IP Library Granted Patent US 9,762,137
Granted Patent B2
US 9,762,137 · App. 15/299,655 · Granted Sep 12, 2017

Power converter package with integrated output inductor

Inventors: Eung San Cho (Torrance, CA); Dan Clavette (Greene, RI)
Assignee: Infineon Technologies Americas Corp.
H02M7/003H01L21/4825H01L21/4828H01L21/565H01L23/3114H01L23/49562H01L23/49575H01L23/66H01L24/48H01L28/10H01L29/16H01L29/2003H01L29/7787H01L29/7801H02M3/158H02M3/1588H02M7/217H01L2224/45147H01L2224/48091H01L2224/48137H01L2224/73265H01L2924/181H01L2924/19107Y02B70/1466
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,762,137
App. No.
15/299,655
Granted
Sep 12, 2017
Kind
B2
Abstract

In one implementation, a semiconductor package includes a first patterned conductive carrier including partially etched segments. The semiconductor package also includes a control FET having a control drain attached to a first partially etched segment of the first patterned conductive carrier. In addition, the semiconductor package includes a sync FET having a sync source and a sync gate attached to respective second and third partially etched segments of the first patterned conductive carrier. The semiconductor package further includes a second patterned conductive carrier having a switch node segment situated over a control source of the control FET and over a sync drain of the sync FET, as well as an inductor coupled between the switch node segment and an output segment of the second patterned conductive carrier.

Claims (30)

1. A method for fabricating a semiconductor package, said method comprising:

providing a first patterned conductive carrier;

attaching a control drain of a control field-effect transistor (FET) to a first partially etched segment of said first patterned conductive carrier;

attaching a synchronous (sync) source and a sync gate of a sync FET to respective second and third partially etched segments of said first patterned conductive carrier;

attaching a second patterned conductive carrier having a switch node segment for electrically coupling a control source of said control FET to a sync drain of said sync FET; and

coupling an inductor between said switch node segment and an output segment of said second patterned conductive carrier.

2. The method of claim 1 , wherein said first, second, and third partially etched segments of said first patterned conductive carrier are substantially half-etched.

3. The method of claim 1 , wherein said switch node segment of said second patterned conductive carrier is partially etched.

4. The method of claim 1 , wherein said control FET, said sync FET, and said inductor form an output stage of a power converter.

5. The method of claim 1 , wherein at least one of said first patterned conductive carrier and said second patterned conductive carrier comprises at least a portion of a lead frame.

6. The method of claim 1 , wherein said second patterned conductive carrier comprises at least a portion of a lead frame.

7. The method of claim 1 , wherein said control FET and said sync FET comprise silicon power FETs.

8. The method of claim 1 , wherein said control FET and said sync FET comprise group III-Nitride FETs.

9. The method of claim 1 , wherein said control FET and said sync FET comprise group III-Nitride high electron mobility transistors (HEMTs).

10. The method of claim 1 , further comprising attaching a driver integrated circuit for driving at least one of said control FET and said sync FET to a fourth partially etched segment of said first patterned conductive carrier.

11. A method for fabricating a semiconductor package, said method comprising:

providing a first patterned conductive carrier;

attaching a control drain of a control field-effect transistor (FET) to a first partially etched segment of said first patterned conductive carrier;

providing a synchronous (sync) FET having a sync source and a sync gate;

providing a second patterned conductive carrier having a switch node segment situated over a control source of said control FET and over a sync drain of said sync FET for electrically coupling; and

coupling an inductor between said switch node segment and an output segment of said second patterned conductive carrier.

12. The method of claim 11 , wherein said switch node segment of said second patterned conductive carrier is partially etched.

13. The method of claim 11 , wherein said control FET, said sync FET, and said inductor form an output stage of a power converter.

14. The method of claim 11 , wherein at least one of said first patterned conductive carrier and said second patterned conductive carrier comprises at least a portion of a lead frame.

15. The method of claim 11 , wherein said second patterned conductive carrier comprises at least a portion of a lead frame.

16. The method of claim 11 , wherein said control FET and said sync FET comprise silicon power FETs.

17. The method of claim 11 , wherein said control FET and said sync FET comprise group III-Nitride FETs.

18. The method of claim 11 , wherein said control FET and said sync FET comprise group III-Nitride high electron mobility transistors (HEMTs).

19. The method of claim 11 , further comprising:

providing a driver integrated circuit for driving at least one of said control FET and said sync FET.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 2, 2016
From: CHO, EUNG SAN; CLAVETTE, DAN
To: INTERNATIONAL RECTIFIER CORPORATION
Reel/Frame 040497/0711 →
CHANGE OF NAME Recorded Dec 2, 2016
From: INTERNATIONAL RECTIFIER CORPORATION
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 040498/0083 →
Continuity (3)
Division 14855665 · Sep 16, 2015
Provisional Application 62061623 · Oct 8, 2014
Related Publication 20170063250A1 · Mar 2, 2017