Structure and formation method for chip package
Structures and formation methods of a chip package are provided. The chip package includes a semiconductor die and a package layer partially or completely encapsulating the semiconductor die. The chip package also includes a polymer layer over the semiconductor die and the package layer. The chip package further includes a dielectric layer over the polymer layer. The dielectric layer is substantially made of a semiconductor oxide material. In addition, the chip package includes a conductive feature in the dielectric layer electrically connected to a conductive pad of the semiconductor die.
1. A chip package, comprising:
a semiconductor die;
a package layer at least partially encapsulating the semiconductor die;
a polymer layer over the semiconductor die and the package layer;
a dielectric layer over the polymer layer, wherein the dielectric layer is substantially made of a semiconductor oxide material; and
a conductive feature in the dielectric layer, wherein the conductive feature is electrically connected to a conductive pad of the semiconductor die, wherein top surfaces of the dielectric layer and the conductive feature are coplanar.
2. The chip package as claimed in claim 1 , wherein the polymer layer is in direct contact with the conductive feature.
3. The chip package as claimed in claim 1 , wherein the polymer layer is in direct contact with the package layer.
4. The chip package as claimed in claim 1 , wherein the dielectric layer is in direct contact with the polymer layer.
5. The chip package as claimed in claim 1 , further comprising a second semiconductor die, wherein the package layer at least partially encapsulating the second semiconductor die.
6. The chip package as claimed in claim 5 , wherein the second semiconductor die is electrically coupled to the semiconductor die through a second conductive feature in the dielectric layer.
7. The chip package of claim 1 , wherein a first portion of the polymer layer on the package layer is thicker than a second portion of the polymer layer on the semiconductor die.
8. The chip package as claimed in claim 1 , further comprising:
a second dielectric layer over the dielectric layer and the conductive feature, wherein the second dielectric layer includes a semiconductor oxide material; and
a second conductive feature in the second dielectric layer electrically connected to the conductive feature.
9. The chip package as claimed in claim 8 , further comprising an etch stop layer between the dielectric layer and the second dielectric layer.
10. The chip package as claimed in claim 1 , further comprising:
a second polymer layer over the dielectric layer; and
a conductive connector over the second polymer layer electrically connected to the conductive feature.
11. A chip package, comprising:
a semiconductor die;
a molding compound layer at least partially encapsulating the semiconductor die;
a protection layer over the semiconductor die and the molding compound layer, wherein a first portion of the protection layer on the molding compound layer is thicker than a second portion of the protection layer on the semiconductor die;
a dielectric layer over the protection layer, wherein the dielectric layer is harder than the protection layer; and
a conductive feature in the dielectric layer, wherein the conductive feature is electrically connected to a conductive pad of the semiconductor die.
12. The chip package as claimed in claim 11 , wherein the protection layer has a substantially planar top surface.
13. The chip package as claimed in claim 11 , wherein the dielectric layer is not made of a polymer material.
14. The chip package as claimed in claim 11 , wherein an interface between the protection layer and the molding compound layer is between an interface between the protection layer and the semiconductor die and a bottom of the semiconductor die.
15. A method for forming a chip package, comprising:
forming a molding compound layer over a semiconductor die to at least partially encapsulate the semiconductor die;
forming a polymer layer over the semiconductor die and the molding compound layer;
forming a dielectric layer over the polymer layer, wherein the dielectric layer is made of a semiconductor oxide material;
patterning the dielectric layer to have a first opening and patterning the polymer to have a second opening; and
together filling the first opening and the second opening with a conductor to form a continuous conductive feature in the dielectric layer and the polymer layer.
16. The method of claim 15 , wherein a first portion of the polymer layer on the molding compound layer.
17. The method for forming a chip package as claimed in claim 15 , further comprising planarizing the polymer layer before the formation of the dielectric layer.
18. The method for forming a chip package as claimed in claim 15 , wherein the dielectric layer is formed using a vapor deposition process.
19. The method for forming a chip package as claimed in claim 15 , further comprising:
planarizing the conductor to remove the conductor outside of the first opening such that a remaining portion of the conductor forms the conductive feature.
20. The method for forming a chip package as claimed in claim 15 , wherein the feature opening comprises a via hole and a trench that are connected with each other.