Static random access memory (SRAM) device
To reinforce power supply wirings without sacrificing the interconnectivity of semiconductor devices. When three wirings are formed in parallel in the same wiring layer and the center wiring among them is shorter than the outer wirings, a projecting portion integrated into the outer wiring is formed utilizing a free space remaining on the extension of the center wiring. For example, when the outer wirings are used as power supply wirings, the power supply wirings can be reinforced by adding the projecting portion. At this time, because the projecting portion is arranged in the free space, the interconnectivity is not sacrificed.
1. A Static Random Access Memory (SRAM) device, comprising:
at least one memory cell arranged in a first wiring layer;
a first wiring arranged in a second wiring layer;
a second wiring arranged in the second wiring layer;
a third wiring arranged in the second wiring layer between the first and second wirings;
a first projecting portion integrally formed with the first wiring between the first and second wirings in the second wiring layer;
a fourth wiring arranged in a third wiring layer, the fourth wiring intersecting with the first wiring and the first projecting portion;
a first via coupling between the first wiring and the fourth wiring; and
a second via coupling between the first projecting portion and the fourth wiring,
wherein the first via coupling is formed on a portion on the first wiring that is adjacent to the first projecting portion such the first via coupling and the second via coupling are adjacent to each other.
2. The SRAM device of claim 1 ,
wherein the third wiring is connected to the at least one memory cell.
3. The SRAM device of claim 1 ,
wherein the at least one memory cell includes:
first and second storage nodes;
first and second P channel transistors having drains coupled to the first and second storage nodes, respectively, gates coupled to the second and first storage nodes, respectively, and sources coupled to a cell power line;
first and second N cannel transistors having sources coupled to the third wiring, drains coupled to the first and second storage nodes, respectively, gates coupled to the second and first storage nodes, respectively; and
third and fourth N channel transistors having gates coupled to a word line, having source-drain paths coupled to the bit lines and the first and second storage nodes, respectively.
4. The SRAM device of claim 3 , further comprising:
a fifth N channel transistor having a source-drain path coupled to the third wiring and a ground voltage, and a gate coupled to a control signal.
5. The SRAM device of claim 4 , further comprising:
a sixth N channel transistor having a source-drain path coupled to the third wiring and the ground voltage, and a gate coupled to the drain thereof.
6. The SRAM device of claim 5 ,
wherein the at least one memory cell is arranged between the fifth N channel transistor and the sixth N channel transistor.
7. The SRAM device of claim 5 , further comprising:
a cell power line voltage control circuit coupled to the cell power line and for controlling a voltage level of the cell power line so that
1) a voltage level of the cell power line is below a power supply voltage in a write mode of the at least one memory cell, and
2) a voltage level of the cell power line keeps the power supply voltage in a read mode and the standby mode of the at least one memory cell.
8. A Static Random Access Memory (SRAM) device, comprising:
at least one memory cell arranged in a first wiring layer;
a first wiring arranged in a second wiring layer;
a second wiring arranged in the second wiring layer;
a third wiring arranged in the second wiring layer between the first and second wirings;
a first projecting portion integrally formed with the first wiring between the first and second wirings in the second wiring layer;
a fourth wiring arranged in a third wiring layer, the fourth wiring intersecting with the first wiring and the first projecting portion;
a first via coupling between the first wiring and the fourth wiring; and
a second via coupling between the first projecting portion and the fourth wiring,
wherein the at least one memory cell includes:
first and second storage nodes;
first and second P channel transistors having drains coupled to the first and second storage nodes, respectively, gates coupled to the second and first storage nodes, respectively, and sources coupled to a cell power line;
first and second N cannel transistors having sources coupled to the third wiring, drains coupled to the first and second storage nodes, respectively, gates coupled to the second and first storage nodes, respectively; and
third and fourth N channel transistors having gates coupled to a word line, having source-drain paths coupled to the bit lines and the first and second storage nodes, respectively.
9. The SRAM device of claim 8 ,
wherein the third wiring is connected to the at least one memory cell.
10. The SRAM device of claim 8 , further comprising:
a fifth N channel transistor having a source-drain path coupled to the third wiring and a ground voltage, and a gate coupled to a control signal.
11. The SRAM device of claim 10 , further comprising:
a sixth N channel transistor having a source-drain path coupled to the third wiring and the ground voltage, and a gate coupled to the drain thereof.
12. The SRAM device of claim 11 , wherein the at least one memory cell is arranged between the fifth N channel transistor and the sixth N channel transistor.
13. The SRAM device of claim 11 , further comprising:
a cell power line voltage control circuit coupled to the cell power line and for controlling a voltage level of the cell power line so that
1) a voltage level of the cell power line is below a power supply voltage in a write mode of the at least one memory cell, and
2) a voltage level of the cell power line keeps the power supply voltage in a read mode and the standby mode of the at least one memory cell.