Low power magnetoelectronic device structures utilizing enhanced permeability materials
View Patent ↗Low power magnetoelectronic device structures and methods for making the same are provided. One magnetoelectronic device structure ( 100 ) comprises a programming line ( 104 ), a magnetoelectronic device ( 102 ) magnetically coupled to the programming line, and an enhanced permeability dielectric material ( 106 ) disposed adjacent the magnetoelectronic device. The enhanced permeability dielectric material has a permeability no less than approximately 1.5. A method for making a magnetoelectronic device structure is also provided. The method comprises fabricating a magnetoelectronic device ( 102 ) and depositing a conducting line ( 104 ). A layer of enhanced permeability dielectric material ( 106 ) having a permeability no less than approximately 1.5 is formed, wherein after the step of fabricating a magnetoelectronic device and the step of depositing a conducting line, the layer of enhanced permeability dielectric material is situated adjacent the magnetoelectronic device.
1. A method for making a magnetoelectronic device structure, the method comprising:
fabricating a magnetoelectronic device;
depositing a conducting line; and
forming, between the magnetoelectronic device and the conducting line, a first layer of enhanced permeability dielectric material having a magnetic permeability no less than approximately 1.5, such that the conducting line is configured to generate a magnetic field that passes through the first layer and acts on the magnetoelectronic device.
2. The method for making a magnetoelectronic device structure of claim 1 , wherein the step of forming a first layer of enhanced permeability dielectric material is performed after the step of depositing a conducting line and before the step of fabricating a magnetoelectronic device.
3. The method for making a magnetoelectronic device structure of claim 1 , wherein the step of forming a first layer of enhanced permeability dielectric material is performed after the step of fabricating a magnetoelectronic device and before the step of depositing a conducting line.
4. The method for making a magnetoelectronic device structure of claim 1 , wherein the step of forming a first layer of enhanced permeability dielectric material having a magnetic permeability no less than approximately 1.5 comprises the step of forming a first layer of enhanced permeability dielectric material having a magnetic permeability in the range of about 2 to about 60.
5. The method for making a magnetoelectronic device structure of claim 1 , further comprising the step of forming a layer of an additional enhanced permeability material having a magnetic permeability no less than approximately 1.5, wherein after the step of fabricating a magnetoelectronic device and the step of depositing a conducting line, said layer of an additional enhanced permeability material is situated between said magnetoelectronic device and said conducting line.
6. The method for making a magnetoelectronic device structure of claim 1 , wherein the step of forming a first layer of enhanced permeability dielectric material comprises the step of forming a layer comprising at least one material selected from the group consisting of alumina, silicon dioxide, silicon nitride, and oxides of magnesium, hafnium, tantalum, titanium, vanadium, and niobium and at least one magnetic material selected from the group consisting of nickel, iron, cobalt, alloys of nickel, alloys of iron, alloys of cobalt, and combinations thereof.
7. The method for making a magnetoelectronic device structure of claim 1 , wherein the step of forming a first layer of enhanced permeability dielectric material comprises the step of forming alternating layers of at least one dielectric material and at least one magnetic nanoparticle material that exhibits super-paramagnetic behavior, wherein each of said layers of at least one magnetic nanoparticle material comprises a discontinuous layer of magnetic nanoparticles.
8. The method for making a magnetoelectronic device structure of claim 7 , wherein the step of forming a first layer of enhanced permeability dielectric material further comprises the step of forming an oxygen barrier layer overlying each of said layers of at least one magnetic nanoparticle material.
9. The method of claim 1 , wherein forming the enhanced permeability dielectric material includes:
depositing a discontinuous layer of nanoparticles exhibiting superparamagnetic properties;
forming a layer of dielectric material overlying said discontinuous layer of nanoparticles; and
alternately repeating the step of depositing a discontinuous layer of nanoparticles and the step of forming a layer of dielectric material until a stack that comprises a plurality of layers of said dielectric material and discontinuous layers of said nanoparticles interposed therebetween is formed having approximately a predetermined thickness.
10. The method of claim 9 , wherein the step of depositing a discontinuous layer of nanoparticles exhibiting super-paramagnetic properties comprises the step of depositing a discontinuous layer of nanoparticles having a size in the range of about 2 nm to about 10 nm.