In-die focus monitoring with binary mask
View Patent ↗Focus monitoring for a photolithographic applications is provided by illuminating a photoresist layer with a light beam transmitted through a first binary mask to define a circuit pattern on an underlying substrate and then illuminating the photoresist layer with an unbalanced off-axis light beam transmitted through a second binary mask. The second mask contains a shifting feature configuration in one portion, while another portion blocks light transmission to the chip design area of the photoresist. After development of the photoresist layer, the pattern formed by illumination of the second mask can be compared with a predefined reference feature on the photoresist layer to determine whether a shift, if any, is within acceptable focus limits.
1. A method for monitoring focus, the method comprising:
a first step of illuminating a photoresist layer on a substrate with a light beam transmitted through a first mask to define a circuit pattern on the substrate;
a second step of illuminating the photoresist layer with an unbalanced off-axis light beam transmitted through a second mask, the second mask containing a shifting feature configuration;
developing the photoresist layer;
comparing a pattern on the photoresist layer formed by the second illuminating step with a predefined reference feature on the photoresist layer; and
determining whether the substrate position relative to the masks produces appropriate focus on the photoresist layer in response to the comparing step.
2. A method as recited in claim 1 , wherein the light beam transmitted in the first step is a balanced off-axis light beam.
3. A method as recited in claim 2 , wherein the balanced off-axis light beam is annular illumination.
4. A method as recited in claim 2 , wherein the balanced off-axis light beam is dipole illumination.
5. A method as recited in claim 2 , wherein the balanced off-axis illumination is C-quad illumination.
6. A method as recited in claim 2 , wherein the balanced off-axis illumination is quadrupole illumination.
7. A method as recited in claim 2 , wherein the balanced off-axis illumination is quasar illumination.
8. A method as recited in claim 2 , wherein the unbalanced off-axis light beam is monopole illumination.
9. A method as recited in claim 8 , wherein the center sigma of the balanced off-axis light beam is the same as the center sigma of the monopole illumination.
10. A method as recited in claim 1 , wherein the first mask contains a reference portion configured to form the predefined reference feature on the photoresist and the first step of illuminating comprises exposing the photoresist through the first mask reference portion.
11. A method as recited in claim 1 , wherein the second mask comprises a portion configured to form the predetermined reference feature as well as the shifting feature configuration.
12. A method as recited in claim 11 , wherein the configured portion of the second mask is dimensioned to prevent a lateral shift of the predetermined reference feature.
13. A method as recited in claim 1 , wherein the first mask and second mask are binary masks.
14. A method as recited in claim 1 , wherein the predetermined reference feature and the shifting feature comprise bar configurations.
15. A method as recited in claim 1 , the predetermined reference feature and the shifting feature comprise box configurations.
16. A method as recited in claim 1 , wherein the step of comparing comprises determining an amount of shift between the predefined reference feature and the shifting feature on the surface of the photoresist layer.
17. A focus monitoring apparatus comprising:
a first binary mask comprising a pattern to be applied to a photoresist layer by exposure of the photoresist to a balance off-axis light illumination transmitted through the first binary mask; and
a second binary mask comprising an image feature to be applied to the photoresist layer by exposure of the photoresist to an unbalanced off-axis light illumination transmitted through the second binary mask;
wherein development of the photoresist after exposure to illumination through the first binary mask and the second binary mask provides an indication on the photoresist of a shift between an image feature of the pattern and a predetermined reference feature, to determine whether the photoresist position relative to the masks produces appropriate focus on the photoresist.
18. A focus monitoring apparatus as recited in claim 17 , wherein the center sigma of the balanced off-axis light illumination is the same as the center sigma of the unbalance off-axis light illumination.
19. A focus monitoring apparatus as recited in claim 17 , wherein the pattern of the first binary mask comprises a portion defining a circuit pattern on a substrate underlying the photoresist layer and a portion defining the reference feature.
20. A focus monitoring apparatus as recited in claim 19 , wherein the predetermined reference feature comprises a chip design feature.
21. A focus monitoring apparatus as recited in claim 17 , wherein the second binary mask comprises a pattern for defining the reference feature.