Semiconductor device
A semiconductor device is described, which includes a first transistor, a second transistor, and a capacitor. The second transistor and the capacitor are provided over the first transistor so as to overlap with a gate of the first transistor. A semiconductor layer of the second transistor and a dielectric layer of the capacitor are directly connected to the gate of the first transistor. The second transistor is a vertical transistor, where its channel direction is perpendicular to an upper surface of a semiconductor layer of the first transistor.
1. A semiconductor device comprising:
a first transistor comprising:
a gate electrode including an opening portion having a circular shape;
an insulating layer wherein a side surface of the opening portion and the insulating layer overlap each other; and
a first semiconductor layer wherein the side surface of the opening portion and the first semiconductor layer overlap each other with the insulating layer interposed therebetween; and
a second transistor under the first transistor.
2. The semiconductor device according to claim 1 ,
wherein the gate electrode includes a plurality of an opening portion having a circular shape.
3. The semiconductor device according to claim 1 ,
wherein the first transistor and the second transistor overlap each other.
4. The semiconductor device according to claim 1 ,
wherein a channel length direction between source and drain regions of the first transistor is perpendicular to an upper surface of a second semiconductor layer of the second transistor.
5. The semiconductor device according to claim 1 ,
wherein the first transistor and the second transistor overlap each other, and
wherein a channel length direction between source and drain regions of the first transistor is perpendicular to an upper surface of a second semiconductor layer of the second transistor.
6. The semiconductor device according to claim 4 ,
wherein the first semiconductor layer comprises an oxide semiconductor, and
wherein the second semiconductor layer comprises a material selected from single crystalline silicon, amorphous silicon, and polycrystalline silicon.
7. The semiconductor device according to claim 1 , further comprising a capacitor over the second transistor,
wherein the second transistor and the capacitor overlap each other.
8. The semiconductor device according to claim 1 ,
wherein a channel region of the first transistor and a channel region of the second transistor overlap each other.
9. The semiconductor device according to claim 1 ,
wherein the second transistor is located over an insulating surface.
10. An electronic device comprising the semiconductor device according to claim 1 .
11. A semiconductor device comprising:
a gate electrode including an opening portion having a circular shape;
an insulating layer wherein a side surface of the opening portion and the insulating layer overlap each other;
a semiconductor layer wherein the side surface of the opening portion and the semiconductor layer overlap each other with the insulating layer interposed therebetween; and
a single crystal semiconductor substrate under the gate electrode, the insulating layer and the semiconductor layer.
12. The semiconductor device according to claim 11 ,
wherein the gate electrode includes a plurality of an opening portion having a circular shape.
13. The semiconductor device according to claim 11 ,
wherein the semiconductor layer comprises an oxide semiconductor.
14. The semiconductor device according to claim 11 , further comprising a capacitor over the single crystal semiconductor substrate,
wherein the single crystal semiconductor substrate and the capacitor overlap each other.
15. An electronic device comprising the semiconductor device according to claim 11 .
16. A semiconductor device comprising:
a gate electrode including an opening portion having a circular shape;
a first insulating layer wherein a side surface of the opening portion and the insulating layer overlap each other;
a semiconductor layer wherein the side surface of the opening portion and the semiconductor layer overlap each other with the first insulating layer interposed therebetween;
a single crystal semiconductor substrate under the gate electrode, the first insulating layer and the semiconductor layer;
a second insulating layer over the gate electrode, the first insulating layer and the semiconductor layer; and
an electrode provided in a contact hole in the second insulating layer, the electrode electrically connected to the single crystal semiconductor substrate.
17. The semiconductor device according to claim 16 ,
wherein the gate electrode includes a plurality of an opening portion having a circular shape.
18. The semiconductor device according to claim 16 ,
wherein the semiconductor layer comprises an oxide semiconductor.
19. The semiconductor device according to claim 16 , further comprising a capacitor over the single crystal semiconductor substrate,
wherein the single crystal semiconductor substrate and the capacitor overlap each other.
20. An electronic device comprising the semiconductor device according to claim 16 .