IP Library Granted Patent US 9,257,393
Granted Patent B1
US 9,257,393 · App. 14/500,698 · Granted Feb 9, 2016

Fan-out wafer level packages containing embedded ground plane interconnect structures and methods for the fabrication thereof

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,257,393
App. No.
14/500,698
Granted
Feb 9, 2016
Kind
B1
Abstract

Fan-Out Wafer Level Packages (FO-WLPs) and methods for fabricating FO-WLPs containing Embedded Ground Planes (EGPs) and backside EGP interconnect structures are provided. In one embodiment, the method includes electrically coupling an EGP to a backside terminal of a first microelectronic device through a backside EGP interconnect structure. A molded package body is formed around the first microelectronic device, the EGP, and the EGP interconnect structure. The molded package body has a frontside at which the EGP is exposed. One or more Redistribution Layers are formed over the frontside of the molded packaged body and contain at least one interconnect line electrically coupled to the backside contact through the EGP and the backside EGP interconnect structure.

Claims (37)

1. A method for fabricating a Fan-Out Wafer Level Package (FO-WLP), comprising:

electrically coupling an Embedded Ground Plane (EGP) to a backside contact of a first microelectronic device through a backside EGP interconnect structure;

electrically coupling the backside EGP interconnect structure between the EGP and a backside contact of a second microelectronic device;

forming a molded package body around the first microelectronic device, the second microelectronic device, the EGP, and the backside EGP interconnect structure, the molded package body having a frontside at which the EGP is exposed; and

producing one or more Redistribution Layers (RDLs) over the frontside of the molded packaged body, the one or more RDLs containing at least one interconnect line electrically coupled to the backside contact of the first microelectronic device through the EGP and the backside EGP interconnect structure.

2. The method of claim 1 wherein electrically coupling the backside EGP interconnect structure between the EGP and the backside contact comprises bonding the backside EGP interconnect structure to the backside contact utilizing an electrically-conductive adhesive.

3. The method of claim 1 further comprising:

placing the first microelectronic device on a temporary substrate; and

after placing the first microelectronic device, positioning the backside EGP interconnect structure to extend at least partially over the backside contact.

4. The method of claim 3 further comprises dispensing an electrically-conductive bonding material onto at least one of the backside EGP interconnect structure and the backside contact prior to positioning the backside EGP interconnect structure to extend at least partially over the backside contact.

5. The method of claim 3 further comprising placing the EGP on the temporary substrate at a location laterally adjacent the first microelectronic device and underlying the backside EGP interconnect structure.

6. The method of claim 1 wherein the first and second microelectronic devices have different heights, and wherein the method further comprises fabricating the backside EGP interconnect structure to have at least one step feature accommodating the difference in the heights of the first and second microelectronic devices.

7. The method of claim 1 further comprising electrically coupling the backside EGP interconnect structure between the EGP and a first terminal of a Surface Mount Device (SMD).

8. The method of claim 7 wherein the producing comprises producing the one or more RDLs to contain an interconnect line electrically coupled to a second terminal of the SMD.

9. The method of claim 1 wherein the EGP and the backside EGP interconnect structure are integrally formed as a single piece, and wherein the method further comprises:

placing the microelectronic device on a temporary substrate; and

positioning the EGP and backside EGP interconnect structure adjacent the microelectronic component such that the EGP interconnect structure extends at least partially over the backside contact.

10. The method of claim 1 wherein the EGP and the backside EGP interconnect structure are separate pieces, and wherein the method further comprises:

placing the first microelectronic device and the EGP on a temporary substrate; and

positioning the backside EGP interconnect structure over the EGP and over the first microelectronic device after placing the EGP and the first microelectronic device on the temporary substrate.

11. The method of claim 10 further comprising bonding the backside EGP interconnect structure to the EGP utilizing an electrically-conductive bonding material.

12. A method for fabricating a Fan-Out Wafer Level Package (FO-WLP), comprising:

placing a microelectronic device on a temporary substrate;

electrically coupling an Embedded Ground Plane (EGP) to a backside contact of a first microelectronic device through a backside EGP interconnect structure, the EGP and the backside EGP interconnect structure integrally formed as a single piece and positioned adjacent the microelectronic component such that the EGP interconnect structure extends at least partially over the backside contact;

forming a molded package body around the first microelectronic device, the EGP, and the backside EGP interconnect structure, the molded package body having a frontside at which the EGP is exposed; and

producing one or more Redistribution Layers (RDLs) over the frontside of the molded packaged body, the one or more RDLs containing at least one interconnect line electrically coupled to the backside contact through the EGP and the backside EGP interconnect structure.

13. The method of claim 12 further comprising electrically coupling the backside EGP interconnect structure between the EGP and a first terminal of a Surface Mount Device (SMD).

14. The method of claim 13 wherein the producing comprises producing the RDLs to contain an interconnect line electrically coupled to a second terminal of the SMD.

15. A method for fabricating a Fan-Out Wafer Level Package (FO-WLP), comprising:

placing an Embedded Ground Plane (EGP) and a first microelectronic device having a backside contact on a temporary substrate;

dispensing an electrically-conductive conductive bonding material over selected regions of the EGP;

after dispensing the electrically-conductive bonding material, positioning a backside EGP interconnect structure over the EGP, over the first microelectronic device, and in contact with the electrically-conductive conductive bonding material to electrically couple the EGP to the backside contact through a backside EGP interconnect structure;

forming a molded package body around the first microelectronic device, the EGP, and the backside EGP interconnect structure, the molded package body having a frontside at which the EGP is exposed; and

producing one or more Redistribution Layers (RDLs) over the frontside of the molded packaged body, the one or more RDLs containing at least one interconnect line electrically coupled to the backside contact through the EGP and the backside EGP interconnect structure.

16. The method of claim 15 wherein the backside EGP interconnect structure comprises a metal clip.

17. The method of claim 15 wherein the electrically-conductive bonding material comprises a metal-filled epoxy, and wherein the method further comprises curing the metal-filled epoxy after positioning the backside EGP interconnect structure over the EGP, over the first microelectronic device, and in contact with the electrically-conductive bonding material.

18. The method of claim 15 further comprising electrically coupling the backside EGP interconnect structure between the EGP and a first terminal of a Surface Mount Device (SMD).

Assignments (15)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 7, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037458/0460 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 7, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037458/0502 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0921 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 4, 2014
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 034153/0027 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 4, 2014
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 034160/0370 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 4, 2014
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 034160/0351 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 29, 2014
From: GONG, ZHIWEI; YAP, WENG F.
To: FREESCALE SEMICONDUCTOR INC.
Reel/Frame 033844/0093 →