Three-dimensional nonvolatile memory and method of fabrication
View Patent ↗A three-dimensional memory is provided that includes a first memory level and a second memory level monolithically formed above the first memory level. The first memory level includes a first steering element coupled in series with and vertically stacked above or below a first non-volatile state change element. The second memory level includes a second steering element coupled in series with and vertically stacked above or below a second non-volatile state change element. Other aspects are also provided.
1. A three-dimensional memory comprising:
a first memory level comprising a first pillar-shaped memory cell comprising a first steering element coupled in series with and vertically stacked above or below a first non-volatile re-writable state change element; and
a second memory level monolithically formed above the first memory level, the second memory level comprising a second pillar-shaped memory cell comprising a second steering element coupled in series with and vertically stacked above or below a second non-volatile re-writable state change element.
2. The three-dimensional memory of claim 1 , wherein each of the first and second steering elements comprises a p-n diode, a p-i-n diode or a Schottky diode.
3. The three-dimensional memory of claim 1 , wherein each of the first and second state change elements comprises a reversible resistance-switching element.
4. The three-dimensional memory of claim 1 , wherein each of the first and second state change elements comprises more than two resistance states.
5. The three-dimensional memory of claim 1 , wherein each of the first and second state change elements comprises more than two memory states.
6. A three-dimensional memory comprising:
a first memory array comprising a plurality of pillar-shaped first memory cells, each first memory cell comprising a first steering element coupled in series with and vertically stacked above or below a first non-volatile re-writable state change element; and
a second memory array monolithically formed above the first memory array, the second memory level comprising a plurality of pillar-shaped second memory cells, each second memory cell comprising a second steering element coupled in series with and vertically stacked above or below a second non-volatile re-writable state change element.
7. The three-dimensional memory of claim 6 , wherein each of the first and second steering elements comprises a p-n diode, a p-i-n diode or a Schottky diode.
8. The three-dimensional memory of claim 6 , wherein each of the first and second state change elements comprises a reversible resistance-switching element.
9. The three-dimensional memory of claim 6 , wherein each of the first and second state change elements comprises more than two resistance states.
10. The three-dimensional memory of claim 6 , wherein each of the first and second state change elements comprises more than two memory states.
11. A three-dimensional memory comprising:
a first memory cell comprising a first steering element coupled in series with a first non-volatile re-writable state change element; and
a second memory cell formed above the first memory cell, the second memory cell comprising a second steering element coupled in series with a second non-volatile re-writable state change element,
wherein the first memory cell and the second memory cell each comprise an active area disposed above a substrate.
12. The three-dimensional memory of claim 11 , wherein the substrate comprises silicon.
13. The three-dimensional memory of claim 11 , wherein each of the first and second state change elements comprises a reversible resistance-switching element.
14. The three-dimensional memory of claim 11 , further comprising peripheral circuitry built in the substrate.
15. The three-dimensional memory of claim 14 , wherein the peripheral circuitry comprises a sense amplifier.
16. The three-dimensional memory of claim 14 , wherein the peripheral circuitry comprises a write driver.