HTO offset and BL trench process for memory device to improve device performance
View Patent ↗Memory devices having an increased effective channel length and/or improved TPD characteristics, and methods of making the memory devices are provided. The memory devices contain two or more memory cells on a semiconductor substrate and bit line dielectrics between the memory cells. The bit line dielectrics can extend into the semiconductor. The memory cell contains a charge trapping dielectric stack, a poly gate, a pair of pocket implant regions, and a pair of bit lines. The bit line can be formed by an implant process at a higher energy level and/or a higher concentration of dopants without suffering device short channel roll off issues because spacers at bit line sidewalls constrain the implant in narrower implant regions.
1. A memory device comprising:
two or more memory cells on a semiconductor substrate separated by an opening, each memory cell comprising a charge trapping dielectric stack and a poly gate on the semiconductor substrate and two pocket implant regions adjacent and under the charge trapping dielectric stack in the semiconductor substrate;
spacers, comprising oxides or nitrides, adjacent to side surfaces of the charge trapping dielectric stack and the poly gate and in the opening;
bit line trenches between the spacers under the opening that extend into the semiconductor substrate and form bit line openings;
bit line dielectrics in the bit line openings between the memory cells, the bit line dielectrics extending into the semiconductor substrate; and
bit lines in the semiconductor substrate adjacent to the charge trapping dielectric stack and under the bit line openings.
2. The memory device of claim 1 , wherein the bit line has a concentration of dopants of about 5E17 atoms/cm 3 or more and about 1E21 atoms/cm 3 or less.
3. The memory device of claim 1 , wherein the bit line has a depth of about 20 nm or more and about 300 nm or less.
4. The memory device of claim 1 , wherein the pocket implant region comprises boron and the bit line comprises arsenic.
5. The memory device of claim 1 , wherein an effective channel length of the memory cell is about 70% or more and about 100% or less of a length of the poly gate.
6. The memory device of claim 1 , wherein the length of the bit line is constrained so that an effective channel length of the memory cell is about 70% or more and about 100% or less of the length of the poly gate.
7. The memory device of claim 1 , wherein the bit line is formed so that a portion of the bit line overlaps with a portion of the pocket implant region.
8. The memory device of claim 1 , wherein the bit line dielectrics and the spacer comprise the same material.
9. A memory device comprising:
two or more memory cells on a semiconductor substrate separated by an opening, each memory cell comprising a charge trapping dielectric stack and a poly gate on the semiconductor substrate and two pocket implant regions adjacent and under the charge trapping dielectric stack in the semiconductor substrate, the charge trapping dielectric stack comprising a silicon nitride charge trapping dielectric;
spacers, comprising oxides or nitrides, adjacent to side surfaces of the charge trapping dielectric stack and the poly gate and in the opening;
bit line trenches between the spacers under the opening that extend into the semiconductor substrate and form bit line openings;
bit line dielectrics in the bit line openings between the memory cells, the bit line dielectrics extending into the semiconductor substrate; and
bit lines in the semiconductor substrate adjacent to the charge trapping dielectric stack and under the bit line openings.
10. The memory device of claim 1 , wherein the silicon nitride charge trapping dielectric comprises silicon rich silicon nitride.
11. The memory device of claim 1 , wherein the bit line length is about 70% or more and about 140% or less of the length of the bit line opening.
12. The memory device of claim 1 , wherein the bit line has a concentration of dopants of about 1E18 atoms/cm 3 or more and about 1E21 atoms/cm 3 or less.
13. The memory device of claim 1 , wherein the length of the bit line is constrained so that an effective channel length of the memory cell is about 80% or more and about 100% or less of the length of the poly gate.
14. A dual-bit memory device comprising:
two or more dual-bit memory cells on a semiconductor substrate separated by an opening, each dual-bit memory cell comprising a charge trapping dielectric stack and a poly gate on the semiconductor substrate and two pocket implant regions adjacent and under the charge trapping dielectric stack in the semiconductor substrate;
spacers, comprising oxides or nitrides, adjacent to side surfaces of the charge trapping dielectric stack and the poly gate and in the opening;
bit line trenches between the spacers under the opening that extend into the semiconductor substrate and form bit line openings;
bit line dielectrics in the bit line openings between the dual-bit memory cells, the bit line dielectrics extending into the semiconductor substrate; and
bit lines in the semiconductor substrate adjacent to the charge trapping dielectric stack and under the bit line openings.
15. The dual-bit memory device of claim 14 , wherein the charge trapping dielectric comprises silicon nitride.
16. The dual-bit memory device of claim 14 , wherein the bit line length is about 70% or more and about 140% or less of the length of the bit line opening.
17. The dual-bit memory device of claim 14 , wherein the bit line has a concentration of dopants of about 1E18 atoms/cm 3 or more and about 1E21 atoms/cm 3 or less.
18. The dual-bit memory device of claim 14 , wherein the length of the bit line is constrained so that an effective channel length of the memory cell is about 80% or more and about 100% or less of the length of the poly gate.
19. The dual-bit memory device of claim 14 , wherein the bit line is formed so that a portion of the bit line overlaps with a portion of the pocket implant region.
20. The dual-bit memory device of claim 14 , wherein the bit line dielectric and the spacer comprise the same material.