Layout determination method, method of manufacturing semiconductor devices, and computer readable program

1. A layout determination method for determining a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process, comprising:

(a) determining a number of semiconductor devices to be created on one substrate using a computer, based on exposure data of the semiconductor devices, a time limit of delivery of the semiconductor devices and a number of substrates to be used for production of the semiconductor devices;

(b) obtaining coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data; and

(c) determining the layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices,

wherein said step (a) calculates the number of semiconductor devices to be created on one substrate, based on a time required for exposure per one semiconductor device, an exposure time per one layer of each semiconductor device, a total number of shots per one semiconductor device, and an exposure time per one shot.

2. The layout determination method as claimed in claim 1 , wherein said step (c) arranges the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

3. The layout determination method as claimed in claim 1 , wherein said step (c) arranges dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

4. A layout determination method for determining a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process, comprising:

(a) determining a number of semiconductor devices to be created on one substrate using a computer, based on exposure data of the semiconductor devices, a time limit of delivery of the semiconductor devices and a number of substrates to be used for production of the semiconductor devices;

(b) obtaining coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data; and

(c) determining the layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices,

wherein said step (a) calculates the number of semiconductor devices to be created on one substrate, based on a number of shots per one layer of each semiconductor device, a number of layers of each semiconductor device, a total number of shots per one semiconductor device, and a yield of the semiconductor devices.

5. The layout determination method as claimed in claim 4 , wherein said step (c) arranges the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

6. The layout determination method as claimed in claim 4 , wherein said step (c) arranges dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

7. A method of manufacturing semiconductor devices, comprising:

(a) determining a number of semiconductor devices to be created on one substrate using a computer, based on exposure data of semiconductor devices, time limit of delivery of the semiconductor devices and a number of substrates used for production of the semiconductor devices;

(b) obtaining coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data;

(c) determining a layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices; and

(d) exposing patterns of the exposure data on the substrate, based on the layout,

wherein said step (a) calculates the number of semiconductor devices to be created on one substrate, based on a time required for exposure per one semiconductor device, an exposure time per one layer of each semiconductor device, a total number of shots per one semiconductor device, and an exposure time per one shot.

8. The method of manufacturing semiconductor devices as claimed in claim 7 , wherein said step (c) arranges the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

9. The method of manufacturing semiconductor devices as claimed in claim 7 , wherein said step (c) arranges dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

10. A method of manufacturing semiconductor devices, comprising:

(a) determining a number of semiconductor devices to be created on one substrate using a computer, based on exposure data of semiconductor devices, time limit of delivery of the semiconductor devices and a number of substrates used for production of the semiconductor devices;

(b) obtaining coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data;

(c) determining a layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices; and

(d) exposing patterns of the exposure data on the substrate, based on the layout,

wherein said step (a) calculates the number of semiconductor devices to be created on one substrate, based on a number of shots per one layer of each semiconductor device, a number of layers of each semiconductor device, a total number of shots per one semiconductor device, and a yield of the semiconductor devices.

11. The method of manufacturing semiconductor devices as claimed in claim 10 , wherein said step (c) arranges the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

12. The method of manufacturing semiconductor devices as claimed in claim 10 , wherein said step (c) arranges dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

13. A computer-readable program for causing a computer to determine a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process, said computer-readable program comprising:

a number determining procedure causing the computer to determine a number of semiconductor devices to be created on one substrate, based on exposure data of the semiconductor devices, a time limit of delivery of the semiconductor devices and a number of substrates to be used for production of the semiconductor devices;

an obtaining procedure causing the computer to obtain coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data; and

a layout determining procedure causing the computer to determine the layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices,

wherein said number determining procedure causes the computer to calculate the number of semiconductor devices to be created on one substrate, based on a time required for exposure per one semiconductor device, an exposure time per one layer of each semiconductor device, a total number of shots per one semiconductor device, and an exposure time per one shot.

14. The computer-readable program as claimed in claim 13 , wherein said layout determining procedure causes the computer to arrange the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

15. The computer-readable program as claimed in claim 13 , wherein said layout determining procedure causes the computer to arrange dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

16. A computer-readable program for causing a computer to determine a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process, said computer-readable program comprising:

a number determining procedure causing the computer to determine a number of semiconductor devices to be created on one substrate, based on exposure data of the semiconductor devices, a time limit of delivery of the semiconductor devices and a number of substrates to be used for production of the semiconductor devices;

an obtaining procedure causing the computer to obtain coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data; and

a layout determining procedure causing the computer to determine the layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices,

wherein said number determining procedure causes the computer to calculate the number of semiconductor devices to be created on one substrate, based on a number of shots per one layer of each semiconductor device, a number of layers of each semiconductor device, a total number of shots per one semiconductor device, and a yield of the semiconductor devices.

17. The computer-readable program as claimed in claim 16 , wherein said layout determining procedure causes the computer to arrange the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

18. The computer-readable program as claimed in claim 16 , wherein said layout determining procedure causes the computer to arrange dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

19. A computer-readable program for causing a computer to manufacture semiconductor devices, said computer-readable program comprising:

a number determining procedure causing the computer to determine a number of semiconductor devices to be created on one substrate, based on exposure data of semiconductor devices, time limit of delivery of the semiconductor devices and a number of substrates used for production of the semiconductor devices;

an obtaining procedure causing the computer to obtain coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data;

a layout determining procedure causing the computer to determine a layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices; and

an exposing procedure causing the computer to expose patterns of the exposure data on the substrate, based on the layout

wherein said number determining procedure causes the computer to calculate the number of semiconductor devices to be created on one substrate, based on a time required for exposure per one semiconductor device, an exposure time per one layer of each semiconductor device, a total number of shots per one semiconductor device, and an exposure time per one shot.

20. The computer-readable program as claimed in claim 19 , wherein said layout determining procedure causes the computer to arrange the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

21. The computer-readable program as claimed in claim 19 , wherein said layout determining procedure causes the computer to arrange dummy patterns in a periphery of the semiconductor devices to be created on the substrate.

22. A computer-readable program for causing a computer to manufacture semiconductor devices, said computer-readable program comprising:

a number determining procedure causing the computer to determine a number of semiconductor devices to be created on one substrate, based on exposure data of semiconductor devices, time limit of delivery of the semiconductor devices and a number of substrates used for production of the semiconductor devices;

an obtaining procedure causing the computer to obtain coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data;

a layout determining procedure causing the computer to determine a layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices; and

an exposing procedure causing the computer to expose patterns of the exposure data on the substrate, based on the layout,

wherein said number determining procedure causes the computer to calculate the number of semiconductor devices to be created on one substrate, based on a number of shots per one layer of each semiconductor device, a number of layers of each semiconductor device, a total number of shots per one semiconductor device, and a yield of the semiconductor devices.

23. The computer-readable program as claimed in claim 22 , wherein said layout determining procedure causes the computer to arrange the semiconductor devices to be created on the substrate with priority starting from a central portion on the substrate.

24. The computer-readable program as claimed in claim 22 , wherein said layout determining procedure causes the computer to arrange dummy patterns in a periphery of the semiconductor devices to be created on the substrate.