Lactone photoacid generators and resins and photoresists comprising same
View Patent ↗New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise each PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic device.
1. A photoacid generator having a formula chosen from
wherein M + is a cation.
2. A photoresist composition comprising a polymer and a photoacid generator of claim 1 .
3. A method for forming a photoresist relief image on a substrate comprising:
(a) applying a coating layer of a photoresist composition of claim 2 on a substrate; and
(b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.
4. A photoacid generator of claim 1 having a formula chosen from
wherein M + is a cation.
5. A photoresist composition comprising a polymer and a photoacid generator of claim 4 .
6. A method for forming a photoresist relief image on a substrate comprising:
(a) applying a coating layer of a photoresist composition of claim 5 on a substrate; and
(b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.
7. A photoacid generator of claim 1 having a formula chosen from
wherein M + is a cation.
8. A photoresist composition comprising a polymer and a photoacid generator of claim 7 .
9. A method for forming a photoresist relief image on a substrate comprising:
(a) applying a coating layer of a photoresist composition of claim 8 on a substrate; and
(b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.