Substrate processing apparatus and substrate processing method
According to one embodiment, a substrate processing apparatus includes a first liquid supplier, a second liquid supplier, and a controller. The first liquid supplier supplies a substrate with a sulfuric acid solution having a first temperature equal to or higher than the boiling point of hydrogen peroxide water. The second liquid supplier supplies a surface to be treated of the substrate with a mixture of sulfuric acid solution and hydrogen peroxide water having a second temperature lower than the first temperature. The controller controls the first liquid supplier to supply the sulfuric acid solution so as to heat the substrate to the boiling point of hydrogen peroxide water or higher. When the temperature of the substrate becomes equal to or higher than the second temperature, the controller controls the first liquid supplier to stop supplying the sulfuric acid solution and controls the second liquid supplier to supply the mixture.
1. A substrate processing apparatus comprising:
a first liquid supplier configured to supply a surface to be treated of a substrate with a sulfuric acid solution having a first temperature that is equal to or higher than a boiling point of hydrogen peroxide water;
a second liquid supplier configured to supply the surface to be treated of the substrate with a mixture of sulfuric acid solution and hydrogen peroxide water, the mixture having a second temperature that is lower than the first temperature;
a third liquid supplier configured to supply an opposite surface to the surface to be treated of the substrate with a sulfuric acid solution having a third temperature that is equal to or higher than the first temperature;
a controller configured to control the first liquid supplier to supply the sulfuric acid solution having the first temperature so as to heat the substrate to the boiling point of hydrogen peroxide water or higher, and, when temperature of the substrate becomes equal to or higher than the boiling point of hydrogen peroxide water, control the first liquid supplier to stop supplying the sulfuric acid solution having the first temperature, control the second liquid supplier to supply the mixture having the second temperature, and control the third liquid supplier to supply the sulfuric acid solution having the third temperature so as to maintain the temperature of the substrate equal to or higher than the boiling point of hydrogen peroxide water;
a first reservoir configured to retain the sulfuric acid solution;
a circulation tube configured to circulate the sulfuric acid solution in the first reservoir;
a second reservoir configured to retain the hydrogen peroxide water;
a first heating unit configured to heat the sulfuric acid solution retained in the first reservoir;
a liquid return part configured to collect the sulfuric acid solution and the mixture supplied to the substrate from the first liquid supplier, the second liquid supplier, and the third liquid supplier in the first reservoir as recovered liquid; and
a first supply tube, a second supply tube, and a third supply tube, each connected to the circulation tube, in which the sulfuric acid solution retained in the first reservoir flows, wherein
the first liquid supplier includes the first supply tube,
the second liquid supplier includes the second supply tube,
the third liquid supplier includes the third supply tube,
the first supply tube is provided with a second heating unit configured to heat the sulfuric acid solution flowing therein,
the second supply tube is connected to a mixing tube in which the hydrogen peroxide water retained in the second reservoir flows, and
the third supply tube is provided with a third heating unit configured to heat the sulfuric acid solution flowing therein.
2. The substrate processing apparatus according to claim 1 , wherein the liquid return part including a recovery tube and a cooling part configured to cool the recovered liquid flowing in the recovery tube.
3. The substrate processing apparatus according to claim 1 , wherein the first heating unit is located in the circulation tube.
4. The substrate processing apparatus according to claim 3 , wherein temperature at which the first heating unit heats the sulfuric acid solution flowing in the circulation tube is below boiling point of the sulfuric acid solution.
5. The substrate processing apparatus according to claim 1 , wherein
weight percent concentration of sulfuric acid in the sulfuric acid solution is 65% or higher,
the first temperature is in a range of 150° C. to 308° C., and
the second temperature is below 150° C.
6. The substrate processing apparatus according to claim 1 , wherein the second heating unit is further configured to heat the sulfuric acid solution flowing in the first supply tube to the first temperature.
7. The substrate processing apparatus according to claim 1 , wherein the third heating unit is further configured to heat the sulfuric acid solution flowing in the third supply tube to the third temperature.
8. The substrate processing apparatus according to claim 1 , wherein
the first liquid supplier includes a first nozzle connected to the first supply tube,
the third liquid supplier includes a third nozzle connected to the third supply tube, and
the third nozzle is located in a position facing the first nozzle.
9. The substrate processing apparatus according to claim 1 , wherein
the controller is further configured to control the first liquid supplier to supply the sulfuric acid solution having the first temperature and the third liquid supplier to supply the sulfuric acid solution having the third temperature at the same time.
10. The substrate processing apparatus according to claim 1 , wherein
the second liquid supplier includes a second nozzle connected to the second supply tube, and
the second nozzle is moved from a periphery of the surface to be treated of the substrate to its center when the second liquid supplier supplies the surface to be treated of the substrate with the mixture of the sulfuric acid solution and the hydrogen peroxide water from the second nozzle.