IP Library Granted Patent US 7,522,018
Granted Patent B2
US 7,522,018 · App. 10/538,110 · Granted Apr 21, 2009

Electro-acoustic resonator with a top electrode layer thinner than a bottom electrode layer

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Quick Facts
Patent No.
US 7,522,018
App. No.
10/538,110
Granted
Apr 21, 2009
Kind
B2
Abstract

An electro-acoustic resonator ( 1, 8, 17 ) of the membrane or FBAR type ( 1 ) or the solidly-mounted or SBAR type ( 8 ), with electrodes comprising a single conducting layer or multiple conducting layers, i.e. sandwich construction ( 17 ) with an optimum coupling factor kr and thus an improved filter bandwidth. The optimum coupling factor kr is achieved by the arrangement that the top electrode ( 6, 15, 25 ) is thinner than the bottom electrode ( 4, 13, 23 ). The coupling factor is independent of the resonator's layout defined by the mask.

Claims (14)

1. Electro-acoustic resonator ( 1 , 8 , 17 ) comprising a membrane structure FBAR ( 1 ) with a layer structure comprising a piezoelectric layer ( 5 , 14 , 24 ) and a top ( 6 , 15 , 25 ) and a bottom ( 4 , 13 , 23 ) electrode layer, with the thickness (T 1 , T 2 , . . . T 6 ) of the two electrode layers being unequal, characterised in that the top electrode layer (T 1 , T 3 , T 5 ) is thinner than the bottom (T 2 , T 4 , T 6 ) electrode layer to increase a filter bandwidth of the electro-acoustic resonator.

2. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , characterised in that a relative thickness of the two electrode layers maximizes the filter bandwidth.

3. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , characterised in that at least one of the electrode layers is formed by a stack of conductive materials ( 25 , 26 or 22 , 23 ).

4. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 3 , characterised in that between the stacked conductive materials of the electrode layers ( 22 and 23 and/or 25 and 26 ) a conductive thin diffusion baffler is formed.

5. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 4 , characterised in that the diffusion baffler between the stacked conductive materials of the electrode layers ( 22 and 23 and/or 25 and 26 ) consists of titanium nitride (TiN), or titanium (Ti), or consists of combinations of titanium nitride (TiN) and titanium (Ti).

6. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 3 , characterised in that in the stack, the conductive material ( 23 , 25 ) in contact with the piezoelectric layer ( 24 ) has a lower acoustic impedance than the conductive material ( 22 , 26 ) that is not in contact with the piezoelectric layer ( 24 ).

7. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 3 , characterised in that in the stack, the conductive material ( 23 , 25 ) that is in contact with the piezoelectric layer ( 24 ) has a higher acoustic impedance than the conductive material ( 22 , 26 ) that is not in contact with the piezoelectric layer ( 24 ).

8. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 7 , characterised in that the conductive material with the higher acoustic impedance comprises platinum (Pt), tungsten (W), molybdenum (Mo), titan-tungsten (Ti x W 1-x , 0<x<1), Gold (Au).

9. Electro-acoustic ( 1 , 8 , 17 ) resonator as claimed in claim 7 , characterised in that the conductive material with the lower acoustic impedance comprises Aluminium (Al).

10. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , characterised in that the electrode layers ( 4 , 6 , 13 , 15 , 23 , 25 ) comprise Molybdenum (Mo) and that, for a resonant frequency in the region of 2 GHz, the thickness (T 1 , T 3 , T 5 ) of the top Molybdenum layer ( 6 , 15 , 25 ) is in the region of 200 nm and the thickness (T 2 , T 4 , T 6 ) of the bottom Molybdenum layer ( 4 , 13 , 23 ) is in the region of 300 nm, these thicknesses scaling approximately inversely with resonant frequency.

11. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , characterised in that the electrode layers ( 4 , 6 , 13 , 15 , 23 , 25 ) comprise platinum (Pt) and that, for a resonant frequency in the region of 2 GHz, the thickness (T 1 , T 3 , T 5 ) of the top platinum layer ( 6 , 15 , 25 ) is in the region of 50 nm and the thickness (T 2 , T 4 , T 6 ) of the bottom platinum layer ( 4 , 13 , 23 ) is in the region of 150 nm, these thicknesses scaling approximately inversely with resonant frequency.

12. Use of an electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , as a component of a radio frequency (RF) filter, or as a component used in a sensor, or used in an ultrasonic transducer, or used in an array of ultrasonic transducers.

13. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , characterised in that a relative thickness of the two electrode layers maximizes a coupling factor of the electro-acoustic resonator ( 1 , 8 , 17 ).

14. Electro-acoustic resonator ( 1 , 8 , 17 ) as claimed in claim 1 , characterised in that a coupling factor of the electro-acoustic resonator ( 1 , 8 , 17 ) is greater than 0.215.

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded Sep 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050315/0785 →
MERGER Recorded Jun 16, 2016
From: TRIQUINT SEMICONDUCTOR, INC.
To: QORVO US, INC.
Reel/Frame 039050/0193 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 4, 2011
From: NXP B.V.
To: TRIQUINT SEMICONDUCTOR, INC.
Reel/Frame 026703/0713 →
SECURITY AGREEMENT Recorded Jun 17, 2009
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 022835/0306 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 17, 2007
From: KONINKLIJKE PHILIPS ELECTRONICS N.V.
To: NXP B.V.
Reel/Frame 019719/0843 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2005
From: MILSOM, ROBERT FREDERICK; LOBL, HANS-PETER
To: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
Reel/Frame 017347/0495 →