IP Library › Granted Patent US 9,741,723
Granted Patent B2
US 9,741,723 · App. 14/852,852 · Granted Aug 22, 2017

Semiconductor device having shallow trench isolation structure

Inventor: Tsuyoshi Tomoyama (Tokyo, JP)
Assignee: Micron Technology, Inc.
H01L27/10897H01L27/10814
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Quick Facts
Patent No.
US 9,741,723
App. No.
14/852,852
Granted
Aug 22, 2017
Kind
B2
Abstract

A semiconductor device is provided, which prevents a case where the widths of word lines become uneven because of a stress developing at the border between a memory cell area and a peripheral circuit area. The semiconductor device 1 has a semiconductor substrate 2 on which a memory cell area MC defined by a peripheral isolation region 3 c . The memory cell area MC has multiple cell active regions k defined by multiple cell isolation regions 3 a, 3 b . Guard active regions GLa, GLb made of the semiconductor substrate are disposed in the border between the memory cell area MC and the peripheral isolation region 3 c to separate the memory cell isolation regions 3 a, 3 b from the peripheral isolation region 3 c.

Claims (41)

1. An apparatus comprising:

an active cell area including a plurality of first active regions isolated from each other, a plurality of word lines extending in a first direction substantially parallel to each other and a plurality of bit lines extending in a second direction substantially parallel to each other, the second direction crossing the first direction;

a dummy cell area provided outside the active cell area, the dummy cell area including a plurality of second active regions arranged in a column along the first direction and isolated from each other;

an isolation area provided outside the dummy cell area; and

a guard active region intervening between the isolation area and the dummy cell area, the guard active region comprising a first guard active region extending longitudinally along the first direction, the first guard active region having a comb shape comprising a continuous straight-linear active region comb shaft extending along the first direction and spaced active region comb teeth angling from the comb shaft away from the isolation area, the spaced active region comb teeth individually alternating with individual of the dummy second active regions in the column along the first direction, the individual comb teeth along the first direction being between every immediately-adjacent of the individual dummy second active regions with no additional active region being between immediately-adjacent of the individual comb teeth.

2. The apparatus of claim 1 wherein the guard active region further comprises a second guard active region extending along the second direction.

3. The apparatus of claim 2 wherein the first active regions are arranged in columns along the first direction, the second guard active region extending longitudinally continuously along the second direction along multiple of the columns of the first active regions.

4. The apparatus of claim 2 wherein the first active regions are arranged in columns along the first direction, the second guard active region extending longitudinally discontinuously along the second direction.

5. The apparatus of claim 1 wherein the spaced active region comb teeth angle from the comb shaft non-perpendicularly.

6. The apparatus of claim 1 wherein the first active regions are arranged in columns along the first direction, the guard active region further comprises a second guard active region extending along the second direction, the second guard active region extending longitudinally discontinuously along the second direction and comprises spaced second guard active regions that are individually aligned with one of first active region columns.

7. The apparatus of claim 6 wherein the spaced second guard active regions are individually of trapezoidal shape in horizontal cross section.

8. An apparatus comprising:

an active cell area including a plurality of first active regions isolated from each other, a plurality of word lines extending in a first direction substantially parallel to each other and a plurality of bit lines extending in a second direction substantially parallel to each other, the second direction crossing the first direction;

a dummy cell area provided outside the active cell area, the dummy cell area including a plurality of second active regions arranged in a column along the first direction and isolated from each other;

an isolation area provided outside the dummy cell area;

a guard active region intervening between the isolation area and the dummy cell area, the guard active region comprising a first guard active region extending longitudinally along the first direction, the first guard active region having a comb shape comprising a continuous straight-linear active region comb shaft extending along the first direction and spaced active region comb teeth angling from the comb shaft away from the isolation area;

the guard active region further comprises a second guard active region extending along the second direction

the first active regions are arranged in columns along the first direction, the second guard active region extending longitudinally discontinuously along the second direction along multiple of the columns of the first active regions; and

the discontinuously-extending second guard active region comprises spaced second guard active regions that are individually aligned with one of first active region columns.

9. The apparatus of claim 8 wherein the spaced second guard active regions are individually of trapezoidal shape in horizontal cross section.

10. An apparatus comprising:

an active cell area including a plurality of first active regions isolated from each other, a plurality of word lines extending in a first direction substantially parallel to each other and a plurality of bit lines extending in a second direction substantially parallel to each other, the second direction crossing the first direction;

a dummy cell area provided outside the active cell area, the dummy cell area including a plurality of second active regions arranged in a column along the first direction and isolated from each other;

an isolation area provided outside the dummy cell area;

a guard active region intervening between the isolation area and the dummy cell area, the guard active region comprising a first guard active region extending longitudinally along the first direction, the first guard active region having a comb shape comprising a continuous straight-linear active region comb shaft extending along the first direction and spaced active region comb teeth angling from the comb shaft away from the isolation area;

the guard active region further comprises a second guard active region extending along the second direction

the first active regions are arranged in columns along the first direction, the second guard active region extending longitudinally discontinuously along the second direction along multiple of the columns of the first active regions; and

the discontinuously-extending second guard active region comprises spaced second guard active regions that are individually of trapezoidal shape in horizontal cross section.

11. An apparatus comprising:

an active cell area including a plurality of first active regions isolated from each other, a plurality of word lines extending in a first direction substantially parallel to each other and a plurality of bit lines extending in a second direction substantially parallel to each other, the second direction crossing the first direction;

a dummy cell area provided outside the active cell area, the dummy cell area including a plurality of second active regions arranged in a column along the first direction and isolated from each other;

an isolation area provided outside the dummy cell area;

a guard active region intervening between the isolation area and the dummy cell area, the guard active region comprising a first guard active region extending longitudinally continuously along the first direction and a second guard active region extending longitudinally discontinuously along the second direction, the discontinuously-extending second guard active region comprising spaced second guard active regions; and

the spaced second guard active regions are individually of trapezoidal shape in horizontal cross section.

12. An apparatus comprising:

an active cell area including a plurality of first active regions isolated from each other, a plurality of word lines extending in a first direction substantially parallel to each other and a plurality of bit lines extending in a second direction substantially parallel to each other, the second direction crossing the first direction;

a dummy cell area provided outside the active cell area, the dummy cell area including a plurality of second active regions arranged in a column along the first direction and isolated from each other;

an isolation area provided outside the dummy cell area;

a guard active region intervening between the isolation area and the dummy cell area, the guard active region comprising a first guard active region extending longitudinally continuously along the first direction and a second guard active region extending longitudinally discontinuously along the second direction, the discontinuously-extending second guard active region comprising spaced second guard active regions; and

the first active regions are arranged in columns along the first direction, the spaced second guard active regions being individually aligned with one of first active region columns.

13. The apparatus of claim 12 wherein the spaced second guard active regions are individually of trapezoidal shape in horizontal cross section.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 14, 2015
From: TOMOYAMA, TSUYOSHI
To: MICRON TECHNOLOGY, INC.
Reel/Frame 036555/0125 →
Priority Claims (1)
JP 2015-024569 · Feb 10, 2015 · national
Continuity (1)
Related Publication 20160233297A1 · Aug 11, 2016