Substrate liquid processing apparatus

1. A substrate liquid processing apparatus comprising:

a substrate holding unit configured to hold a substrate;

a processing liquid supplying unit configured to supply a plurality of processing liquids in a switching manner to the substrate held on the substrate holding unit;

an inner cup provided to surround the substrate holding unit laterally to form a first drain path that guides a first processing liquid supplied to the substrate downwardly of the substrate holding unit and drains the first processing liquid;

an outer cup provided to surround the inner cup to form a second drain path that guides a second processing liquid supplied to the substrate downwardly of the substrate holding unit and drains the second processing liquid;

an elevating mechanism configured to move up and down the inner cup between a processing position where the inner cup receives the first processing liquid and a retreat position where the inner cup retreats downwardly from the processing position;

a cover disposed to cover the outside of the outer cup; and

a rotary cup configured to rotate integrally with the substrate holding unit,

wherein the cover includes a cylindrical portion formed in a cylindrical shape and an eaves portion provided in an upper portion of the cylindrical portion and extends inwardly, and forms an exhaust path between the cover and the outer cup,

the exhaust path is commonly connected to the first drain path and the second drain path through a gap formed between the rotary cup and the outer cup at an upper side of inlets of the first drain path and the second drain path,

there is no exhaust path between the inner cup and the outer cup, and

a tip end portion of the outer cup includes a bent portion bent inwardly and downwardly and disposed to be spaced apart from the rotary cup with the gap therebetween, and the gap between the bent portion and the rotary cup forms a flow path to guide a gas flowing out from the substrate holding unit upwardly toward the exhaust path.

2. The substrate liquid processing apparatus of claim 1 , wherein besides the exhaust path, only drain pipes, each of which discharges a processing liquid, is connected to the first drain path and the second drain path.

3. The substrate liquid processing apparatus of claim 1 , wherein

the rotary cup is configured to guide the processing liquids towards a disposition direction of the inner cup or the outer cup that receives the processing liquids,

wherein a part of the exhaust path is formed between the cover and the rotary cup.

4. The substrate liquid processing apparatus of claim 3 , wherein a top surface portion is formed in an upper portion of the outer cup, the top surface portion including a tip end portion that extends inwardly towards an outer peripheral surface of the rotary cup and faces the outer peripheral surface of the rotary cup to form a part of the exhaust path,

a plurality of protrusions is formed in a region of the tip end portion that faces the rotary cup, the plurality of protrusion being arranged along a circumferential direction of the rotary cup to be spaced apart from each other and extending vertically.

5. The substrate liquid processing apparatus of claim 4 , wherein each of the protrusions is formed obliquely such that its upper end portion is positioned closer to an upstream side in a rotational direction of the rotary cup than its lower end portion.

6. The substrate liquid processing apparatus of claim 3 , wherein a top surface portion is formed in an upper portion of the outer cup, the top surface portion including a tip end portion that extends inwardly towards an outer peripheral surface of the rotary cup,

a tip end of the eaves portion constituting the cover faces the outer peripheral surface of the rotary cup, and

a distance between the eaves portion and the rotary cup is narrower than a distance between the rotary cup and the tip end portion.

7. The substrate liquid processing apparatus of claim 1 , wherein the exhaust path includes a collecting exhaust unit formed therein and configured to cause a gas exhausted along the circumferential direction of the outer cup to interflow and then discharge the gas to the outside.

8. The substrate liquid processing apparatus of claim 7 , further comprising:

an inlet configured to allow the gas to flow into the collecting exhaust unit,

wherein the inlet is a slit.

9. The substrate liquid processing apparatus of claim 7 , further comprising:

an inlet configured to allow the gas to flow into the collecting exhaust unit,

wherein an opening area of the inlet is smaller than an opening area of an exhaust port for discharging the gas from the collecting exhaust unit to the outside.

10. The substrate liquid processing apparatus of claim 7 , wherein the collecting exhaust unit is formed at a lower side of the inner cup and the outer cup.

11. The substrate liquid processing apparatus of claim 7 , wherein the inner cup and the outer cup are provided with drain pipes each communicating with a drain port configured to drain the first processing liquid or the second processing liquid, and the drain pipes penetrates through the collecting exhaust unit.

12. The substrate liquid processing apparatus of claim 7 , wherein the elevating mechanism moves up and down the inner cup through a support member configured to support the inner cup, the elevating mechanism is disposed below the collecting exhaust unit, and the support member penetrates through the collecting exhaust unit.

13. The substrate liquid processing apparatus of claim 7 , further comprising:

a cleaning mechanism configured to clean the inside of the collecting exhaust unit.

14. The substrate liquid processing apparatus of claim 1 , further comprising:

a cleaning mechanism configured to clean the inside of the exhaust path.

15. The substrate liquid processing apparatus of claim 1 , wherein a pressure in a flow path between the inner cup and the outer cup is higher than a pressure in the exhaust path.