (3)
Division 14607839 · Jan 28, 2015
Division 13708526 · Dec 7, 2012
Related Publication 20160020356A1 · Jan 21, 2016