IP Library Granted Patent US 10,109,610
Granted Patent B2
US 10,109,610 · App. 15/091,436 · Granted Oct 23, 2018

Wire bonding systems and related methods

Inventors: Wentao Qin (Gilbert, AZ); Gordon M. Grivna (Mesa, AZ); Harold Anderson (Chandler, AZ); Thomas Anderson (Chandler, AZ); George Chang (Tempe, AZ)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H01L24/45H01L24/05H01L2224/02166H01L2224/04042H01L2224/05573H01L2224/05624H01L2224/45144H01L2224/45147H01L2224/45565H01L2224/45647H01L2224/48463H01L2224/48507
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Quick Facts
Patent No.
US 10,109,610
App. No.
15/091,436
Granted
Oct 23, 2018
Kind
B2
Abstract

A wire bond system. Implementations may include: a bond wire including copper (Cu), a bond pad including aluminum (Al) and a sacrificial anode electrically coupled with the bond pad, where the sacrificial anode includes one or more elements having a standard electrode potential below a standard electrode potential of Al.

Claims (22)

1. A wire bond system comprising:

a bond wire comprising Cu;

a bond pad comprising an aluminum alloy; and

a sacrificial anode electrically coupled with the bond pad;

wherein the sacrificial anode does not physically contact the bond pad.

2. The system of claim 1 , wherein the sacrificial anode comprises one of Mg, Hf, Be, or any combination thereof.

3. A wire bond system comprising:

a bond wire comprising Cu;

a bond pad comprising an aluminum alloy;

a sacrificial anode physically and electrically coupled over at least a portion of the bond pad; and

one of an alloy stack or an intermetallic layer formed through bonding the bond wire through the sacrificial anode with the bond pad.

4. The system of claim 3 , wherein the sacrificial anode comprises one of Mg, Hf, Be, or any combination thereof.

5. A wire bond system comprising:

a bond wire comprising Cu;

a bond pad coupled to the bond wire, the bond pad comprising an aluminum alloy;

a layer forming a sacrificial anode coupled to the bond pad between the bond wire and the bond pad; and

one of an alloy stack or an intermetallic layer formed through bonding the bond wire through the layer with the bond pad.

6. The system of claim 5 , wherein the layer comprises W.

7. The system of claim 5 , wherein the layer comprises Zn.

8. The system of claim 5 , wherein the layer comprises Cr.

9. The system of claim 5 , wherein the layer comprises Sn.

10. The system of claim 5 , wherein the layer comprises one or more elements selected from the group consisting of Mo, Cd, Co, Ni, Fe, Cu, and any combination thereof.

Assignments (4)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 038620, FRAME 0087 Recorded Jun 22, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064070/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER 5859768 AND TO RECITE COLLATERAL AGENT ROLE OF RECEIVING PARTY IN THE SECURITY INTEREST PREVIOUSLY RECORDED ON REEL 038620 FRAME 0087. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Aug 25, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 039853/0001 →
SECURITY INTEREST Recorded Apr 15, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 038620/0087 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 5, 2016
From: QIN, WENTAO; ANDERSON, HAROLD; ANDERSON, THOMAS; CHANG, GEORGE; GRIVNA, GORDON M.
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 038198/0505 →
Continuity (3)
Provisional Application 62149455 · Apr 17, 2015
Provisional Application 62256130 · Nov 17, 2015
Related Publication 20160307865A1 · Oct 20, 2016