Setting channel voltages of adjustable resistance bit line structures using dummy word lines
View Patent ↗Methods for reducing leakage currents through unselected memory cells of a memory array during a memory operation. In some cases, the leakage currents through the unselected memory cells of the memory array may be reduced by setting an adjustable resistance bit line structure connected to the unselected memory cells into a non-conducting state. The adjustable resistance bit line structure may comprise a bit line structure in which the resistance of an intrinsic (or near intrinsic) polysilicon portion of the bit line structure may be adjusted via an application of a voltage to a select gate portion of the bit line structure that is not directly connected to the intrinsic polysilicon portion. The intrinsic polysilicon portion may be set into a conducting state or a non-conducting state based on the voltage applied to the select gate portion.
1. A method for operating a non-volatile memory, comprising:
determining a first word line within a memory array;
determining a first global bit line within the memory array, the first global bit line is connected to an adjustable resistance bit line structure that includes an adjustable resistance local bit line and a select gate, a first memory cell is arranged between the adjustable resistance local bit line and the first word line;
determining a dummy word line within the memory array, the dummy word line comprises the word line closest to the first global bit line;
determining a dummy word line voltage; and
performing a memory operation on the memory array, the memory operation includes applying a selected word line voltage to the first word line and applying a selected bit line voltage to the first global bit line while the adjustable resistance local bit line is set into a conducting state, the memory operation includes applying the dummy word line voltage to the dummy word line while the adjustable resistance local bit line is set into the conducting state, the adjustable resistance local bit line comprises undoped polysilicon.
2. The method of claim 1 , further comprising:
determining an unselected word line voltage to be applied to a set of unselected word lines, a set of unselected memory cells is arranged between the adjustable resistance local bit line and the set of unselected word lines, the dummy word line voltage is greater than the unselected word line voltage, the memory operation includes applying the unselected word line voltage to the set of unselected word lines during the memory operation.
3. The method of claim 1 , wherein:
the determining a dummy word line voltage includes determining the dummy word line voltage based on the memory operation, the dummy word line voltage is less than the selected bit line voltage, the dummy word line voltage is greater than the selected word line voltage.
4. The method of claim 1 , wherein:
the selected word line voltage is less than the selected bit line voltage.
5. The method of claim 1 , wherein:
the memory operation comprises a RESET operation.
6. The method of claim 1 , wherein:
the memory operation comprises a read operation.
7. The method of claim 1 , wherein:
the first memory cell comprises a ReRAM memory cell; and
the memory array comprises a three-dimensional memory array.
8. The method of claim 1 , further comprising:
determining a maximum current limit for the first memory cell;
determining a selected select gate voltage based on the maximum current limit; and
applying the selected select gate voltage to the select gate during the memory operation, the applying the dummy word line voltage to the dummy word line is performed prior to the applying the selected select gate voltage to the select gate.
9. The method of claim 1 , further comprising:
determining a maximum current limit for the first memory cell, the memory operation includes applying a selected select gate voltage to the select gate such that a current through the first memory cell does not exceed the maximum current limit for the first memory cell.
10. A non-volatile storage system, comprising:
a memory array, the memory array includes a first adjustable resistance bit line structure, the first adjustable resistance bit line structure includes an adjustable resistance local bit line and a select gate; and
one or more managing circuits in communication with the first adjustable resistance bit line structure, the one or more managing circuits configured to identify a first word line within the memory array, a first memory cell is arranged between the adjustable resistance local bit line and the first word line, the one or more managing circuits configured to identify a first global bit line within the memory array, the first global bit line is connected to the adjustable resistance local bit line, the one or more managing circuits configured to identify a dummy word line within the memory array, the dummy word line comprises the word line closest to the first global bit line, the one or more managing circuits configured to determine a dummy word line voltage, the one or more managing circuits configured to cause the adjustable resistance local bit line to be set into a conducting state during a memory operation, the one or more managing circuits configured to cause a selected word line voltage to be applied to the first word line and a selected bit line voltage to be applied to the first global bit line while the adjustable resistance local bit line is set into the conducting state, the one or more managing circuits configured to cause the dummy word line voltage to be applied to the dummy word line while the adjustable resistance local bit line is set into the conducting state, the adjustable resistance local bit line comprises undoped polysilicon.
11. The non-volatile storage system of claim 10 , wherein:
the one or more managing circuits configured to identify a set of unselected word lines, a set of unselected memory cells is arranged between the adjustable resistance local bit line and the set of unselected word lines, the one or more managing circuits configured to determine an unselected word line voltage, the dummy word line voltage is greater than the unselected word line voltage, the one or more managing circuits configured to cause the unselected word line voltage to be applied to at least one of the set of unselected word lines during the memory operation.
12. The non-volatile storage system of claim 10 , wherein:
the selected word line voltage is less than the selected bit line voltage.
13. The non-volatile storage system of claim 10 , wherein:
the dummy word line voltage is less than the selected bit line voltage, the dummy word line voltage is greater than the selected word line voltage.
14. The non-volatile storage system of claim 10 , wherein:
the memory operation comprises one of a RESET operation or a SET operation.
15. The non-volatile storage system of claim 10 , wherein:
the memory operation comprises a read operation.
16. The non-volatile storage system of claim 10 , wherein:
the first memory cell comprises a ReRAM memory cell; and
the memory array comprises a three-dimensional memory array.
17. A method for operating a non-volatile memory, comprising:
identifying a dummy word line within a memory array, the memory array includes a first word line and a first global bit line, the first global bit line is connected to an adjustable resistance bit line structure that includes an adjustable resistance local bit line and a select gate, a first memory cell is arranged between the adjustable resistance local bit line and the first word line, the dummy word line comprises the word line closest to the first global bit line;
determining a dummy word line voltage;
determining a maximum current limit for the first memory cell;
determining a selected select gate voltage based on the maximum current limit; and
performing a memory operation on the memory array, the memory operation includes applying a selected word line voltage to the first word line and applying a selected bit line voltage to the first global bit line while the adjustable resistance local bit line is set into a conducting state, the memory operation includes applying the dummy word line voltage to the dummy word line while the adjustable resistance local bit line is set into the conducting state, the memory operation includes applying the selected select gate voltage to the select gate during the memory operation such that a current through the first memory cell does not exceed the maximum current limit for the first memory cell, the adjustable resistance local bit line comprises undoped polysilicon.
18. The method of claim 17 , further comprising:
determining an unselected word line voltage to be applied to a set of unselected word lines, a set of unselected memory cells is arranged between the adjustable resistance local bit line and the set of unselected word lines, the set of unselected word lines is arranged between the first word line and the dummy word line, the dummy word line voltage is greater than the unselected word line voltage, the memory operation includes applying the unselected word line voltage to the set of unselected word lines during the memory operation.