Polymerizable compositions; polymer, resist, and lithography method
View Patent ↗A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.
1. A polymerizable composition for the production of a resist, comprising at least one unsaturated, polymerizable monomer having at least one silicon atom and at least one carbonyl group, a monomer of the general formula:
wherein:
R 1 , is selected from the group consisting of H and alkyl radicals;
R 2 , is selected from the group consisting of H and alkyl radicals;
R 3 is selected from the group consisting of H and alkyl radicals;
R 4 comprises alkyl radicals and/or a silicon-containing compound;
R 5 comprises alkyl radicals and/or a silicon-containing compound;
R 6 comprises alkyl radicals; and
wherein R 1 , R 2 , R 3, and R 6 are either identical or different from one another and
wherein either R 4 or R 5 both comprise a silicon-containing compound.
2. The polymerizable composition as claimed in claim 1 wherein at least one of R 1, R 2, R 3 comprises a methyl radical.
3. The polymerizable composition as claimed in claim 1 wherein at least one of R 4 and R 5 comprises a methyl radical or siloxane.
4. The polymerizable composition as claimed in claim 1 wherein R 6 comprises a tert-butyl radical.
5. The polymerizable composition as claimed in claim 1 , wherein at least one alkyl radical has a chain length of C 1 to C 8 .
6. A polymer prepared by polymerization of at least the composition as claimed in claim 1 .