Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
An oxide sintered body which, when made into an oxide semiconductor thin film by sputtering, can achieve low carrier density and high carrier mobility, and a sputtering target using said oxide sintered body are provided. This oxide sintered body contains indium, gallium and zinc as oxides. The gallium content is 0.20 or more and 0.49 or less in terms of Ga/(In+Ga) atomic ratio, and the zinc content is 0.0001 or more and less than 0.08 in terms of Zn/(In+Ga+Zn) atomic ratio. This amorphous oxide semiconductor thin film is formed with the oxide sintered body as a sputtering target, and can achieve a carrier density of 4.0×10 18 cm −3 or less and a carrier mobility of 10 cm 2 /V*s or greater.
1. An oxide sintered body comprising indium, gallium, and zinc as oxides, wherein
a gallium content is 0.20 or more and 0.49 or less in terms of Ga/(In+Ga) atomic ratio, and
a zinc content is 0.0001 or more and less than 0.08 in terms of Zn/(In+Ga+Zn) atomic ratio,
wherein the oxide sintered body comprises an In 2 O 3 phase having a bixbyite-type structure and a formed phase other than the In 2 O 3 phase, the formed phase being selected from the group consisting of: a GaInO 3 phase having a β-Ga 2 O 3 -type structure; a GaInO 3 phase having a β-Ga 2 O 3 -type structure and a (Ga, In) 2 O 3 phase; a GaInO 3 phase having a β-Ga 2 O 3 -type structure and an In 2 Ga 2 ZnO 7 phase having an Yb 2 Fe 3 O 7 -type structure; a (Ga, In) 2 O 3 phase and an In 2 Ga 2 ZnO 7 phase having an Yb 2 Fe 3 O 7 -type structure; and a GaInO 3 phase having a β-Ga 2 O 3 -type structure, a (Ga, In) 2 O 3 phase, and an In 2 Ga 2 ZnO 7 phase having an Yb 2 Fe 3 O 7 -type structure.
2. The oxide sintered body according to claim 1 , wherein the zinc content is 0.01 or more and 0.05 or less in terms of Zn/(In+Ga+Zn) atomic ratio.
3. The oxide sintered body according to claim 1 , wherein the gallium content is 0.20 or more and 0.40 or less in terms of Ga/(In+Ga) atomic ratio.
4. The oxide sintered body according to claim 1 , wherein the oxide sintered body is substantially free of positive divalent elements other than zinc and positive trivalent to positive hexavalent elements other than indium and gallium.
5. The oxide sintered body according to claim 1 , wherein an X-ray diffraction peak intensity ratio of the GaInO 3 phase having a β-Ga 2 O 3 -type structure defined by formula 1 below is in the range of 3% or more and 58% or less:
100 ×I [GaInO 3 phase(−111)]/{ I [In 2 O 3 phase(400)]+ I [GaInO 3 phase(−111)]}[%] Formula 1
(wherein I [In 2 O 3 phase (400)] represents a (400) peak intensity of the In 2 O 3 phase having a bixbyite-type structure, and I [GaInO 3 phase (−111)] represents a (−111) peak intensity of the complex oxide β-GaInO 3 phase having a β-Ga 2 O 3 -type structure).
6. A sputtering target obtained by machining the oxide sintered body according to claim 1 .
7. An amorphous oxide semiconductor thin film obtained by film deposition on a substrate by sputtering using the sputtering target according to claim 6 , followed by heating.
8. The oxide semiconductor thin film according to claim 7 , wherein the oxide semiconductor thin film has a carrier density of less than 4.0×10 18 cm −3 and a carrier mobility of 10 cm 2 /V·s or more.
9. The oxide semiconductor thin film according to claim 8 , wherein the oxide semiconductor thin film has a carrier density of 3.0×10 18 cm −3 or less.
10. The oxide semiconductor thin film according to claim 8 , wherein the oxide semiconductor thin film has a carrier mobility of 15 cm 2 /V·s or more.