Tunable filter structures and design structures
View Patent ↗Tunable filter structures, methods of manufacture and design structures are disclosed. The method of forming a filter structure includes forming a piezoelectric resonance filter over a cavity structure. The forming of the piezoelectric resonance filter includes: forming an upper electrode on one side of a piezoelectric material; and forming a lower electrode on an opposing side of the piezoelectric material. The method further includes forming a micro-electro-mechanical structure (MEMS) cantilever beam at a location in which, upon actuation, makes contact with the piezoelectric resonance filter.
1. A method, comprising:
determining a first resonant frequency of a filter; and
loading the filter to change the first resonant frequency to a second resonant frequency different than the first resonant frequency,
wherein the loading is provided by activating a MEMS bar or portions thereof to place a load onto the filter, and
wherein the activating the MEMS bar comprises applying a pull-down voltage to the MEMS bar.
2. The method of claim 1 , wherein the loading the filter to change the first resonant frequency to the second resonant frequency different than the first resonant frequency is by movement of the filter towards an electrode, by activating the electrode.
3. The method of claim 1 , wherein the filter is a Film Bulk Acoustic Resonator.
4. The method of claim 1 , wherein the MEMS bar is a single cantilever beam structure.
5. The method of claim 1 , wherein the applying the pull-down voltage to the MEMS bar pulls the MEMS bar into contact with the filter.
6. The method of claim 1 , wherein the MEMS bar and the filter are separated a space within a range of 0.1 to 5 μm before loading of the filter.