Self aligned memory element and wordline
View Patent ↗An organic polymer memory cell is provided having an organic polymer layer and an electrode layer formed over a first conductive (e.g., copper) layer (e.g., bitline). The memory cells are connected to a second conductive layer (e.g., forming a wordline), and more particularly the top of the electrode layer of the memory cells to the second conductive layer. Optionally, a conductivity facilitating layer is formed over the conductive layer. Dielectric material separates the memory cells. The memory cells are self-aligned with the bitlines formed in the first conductive layer and the wordlines formed in the second conductive layer.
1. An organic memory device, comprising:
a first conductive layer that serves as a bitline;
an organic polymer layer over and in direct contact with at least part of the first conductive layer;
an electrode layer over and in direct contact with the organic polymer layer;
a second conductive layer that serves as a wordline over and in direct contact with the electrode layer; and,
a dielectric material surrounding and in direct contact with at least a portion of the organic polymer layer and the electrode layer, at least some of the dielectric material applied after the second conductive layer has been applied and etched, etching of the second conductive laying facilitating self-alignment of the organic memory device.
2. The organic memory device of claim 1 , the organic polymer layer having an impedance that can be selectively programmed to one of at least two states.
3. The organic memory device of claim 1 , further comprising a conductivity facilitating layer over the first conductive layer and below the organic polymer layer, wherein the conductivity facilitating layer has relatively stable states that match the relatively stable states of the organic polymer layer.
4. The memory device of claim 3 , the conductivity facilitating layer comprising at least one of copper sulfide (Cu 2−x S y , CuS), copper oxide (CuO, Cu 2 O), manganese oxide (MnO 2 ), titanium dioxide (TiO 2 ), indium oxide (I 3 O 4 ), silver sulfide (Ag 2−x S 2 , AgS), silver-copper-sulfide complex (Ag y Cu 2−x S 2 ), gold sulfide (Au 2 S, AuS), cerium sulfate (Ce(SO 4 ) 2 ), ammonium persulfate ((NH 4 ) 2 S 2 O 8 ), iron oxide (Fe 3 O 4 ), lithium complexes (Li x TiS 2 , Li x TiSe 2 , Li x NbSe 3 , Li x Nb 3 Se 3 ), and Palladium hydride (H x Pd), where x and y are selected to produce desired properties.
5. The organic memory device of claim 1 , the organic polymer layer being a conjugated organic material.
6. The organic memory device of claim 1 , the organic polymer layer being selected from the group comprising: polyacetylene, polyphenylacetylene, polydiphenylacetylene, polyaniline, poly(p-phenylene vinylene), polythiophene, polyporphyrins, porphyrinic macrocycles, thiol derivatized polyporphyrins, polymetallocenes, polyferrocenes, polyphthalocyanines, polyvinylenes, polypyrroles, polydiphenylacetylene and polystiroles.
7. The organic memory device of claim 1 , the organic layer formed via a chemical vapor deposition process.
8. The organic memory device of claim 1 , the organic layer formed via a gas phase reaction process.
9. The organic memory device of claim 1 , the organic layer formed via a spin coating process.
10. The organic memory device of claim 1 , the electrode layer comprising at least one of amorphous carbon, tantalum, tantalum nitride (TaN), titanium and titanium nitride (TiN).
11. The memory device of claim 1 , the first conductive layer comprising at least one of copper, aluminum, chromium, germanium, gold, magnesium, manganese, indium, iron, nickel, palladium, platinum, silver, titanium, zinc, alloys thereof, indium-tin oxide, polysilicon, doped amorphous silicon, metal suicides, Hastelloy®, Kovar®, Invar, Monel®, Inconel®, brass, stainless steel and magnesium-silver alloy.
12. The organic memory device of claim 1 , the dielectric material including at least one of silicon oxide (SiO), silicon dioxide (SiO 2 ), silicon nitride (Si 3 N 4 ), (SiN), silicon oxynitride (SiO x N y ), fluorinated silicon oxide (SiO x F y ), polysilicon, amorphous silicon, tetraethyorthosilicate (TEOS), phosphosilicate glass (PSG) and borophosphosilicate glass (BPSG).
13. The organic memory device of claim 1 , the organic polymer layer having a thickness of about 0.001 μm or more and about 5 μm or less.