Protection device and related fabrication methods
Protection device structures and related fabrication methods are provided. An exemplary semiconductor protection device includes a first base region of semiconductor material having a first conductivity type, a second base region of semiconductor material having the first conductivity type and a dopant concentration that is less than the first base region, a third base region of semiconductor material having the first conductivity type and a dopant concentration that is greater than the second base region, an emitter region of semiconductor material having a second conductivity type opposite the first conductivity type within the first base region, and a collector region of semiconductor material having the second conductivity type. At least a portion of the second base region resides between the third base region and the first base region and at least a portion of the first base region resides between the emitter region and the collector region.
1. A semiconductor device comprising:
a first region of semiconductor material having a first conductivity type and a first dopant concentration;
a second region of semiconductor material having the first conductivity type and a second dopant concentration that is less than the first dopant concentration;
a third region of semiconductor material having the first conductivity type and a third dopant concentration that is greater than the second dopant concentration, wherein at least an intervening portion of the second region is disposed laterally between the third region and the first region;
a fourth region of semiconductor material within the first region, the fourth region having a second conductivity type opposite the first conductivity type; and
a fifth region of semiconductor material having the second conductivity type, wherein:
at least a portion of the first region is disposed between the fourth region and the fifth region; and
the third region and the fourth region are electrically shorted together.
2. The semiconductor device of claim 1 , wherein the third region resides within the second region.
3. The semiconductor device of claim 1 , wherein the third region is electrically connected to the first region via the intervening portion of the second region.
4. The semiconductor device of claim 1 , wherein:
the first region comprises a first base well region;
the second region comprises a second base well region;
the third region comprises a base contact region;
the fourth region comprises an emitter region; and
the fifth region comprises a collector region.
5. A semiconductor device comprising:
a first region of semiconductor material having a first conductivity type and a first dopant concentration;
a second region of semiconductor material having the first conductivity type and a second dopant concentration that is less than the first dopant concentration;
a third region of semiconductor material having the first conductivity type and a third dopant concentration that is greater than the second dopant concentration, wherein at least an intervening portion of the second region is disposed laterally between the third region and the first region;
a fourth region of semiconductor material within the first region, the fourth region having a second conductivity type opposite the first conductivity type;
a fifth region of semiconductor material having the second conductivity type, wherein at least a portion of the first region is disposed between the fourth region and the fifth region;
a sixth region of semiconductor material within the first region, the sixth region having the second conductivity type; and
a seventh region of semiconductor material within the first region, the seventh region having the first conductivity type, wherein:
the portion of the first region is disposed between the seventh region and the fifth region; and
the sixth region is disposed between the fourth region and the seventh region.
6. The semiconductor device of claim 5 , wherein:
the third region and the fourth region are electrically connected; and
the sixth region and the seventh region are electrically connected.
7. The semiconductor device of claim 6 , wherein:
the third region and the fourth region are coupled to a terminal; and
the sixth region and the seventh region are floating.
8. The semiconductor device of claim 1 , wherein the second dopant concentration is in the range of about 1×10 16 /cm 3 to about 5×10 17 /cm 3 .
9. The semiconductor device of claim 1 , further comprising a sixth region of semiconductor material having the first conductivity type, the first region and the second region residing within the sixth region, wherein:
a dopant concentration of the sixth region is less than the second dopant concentration; and
at least a portion of the sixth region is disposed between the first region and the fifth region.
10. The semiconductor device of claim 9 , wherein:
the first dopant concentration is greater than 1×10 17 /cm 3 ; and
the dopant concentration of the sixth region is less than 8×10 15 /cm 3 .
11. The semiconductor device of claim 1 , further comprising a buried region of semiconductor material having the second conductivity type, wherein:
the fifth region abuts the buried region; and
the first region and the second region overlie the buried region.
12. The semiconductor device of claim 1 , further comprising a substrate including a handle layer of semiconductor material and a buried layer of dielectric material overlying the handle layer, wherein the buried region overlies the buried layer of dielectric material.
13. The semiconductor device of claim 1 , wherein a ratio of the first dopant concentration to the second dopant concentration is greater than or equal to 10.
14. A device package comprising a plurality of protection circuits configured electrically in series between interfaces of the device package, wherein each protection circuit of the plurality comprises the semiconductor device of claim 1 .
15. A protection device structure comprising:
a first base well region of semiconductor material having a first conductivity type and a first dopant concentration;
a second base well region of semiconductor material having the first conductivity type and a second dopant concentration that is less than the first dopant concentration, the second base well region abutting the first base well region;
a base contact region of semiconductor material having the first conductivity type and a third dopant concentration that is greater than the second dopant concentration, the base contact region abutting the second base well region, wherein at least an intervening portion of the second base well region resides between the base contact region and a lateral boundary of the first base well region;
an emitter region of semiconductor material within the first base well region, the emitter region having a second conductivity type opposite the first conductivity type, wherein the emitter region and the base contact region are electrically shorted together; and
a collector region of semiconductor material having the second conductivity type, wherein at least a portion of the first base well region resides between the emitter region and the collector region.
16. A protection device structure comprising:
a first base well region of semiconductor material having a first conductivity type and a first dopant concentration;
a second base well region of semiconductor material having the first conductivity type and a second dopant concentration that is less than the first dopant concentration, the second base well region abutting the first base well region;
a base contact region of semiconductor material having the first conductivity type and a third dopant concentration that is greater than the second dopant concentration, the base contact region abutting the second base well region, wherein at least a portion of the second base well region resides between the base contact region and the first base well region;
an emitter region of semiconductor material within the first base well region, the emitter region having a second conductivity type opposite the first conductivity type, wherein the emitter region and the base contact region are electrically connected;
a collector region of semiconductor material having the second conductivity type, wherein at least a portion of the first base well region resides between the emitter region and the collector region;
a third base well region of semiconductor material having the first conductivity type and a fourth dopant concentration;
a fourth base well region of semiconductor material having the first conductivity type and a fifth dopant concentration that is less than the fourth dopant concentration, the fourth base well region abutting the third base well region;
a second base contact region of semiconductor material having the first conductivity type and a sixth dopant concentration that is greater than the fifth dopant concentration, the second base contact region abutting the fourth base well region, wherein at least a portion of the fourth base well region resides between the second base contact region and the third base well region; and
a second emitter region of semiconductor material within the third base well region, the second emitter region having the second conductivity type, wherein:
the second emitter region and the second base contact region are electrically connected;
the collector region is disposed between the first base well region and the third base well region; and
at least a portion of the third base well region resides between the second emitter region and the collector region.
17. The protection device structure of claim 16 , wherein:
the base contact region and the emitter region are spaced apart by a first distance;
the second base contact region and the second emitter region are spaced apart by a second distance; and
the first distance and the second distance are different.
18. A device including the protection device structure of claim 16 , the device further comprising:
a first interface coupled to the base contact region;
a second interface coupled to the second base contact region; and
functional circuitry coupled to the first interface and the second interface.
19. The semiconductor device of claim 1 , wherein the third region and the fourth region are electrically connected at the same electrical potential.