Integrated circuit package pad and methods of forming
A semiconductor device and method for forming the semiconductor device is provided. The semiconductor device includes an integrated circuit having through vias adjacent to the integrated circuit die, wherein a molding compound is interposed between the integrated circuit die and the through vias. The through vias have a projection extending through a patterned layer, and the through vias may be offset from a surface of the patterned layer. The recess may be formed by selectively removing a seed layer used to form the through vias.
1. A method of manufacturing a semiconductor device, the method comprising:
forming a first layer over a carrier substrate;
forming a second layer over the first layer;
forming a conductive structure on the second layer;
placing an integrated circuit die over the first layer, the integrated circuit die having contact pads facing away from the carrier substrate;
forming a molding compound over the first layer, the molding compound extending along sidewalls of the integrated circuit die and the conductive structure, thereby forming a through via, wherein the through via comprises a through via projection, the through via projection extending through the second layer;
removing the carrier substrate, exposing the first layer; and
completely removing the first layer, thereby exposing the through via.
2. The method of claim 1 , further comprising, after removing the carrier substrate, recessing the molding compound such that the through via protrudes a first distance from a surface of the molding compound.
3. The method of claim 2 , wherein the first distance is equal to or greater than 2 μm.
4. The method of claim 1 , further comprising forming a redistribution layer over the integrated circuit die and the through via prior to removing the carrier substrate.
5. The method of claim 1 , further comprising recessing the second layer such that the through via projection protrudes from a surface of the second layer.
6. The method of claim 5 , wherein the through via projection protrudes from the surface of the second layer by a distance equal to or greater than 2 μm.
7. The method of claim 1 , further comprising forming a release layer over the carrier substrate prior to forming the first layer.
8. The method of claim 1 , wherein a thickness of the second layer is about 2 μm.
9. A method of manufacturing a semiconductor device, the method comprising:
forming a first layer over a carrier substrate, the first layer having an opening;
forming a conductive structure on the first layer, the conductive structure having a conductive structure projection extending into the opening;
placing an integrated circuit die over the first layer;
forming a molding compound over the first layer, the molding compound extending along sidewalls of the integrated circuit die and the conductive structure, thereby forming a through via having a through via projection;
forming a first redistribution layer over the integrated circuit die and the through via;
removing the carrier substrate, exposing the first layer; and
recessing the first layer such that the through via protrudes from first layer.
10. The method of claim 9 , further comprising forming a sacrificial layer, the first layer being formed on the sacrificial layer.
11. The method of claim 10 , further comprising completely removing the sacrificial layer.
12. The method of claim 9 , wherein the through via protrudes a distance equal to or greater than 2 μm from the first layer.
13. The method of claim 9 , wherein a width of the through via projection is less than a width of the through via extending through the molding compound.
14. The method of claim 9 , wherein forming the first layer comprises forming a plurality of dielectric layers and forming a metallization layer between adjacent dielectric layers.
15. The method of claim 14 , where recessing exposes a trace extending along the first layer from a bond pad.
16. The method of claim 9 , further comprising forming a solder joint on the through via projection.
17. A method of manufacturing a semiconductor device, the method comprising:
forming a first layer over a carrier substrate;
forming a through via on the first layer, the through via extending into a dielectric material;
after forming the through via, forming a redistribution layer over the dielectric material;
after forming the redistribution layer, removing the carrier substrate, exposing the first layer;
completely removing the first layer, thereby exposing the through via; and
after completely removing the first layer, recessing material adjacent to the through via such that the through via protrudes.
18. The method of claim 17 , further comprising, prior to forming the through via, forming a second layer over the first layer, the through via extending through an opening in the second layer, the second layer being interposed between the dielectric material and the first layer, wherein recessing material comprises recessing the second layer.
19. The method of claim 18 , wherein a width of the through via extending through the second layer is less than a width of the through via extending into the dielectric material.
20. The method of claim 17 , wherein recessing material comprises recessing molding compound.