Method of forming copper wiring
A method of forming a copper wiring buried in a recess portion of a predetermined pattern formed in an interlayer insulation layer of a substrate is disclosed. The method includes: forming a manganese oxide film at least on a surface of the recess portion, the manganese oxide film serving as a self-aligned barrier film through reaction with the interlayer insulation layer; performing hydrogen radical treatment with respect to a surface of the manganese oxide film; placing a metal more active than ruthenium on the surface of the manganese oxide film after the hydrogen radical treatment; forming a ruthenium film on the surface where the metal more active than ruthenium is present; and forming a copper film on the ruthenium film by physical vapor deposition (PVD) to bury the copper film in the recess portion.
1. A method of forming a copper wiring buried in a recess portion of a predetermined pattern formed in an interlayer insulation layer of a substrate, the method comprising:
forming a manganese oxide film at least on a surface of the recess portion, the manganese oxide film serving as a self-aligned barrier film through reaction with the interlayer insulation layer;
performing hydrogen radical treatment with respect to a surface of the manganese oxide film;
placing a metal more active than ruthenium on the surface of the manganese oxide film after the hydrogen radical treatment;
forming a ruthenium film on the surface where the metal more active than ruthenium is present; and
forming a copper film on the ruthenium film by physical vapor deposition (PVD) to bury the copper film in the recess portion,
wherein the placing a metal more active than ruthenium is performed by discontinuously forming the metal on a wall portion of the recess portion.
2. The method of claim 1 , wherein the placing a metal more active than ruthenium is performed by depositing the metal by PVD.
3. The method of claim 1 , wherein, in the placing a metal more active than ruthenium, the metal comprises a metal selected from the group consisting of tantalum, cobalt, tungsten, and titanium.
4. The method of claim 1 , wherein the ruthenium film is formed by chemical vapor deposition (CVD).
5. The method of claim 1 , wherein the copper film is formed by plasma sputtering.
6. A non-transitory storage medium operating on a computer and storing a program for controlling a copper wiring forming system, wherein, when the program is executed, the program allows the computer to control the copper wiring forming system to perform the method of claim 1 .