System and method to improve productivity of hybrid scan ion beam implanters

1. An ion implantation system for optimizing a scan width on a workpiece, comprising:

an ion source;

an extraction aperture configured to extract a spot ion beam from the ion source;

a mass resolving apparatus positioned downstream of the extraction aperture, wherein the mass resolving apparatus is configured to mass analyze the spot ion beam;

an ion beam scanning apparatus positioned along a path of the spot ion beam, wherein the ion beam scanning apparatus is configured to reciprocally scan the spot ion beam in a fast scan direction, therein defining a ribbon ion beam having a ribbon beam width;

a workpiece scanning apparatus having a workpiece mount configured to selectively secure the workpiece, wherein the workpiece scanning apparatus is configured for translate the workpiece through the ribbon ion beam;

a dosimetry system positioned downstream of the workpiece mount, wherein the dosimetry system comprises a tuning Faraday configured to measure a beam current of the ribbon ion beam; and

a control system configured for tuning the ion beam to optimize the scan width based, at least in part, on the beam current measured by the dosimetry system.

2. The system of claim 1 , wherein the control system is configured to tune the control one or more of a size, current, and angle of the ribbon ion beam in real-time to optimize the scan width of the ion beam.

3. The system of claim 1 , wherein the controller is configured to collect the beam current with a technique comprising one or more of current-to-voltage conversion, isolation, averaging and filtering techniques.

4. The system of claim 1 , wherein the dosimetry system comprises two Faraday cups separated by a distance associated with a diameter of the workpiece, wherein the two Faraday cups have an opening with a height equal to at least a maximum height of the ribbon ion beam.

5. The system of claim 4 , wherein the dosimetry system comprises a mechanism configured to vary the distance between the two Faraday cups and is configured to accommodate varying diameters of the workpiece.

6. The system of claim 5 , wherein the varying diameters range from 150 mm to 450 mm.

7. The system of claim 5 , wherein each of the two Faraday cups comprises a respective aperture associated therewith, and wherein the mechanism is configured to vary a collection area of the dosimetry system and to occlude the respective aperture, thus restricting a width of the ribbon ion beam being measured.

8. The system of claim 1 , wherein the control system is configured to acquire at least one half of a scan period of the spot ion beam scanned in the fast scan direction with resolution and accuracy to capture beam current changes occurring while the spot ion beam is scanned across the dosimetry system.

9. The system of claim 1 , wherein the tuning Faraday has a finite width associated therewith, wherein the control system is configured to tune the ion beam to optimize the scan width based, at least in part, on the beam current measured by the tuning Faraday.

10. A method to improve productivity of a hybrid scan ion beam implanter, the method comprising:

extracting an spot ion beam from an ion source and directing the spot ion beam to a mass analyzer;

analyzing the spot ion beam via the mass analyzer;

scanning the spot ion beam in a fast scan direction, therein defining a ribbon ion beam;

translating a workpiece through the ribbon ion beam transverse to a width of the ribbon ion beam;

measuring beam current signals of the ribbon ion beam utilizing a dosimetry system comprising two Faraday cups separated by a width;

varying a collection area of the dosimetry system via an occluding aperture, thereby restricting a width of the ribbon ion beam being measured;

providing the beam current signals of the ribbon ion beam associated with the varied collection area to a control system; and

optimizing the width of the ribbon ion beam via the control system based, at least in part, on the beam current signals.

11. The method of claim 10 , wherein a transport system translates the workpiece through the ribbon ion beam in a direction that is orthogonal to the width of the ribbon ion beam.

12. The method of claim 10 , wherein varying the collection area of the dosimetry system comprises varying a width between two Faraday cups of the dosimetry system to accommodate various diameter workpieces.

13. The method of claim 10 , wherein varying the collection area of the dosimetry system is based, at least in part, on a variation in diameter of the workpiece ranging from 150 mm to 450 mm.

14. A method of tuning a scanned beam, comprising:

determining a desired beam current to implant a workpiece with desired properties;

tuning the scanned beam utilizing a setup Faraday cup;

adjusting a scan width to obtain an optimal scan width using setup Faraday time signals;

tuning optics for a desired flux value corresponding to a desired dosage;

adjusting uniformity of flux distribution when the desired flux value is obtained;

measuring an angular distribution;

determining whether the angular distribution is acceptable or unacceptable; and

adjusting the angular distribution when the angular distribution is determined to be unacceptable.