Substrate processing apparatus and maintenance method thereof

1. A substrate processing apparatus comprising:

a first processing chamber including a main body part, a lid part and a processing space formed in the first processing chamber;

a second processing chamber including a main body part, a lid part and a processing space formed in the second processing chamber;

a transfer chamber that is connected to the first processing chamber and the second processing chamber and has therein a transfer unit configured to transfer a substrate accommodated in the first processing chamber or the second processing chamber;

a frame structure including a pair of column parts and a beam part supported at top portions of the column parts; and

at least one elevating part that is coupled to the beam part to be movable in a horizontal direction along the beam part and wherein the at least one elevating part is configured to move the lid part of the first processing chamber or the second processing chamber in a vertical direction,

wherein a first working space for performing maintenance of the first processing chamber is provided adjacent to the first processing chamber in an arrangement direction of the first processing chamber and the transfer chamber,

wherein a second working space for performing maintenance of the second processing chamber is provided adjacent to the second processing chamber in an arrangement direction of the second processing chamber and the transfer chamber, and

wherein the beam part extends across and above the first working space, the first processing chamber, the transfer chamber, the second processing chamber and the second working space.

2. The substrate processing apparatus of claim 1 , wherein the first working space has an area, when seen from the vertical direction, to the extent that at least the lid part of the first processing chamber is accommodated therein, and the second working space has an area, when seen from the vertical direction, to the extent that at least the lid part of the second processing chamber is accommodated therein.

3. The substrate processing apparatus of claim 1 , wherein the at least one elevating part is coupled to the beam part to be movable above the transfer chamber and at least one of the first working space and the second working space.

4. The substrate processing apparatus of claim 1 , wherein the first processing chamber and the second processing chamber are arranged opposite to each other with the transfer chamber interposed therebetween.

5. The substrate processing apparatus of claim 1 , wherein the at least one elevating part includes a plurality of elevating parts coupled to the beam part.

6. The substrate processing apparatus of claim 1 , further comprising an auxiliary elevating part which is coupled to the beam part to be movable in the horizontal direction along the beam part and is configured to move a component of the first processing chamber or the second processing chamber in the vertical direction.

7. The substrate processing apparatus of claim 1 , wherein the at least one elevating part has a connection member to be connected to the lid part and an elevation mechanism for lifting the connection member.

8. The substrate processing apparatus of claim 1 , wherein the at least one elevating part has an elevation mechanism which is fixed to the lid part to lift the lid part.

9. A maintenance method of a substrate processing apparatus, the substrate processing apparatus including:

a first processing chamber including a main body part, a lid part and a processing space formed in the first processing chamber;

a second processing chamber including a main body part, a lid part and a processing space formed in the second processing chamber;

a transfer chamber that is connected to the first processing chamber and the second processing chamber and has therein a transfer unit configured to transfer a substrate accommodated in the first processing chamber or the second processing chamber;

a frame structure including a pair of column parts and a beam part supported at top portions of the column parts; and

a first elevating part and a second elevating part that are coupled to the beam part to be movable in a horizontal direction along the beam part, and the first elevating part and the second elevating part are configured to move the lid part of the first processing chamber or the second processing chamber in a vertical direction,

wherein a first working space for performing maintenance of the first processing chamber is provided adjacent to the first processing chamber in an arrangement direction of the first processing chamber and the transfer chamber,

wherein a second working space for performing maintenance of the second processing chamber is provided adjacent to the second processing chamber in an arrangement direction of the second processing chamber and the transfer chamber, and

wherein the beam part extends across above the first working space, the first processing chamber, the transfer chamber, the second processing chamber, and the second working space, the method comprising:

lifting the lid part of the first processing chamber by the first elevating part upon the maintenance of the first processing chamber;

moving the lid part of the first processing chamber to an upper position in the first working space by the first elevating part;

lifting a component positioned at the second working space by the second elevating part; and

moving the component to a region above the first processing chamber by the second elevating part.

10. The substrate processing apparatus of claim 1 , wherein the first processing chamber, the transfer chamber and the second processing chamber are positioned directly below the beam part, and

wherein the at least one elevating part is allowed to move directly above the first processing chamber, the transfer chamber, and the second processing chamber when moving in the horizontal direction.

11. The substrate processing apparatus of claim 1 , wherein the frame structure further includes an additional beam part connected to the beam part through a connection portion, and

wherein the at least one elevating part is allowed to change a moving direction at the connection portion from an extension direction of the beam part to an extension direction of the additional beam part.

12. The substrate processing apparatus of claim 1 , further comprising one or more additional processing chambers,

wherein the first processing chamber, the second processing chamber and the additional processing chambers are arranged circumferentially around the transfer chamber.

13. The substrate processing apparatus of claim 1 , wherein the first working space, the first processing chamber, the transfer chamber, the second processing chamber and the second working space are arranged in that order between the column parts.

14. The maintenance method of claim 9 , the method further comprising:

lifting the lid part of the second processing chamber by the second elevating part upon the maintenance of the second processing chamber; and

moving the lid part of the second processing chamber to an upper position in the second working space by the second elevating part.

15. The substrate processing apparatus of claim 1 , wherein the beam part has a straight shape.

16. The maintenance method of claim 9 , wherein the frame structure further includes an additional beam part connected to the beam part through a connection portion, and

the first and the second elevating part are allowed to change a moving direction at the connection portion from an extension direction of the beam part to an extension direction of the additional beam part.

17. The maintenance method of claim 9 , wherein the beam part has a straight shape.