Assignment of Assignor's Interest

Recorded: 2019-01-17 Pages: 4

View PDF Order Certified Copy

Assignor

SUMITOMO METAL MINING CO., LTD.

Executed: 2018-11-20

Assignee

MITSUI MINING & SMELTING CO. LTD.

1-11-1 OSAKI, SHINAGAWA-KU, TOKYO, JAPAN

Covered Properties (8)

Oxide Sintered Body and an Oxide Film Obtained by Using It, and a Transparent Base Material Containing It

Patent: 7,611,646 →

Application: 11/604,259 →

Publication: US 2007/0184286

Oxide Sintered Body and Production Method Therefor, Target, and Transparent Conductive Film and Transparent Conductive Substrate Obtained by Using the Same

Patent: 8,440,115 →

Application: 12/452,063 →

Publication: US 2010/0129660

Transparent Conductive Film, Sintered Body Target for Transparent Conductive Film Fabrication, and Transparent Conductive Base Material and Display Device Using the Same

Patent: 7,960,033 →

Application: 12/558,857 →

Publication: US 2010/0038605

Oxide Sintered Body and an Oxide Film Obtained by Using It, and a Transparent Base Material Containing It

Patent: 8,080,182 →

Application: 12/560,887 →

Publication: US 2010/0009157

Transparent Conductive Film, Sintered Body Target for Transparent Conductive Film Fabrication, and Transparent Conductive Base Material and Display Device Using the Same

Patent: 7,998,603 →

Application: 12/579,016 →

Publication: US 2010/0078192

Oxide Sintered Body and Production Method Therefor, Target, and Transparent Conductive Film and Transparent Conductive Substrate Obtained by Using the Same

Patent: 8,801,973 →

Application: 13/834,305 →

Publication: US 2013/0202850

Oxide Sintered Body, Sputtering Target, and Oxide Semiconductor Thin Film Obtained Using Sputtering Target

Patent: 9,670,577 →

Application: 15/117,529 →

Publication: US 2016/0348229

Oxide Sintered Body, Sputtering Target, and Oxide Semiconductor Thin Film Obtained Using Sputtering Target

Patent: 9,670,578 →

Application: 15/117,531 →

Publication: US 2016/0348230

Related Assignments (6)