Silicon germanium fin
View Patent ↗A method includes forming a multilayered stack on a surface of a supporting layer. The multilayered stack is composed of alternating layers of compressively strained Silicon Germanium (Si 1-x Ge x ) and tensily strained Carbon-doped Silicon (Si:C). The method further includes etching the multilayered stack to form at least one Fin precursor structure and annealing the Fin precursor structure to remove Carbon from the strained Si:C layers to form Carbon-depleted layers and to diffuse Germanium from the Si 1-x Ge x layers into the Carbon-depleted layers producing a Si 1-x Ge x Fin. A structure that is disclosed includes a Semiconductor on Insulator (SOI) layer disposed on a layer of buried oxide and a multilayered stack on a surface of the SOI layer. The multilayered stack is composed of alternating layers of compressively strained Si 1-x Ge x and tensily strained Si:C. The structure further includes a hardmask layer disposed on a top surface of the multilayered stack.
1. A method, comprising:
forming a multilayered stack on a surface of a supporting layer, the multilayered stack being comprised of alternating layers of compressively strained Silicon Germanium (Si 1-x Ge x ) and tensily strained Carbon-doped Silicon (Si:C);
etching the multilayered stack to form at least one Fin precursor structure; and
annealing the Fin precursor structure to remove Carbon from the strained Si:C layers to form Carbon-depleted layers and to diffuse Germanium from the compressively strained Si 1-x Ge x layers into the Carbon-depleted layers to produce a substantially continuous Si 1-x Ge x Fin from the annealed Fin precursor structure.
2. The method as in claim 1 , where a value of x in the compressively strained Si 1-x Ge x layers is greater than a value of x in the substantially continuous Si 1-x Ge x Fin.
3. The method as in claim 1 , where a value of x in the substantially continuous Si 1-x Ge x Fin is in a range of about 15% to about 30%.
4. The method as in claim 1 , where a concentration of Carbon in the Si:C layers is in a range of about 0.2% to about 3%.
5. The method as in claim 1 , where each of the layers of the multilayered stack has a thickness in a range of about 2 nm to about 20 nm.
6. The method of claim 1 , where a height of the substantially continuous Si 1-x Ge x Fin is greater than a critical height.
7. The method as in claim 1 , where annealing uses at least two sequentially performed anneal processes.
8. The method as in claim 1 , where the supporting layer is a Semiconductor on Insulator (SOI) layer disposed over a buried oxide (BOX) layer.
9. The method as in claim 1 , where the supporting layer is a bulk silicon substrate.
10. The method of claim 1 , where for a given Ge concentration, a final SiGe fin width is less than the critical thickness.
11. The method of claim 1 , where a Ge concentration in the at least one tensily strained SiGe layer is equal to, less than, or greater than a Ge concentration in the substantially continuous SiGe Fin.
12. The method of claim 1 , where the anneal results in a condensation of Ge in the Fin precursor structure.
13. The method as in claim 1 , where when forming the tensily strained Carbon-doped Silicon (Si:C) a majority of Carbon atoms are in substitutional sites resulting in tensile strain.
14. The method as in claim 1 , where in the Carbon-doped Silicon (Si:C) a majority of Carbon atoms are in substitutional sites, and where the anneal moves the Carbon atoms to interstitial sites and then removes the Carbon atoms.