Method and system for detection of solid materials in a plasma using an electromagnetic circuit
View Patent ↗A method for solid material detection in a medium includes receiving an exhaust gas downstream with respect to a workpiece from which a photoresist material is removed. An electromagnetic circuit is configured to include the exhaust gas, the exhaust gas is excited with electromagnetic energy and an impedance value of the electromagnetic circuit is determined, wherein the impedance value corresponds to an amount of solid material within the exhaust gas.
1. A method for detection of solid materials present within a medium of interest, the method comprising:
configuring the medium of interest within an electromagnetic circuit;
exciting the medium of interest using electromagnetic energy; and
determining an impedance value of said electromagnetic circuit, wherein said impedance value corresponds to an amount of solid material within the medium of interest.
2. The method of claim 1 , wherein said electromagnetic circuit further comprises at least one of a microwave circuit and a radio frequency (RF) circuit.
3. The method of claim 1 , wherein the medium of interest is excited into a plasma state by at least one of a microwave energy source and an RF source.
4. The method of claim 1 , wherein said determining an impedance value further comprises determining a reflection coefficient magnitude value and a reflection coefficient phase value.
5. The method of claim 4 , further comprising determining variations of said reflection coefficient magnitude and phase values over time.
6. A method for solid material detection in a photoresist removal system, the method comprising:
receiving an exhaust gas downstream with respect to a workpiece from which a photoresist material is removed;
configuring an electromagnetic circuit to include said exhaust gas;
exciting said exhaust gas using electromagnetic energy; and
determining an impedance value of said electromagnetic circuit, wherein said impedance value corresponds to an amount of solid material within the exhaust gas.
7. The method of claim 6 , wherein said electromagnetic circuit further comprises at least one of a microwave circuit and a radio frequency (RF) circuit.
8. The method of claim 6 , wherein said exhaust gas is excited into a plasma state by at least one of a microwave energy source and an RF source.
9. The method of claim 6 , wherein said determining an impedance value further comprises determining an impedance magnitude value and an impedance phase value.
10. The method of claim 9 , further comprising determining variations of said impedance magnitude and phase values over time.
11. The method of claim 9 , wherein said electromagnetic energy is applied at a power of about 200 watts (W) to about 400 W.
12. The method of claim 9 , wherein said electromagnetic energy is applied at a power of about 300 watts (W).
13. The method of claim 9 , further comprising utilizing said determined impedance values for endpoint detection of removal of said photoresist material.