Low contact imprint lithography template chuck system for improved overlay correction

1. A chucking system for holding an imprint lithography template comprising:

a chuck body having a template support surface, the template support surface having:

i) a first seal extending from a perimeter of the template support surface,

ii) a second seal extending from the template support surface, with the first seal surrounding the second seal, a first recess defined between the first seal and the second seal, and

iii) a third seal extending from the template support surface, with the first seal and the second seal surrounding the third seal, a second recess defined between the second seal and the third seal;

a plurality of support pins located within the first recess and extending from the template support surface, the support pins adapted to contact the template and maintain the template at a distance d from the first, second, and third seals, and wherein the distance d is such that a vacuum seal can be maintained against the template when a vacuum pressure is applied to the recess, wherein the second recess does not include any support pins; and

one or more fluid channels extending through the chuck body and opening to the first and the second recess; and

a pressure control system operatively coupled to the one or more fluid channels configured to i) apply a vacuum pressure to the first recess to retain the template against the template support surface and configured to ii) apply a vacuum pressure to the second recess to proportionally match back pressure applied to the template such that a minimum load on the support pins is substantially constant.

2. The chucking system of claim 1 wherein the distance d is from 0.05 to 5.0 microns.

3. The chucking system of claim 1 wherein the first and second seals are annular and concentric.

4. The chucking system of claim 3 wherein the plurality of support pins is radially disposed relative to a center of the support chuck.

5. The chucking system of claim 3 wherein the plurality of support pins is provided as radially disposed pairs that are equidistantly spaced and wherein at least one of the pairs brackets at least one of the one or more fluid channels.

6. The chucking system of claim 1 wherein the third seal is annular and concentric with the first and second seals.

7. The chucking system of claim 1 further comprising one or more retractable pins located within the first recess and moveable from a first retracted position to a second extended position, the retractable pins adapted to contact the template when in the second extended position.

8. A chucking system for holding an imprint lithography template, the chucking system comprising:

a chuck body having a template support surface, the template support surface having:

first, second, and third seals extending from the template support surface, with the first seal surrounding the second seal, defining a first recess therebetween, and with the second seal surrounding the third seal, defining a second recess therebetween;

a plurality of support pins located within the first recess and extending from the template support surface, the support pins adapted to contact the template and maintain the template at a distance d from the first and second seals, and wherein the distance d is such that a vacuum seal can be maintained against the template when a vacuum pressure is applied to the recess, wherein the second recess does not include any support pins; and

one or more first fluid channels extending through the chuck body and opening to the first recess and one or more second fluid channels extending through the chuck body and opening to the second recess; and

a pressure control system operatively coupled to the one or more first fluid channels and the one or more second fluid channels and configured to i) apply a vacuum pressure to the first recess to retain the template against the template support surface and configured to ii) apply a vacuum pressure to the second recess to proportionally match back pressure applied to the template such that a minimum load on the support pins is substantially constant.

9. The chucking system of claim 8 wherein distance d is from 0.05 to 5.0 microns.

10. The chucking system of claim 8 wherein the first, second, and third seals are annular and concentric.

11. The chucking system of claim 10 wherein the plurality of support pins is radially disposed relative to a center of the support chuck.

12. The chucking system of claim 10 wherein the plurality of support pins is provided as radially disposed pairs that are equidistantly spaced and wherein at least one of the pairs brackets at least one of the one or more fluid channels.

13. The chucking system of claim 8 further comprising one or more retractable pins located within the first recess and moveable from a first retracted position to a second extended position, the retractable pins adapted to contact the template when in the second extended position.

14. An imprint lithography method comprising:

providing the chucking system of claim 8 ;

positioning an imprint lithography template in proximity with the chucking system with the vacuum pressure applied through the one or more first and second channels to retain the template against the template support surface.

15. The method of claim 14 further comprising the steps of:

contacting the template with polymerizable material disposed on a substrate;

polymerizing the polymerizable material to form a patterned layer on the substrate having a relief pattern conforming to a patterning surface of the template; and

separating the template from the formed patterned layer on the substrate.

16. The method of claim 15 wherein the applied back pressure is varied during the contacting, polymerizing and separating steps, and the increased vacuum pressure to the second recess is likewise varied such that it proportionally matches the varied applied back pressure during the contacting, polymerizing and separating steps.