IP Library Granted Patent US 7,589,945
Granted Patent B2
US 7,589,945 · App. 11/513,638 · Granted Sep 15, 2009

Distributed electrostatic discharge protection circuit with varying clamp size

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Quick Facts
Patent No.
US 7,589,945
App. No.
11/513,638
Granted
Sep 15, 2009
Kind
B2
Abstract

An integrated circuit includes a first I/O cell disposed at a substrate, the first I/O cell including a first electrostatic discharge (ESD) clamp transistor device. The first ESD clamp transistor device includes a control electrode, a first current electrode coupled to a first voltage reference bus, and second current electrode coupled to a second voltage reference bus. The first ESD clamp transistor device has a first channel width. The integrated circuit further includes a second I/O cell including a second ESD clamp transistor device. The second ESD clamp transistor device includes a control electrode, a first current electrode coupled to the first voltage reference bus, and second current electrode coupled to the second voltage reference bus. The second ESD clamp transistor device has a second channel width different than the first channel width.

Claims (41)

1. An integrated circuit comprising:

a first voltage reference bus comprising a first terminating end and a second terminating end;

a second voltage reference bus;

a plurality of input/output (I/O) cells distributed along a length of the first voltage reference bus and comprising:

a first subset of I/O cells disposed proximal to one of the first terminating end or the second terminating end of the first voltage reference bus; and

a second subset of I/O cells disposed distal from the first terminating end and the second terminating end of the first voltage reference bus; and

wherein each of the first subset of the I/O cells comprises a first electrostatic discharge (ESD) clamp transistor device, the first ESD clamp transistor device comprising a current electrode coupled to the first voltage reference bus and a current electrode coupled to the second voltage reference bus, wherein the first ESD clamp transistor device comprises a first channel width; and

wherein each of the second subset of the I/O cells comprises a second ESD clamp transistor device comprising a current electrode coupled to the first voltage reference bus and a current electrode coupled to the second voltage reference bus, wherein the second ESD clamp transistor device comprises a second channel width, and wherein the second channel width is less than the first channel width.

2. The integrated circuit of claim 1 , further comprising:

a transient detector circuit having an output coupled to a trigger bus; and

wherein a control electrode of the first ESD clamp transistor device of each of the first subset of I/O cells and a control electrode of the second ESD clamp transistor device of each of the second subset of the I/O cells is coupled to the trigger bus.

3. The integrated circuit of claim 1 , wherein the first channel width is at least twice the second channel width.

4. The integrated circuit of claim 1 , wherein each of a third subset of the I/O cells comprises a third ESD clamp transistor device comprising a current electrode coupled to the first voltage reference bus and a current electrode coupled to the second voltage reference bus, wherein the third ESD clamp transistor device comprises a third channel width, and wherein the third channel width is different than the first channel width and the second channel width.

5. The integrated circuit of claim 4 , wherein:

the third subset of the I/O cells comprises I/O cells disposed between the first subset and the second subset; and

the first channel width is greater than the third channel width, and the third channel width is greater than the second channel width.

6. The integrated circuit of claim 1 , wherein:

each of a third subset of the I/O cells comprises a transient detector circuit having an output coupled to at least one corresponding ESD clamp transistor device of at least one I/O cell of the first subset or the second subset; and

wherein the I/O cells of the third subset are disposed among the I/O cells of the first subset and the second subset.

7. The integrated circuit of claim 1 , wherein:

a first I/O cell of the second subset of I/O cells comprises a cell circuit component; and

a total layout area of the ESD clamp transistor device and the cell circuit component of the first I/O cell is not substantially greater than a total layout area of the first ESD clamp transistor device.

8. The integrated circuit of claim 7 , wherein the cell circuit component comprises at least one of output driver circuitry, a decoupling capacitor, or a transient detector circuit.

9. A bank of input/output (I/O) cells comprising:

a first I/O cell comprising a first electrostatic discharge (ESD) clamp transistor device comprising a control electrode, a first current electrode coupled to a first voltage reference bus, and second current electrode coupled to a second voltage reference bus, the first ESD clamp transistor device having a first channel width, and wherein the first I/O cell positioned at an end region of the bank of I/O cells; and

a second I/O cell comprising a second ESD clamp transistor device comprising a control electrode, a first current electrode coupled to the first voltage reference bus, and second current electrode coupled to the second voltage reference bus, the second ESD clamp transistor device having a second channel width different less than the first channel width, and wherein the second I/O cell is positioned at an interior region of the bank of I/O cells.

10. The bank of I/O cells of claim 9 , wherein the first channel width is at least twice the second channel width.

11. The bank of I/O cells of claim 9 , wherein:

the second I/O cell comprises a cell component disposed adjacent to the second ESD clamp transistor device;

the first ESD clamp transistor device is disposed at a first position of the first I/O cell and the second ESD clamp transistor device and the cell component are disposed at a second position of the second I/O cell, the second position corresponding to the first position; and

a combined layout area of the second ESD clamp transistor device and the cell component is not substantially larger than a layout area of the first ESD clamp transistor device.

12. The bank of I/O cells of claim 11 , wherein a total layout area of the first I/O cell is substantially equal to a total layout area of the second I/O cell.

13. The bank of I/O cells of claim 11 , wherein the cell component comprises output driver circuitry.

14. The bank of I/O cells of claim 11 , wherein the cell component comprises a transient detector circuit comprising an output coupled to a control electrode of the second ESD clamp transistor device.

15. A method for compensating for electrostatic discharge (ESD) at an integrated circuit, the method comprising:

forming a first set of input/output (I/O) cells, wherein the first set represents an end region of a bank of I/O cells and wherein each I/O cell of the first set comprises a first ESD clamp transistor device comprising a current electrode coupled to a first voltage reference bus and a current electrode coupled to a second voltage reference bus, the first ESD clamp transistor device having a first channel width; and

forming a second set of I/O cells, wherein the second set represents an interior region of the bank of I/O cells and wherein each I/O cell of the second set comprises a second ESD clamp transistor device comprising a current electrode coupled to the first voltage reference bus and a current electrode coupled to the second voltage reference bus, the second ESD clamp transistor device having a second channel width less than the first channel width.

16. The method of claim 15 , wherein the first channel width is based on a position of the first set within the bank of I/O cells and the second channel width is based on a position of the second set within the bank of I/O cells.

17. The method of claim 15 , wherein the first channel width is at least twice the second channel width.

18. The method of claim 15 , further comprising:

forming a third set of I/O cells, wherein the third set represents a third portion of the bank of I/O cells and wherein each I/O cell of the third set comprises a third ESD clamp transistor device comprising a current electrode coupled to the first voltage reference bus and a current electrode coupled to the second voltage reference bus, the third ESD clamp transistor device having a third channel width different from the first channel width and the second channel width.

Assignments (32)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 042762 FRAME 0145. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051145/0184 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 038017 FRAME 0058. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051030/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 042985 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051029/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12298143 PREVIOUSLY RECORDED ON REEL 039361 FRAME 0212. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Oct 22, 2019
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 051029/0387 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050745/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12681366 PREVIOUSLY RECORDED ON REEL 039361 FRAME 0212. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded May 9, 2017
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 042762/0145 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12681366 PREVIOUSLY RECORDED ON REEL 038017 FRAME 0058. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded May 9, 2017
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 042985/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 12092129 PREVIOUSLY RECORDED ON REEL 038017 FRAME 0058. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT SUPPLEMENT. Recorded Jul 14, 2016
From: NXP B.V.
To: MORGAN STANLEY SENIOR FUNDING, INC.
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SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
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SECURITY AGREEMENT SUPPLEMENT Recorded Mar 7, 2016
From: NXP B.V.
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
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PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
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PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
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PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
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PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
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SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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SECURITY AGREEMENT Recorded Jun 18, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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SECURITY AGREEMENT Recorded May 13, 2010
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 024397/0001 →
SECURITY AGREEMENT Recorded Feb 3, 2010
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A.
Reel/Frame 023882/0834 →
SECURITY AGREEMENT Recorded Feb 2, 2007
From: FREESCALE SEMICONDUCTOR, INC.; FREESCALE ACQUISITION CORPORATION; FREESCALE ACQUISITION HOLDINGS CORP.; FREESCALE HOLDINGS (BERMUDA) III, LTD.
To: CITIBANK, N.A. AS COLLATERAL AGENT
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ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2006
From: MILLER, JAMES W.; ETHERTON, MELANIE; KHAZHINSKY, MICHAEL G.; STOCKINGER, MICHAEL
To: FREESCALE SEMICONDUCTOR, INC.
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